Patents by Inventor Jeong Woo Jeon
Jeong Woo Jeon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240139718Abstract: The present invention is a perovskite metal oxide catalyst substituted with metal ions for reducing carbon deposition, a method for producing the same, and a process for performing a methane reforming reaction using this catalyst. The catalyst is produced in which Ni in ionic form is substituted at a portion of the Ti site of SrTiO3, MgTiO3, CaTiO3, or BaTiO3, which is a multi-component metal oxide having a perovskite structure. Then, various methane reforming reactions (steam-methane reforming, dry reforming of methane, catalytic partial oxidation of methane) may be efficiently and economically performed using this catalyst. The nickel-substituted perovskite metal oxide catalyst has a structure in which Ni2+ is substituted in the perovskite lattice structure. Thus, the metal oxide catalyst has advantages in that carbon deposition thereon does not occur, and thus, the catalyst has a high catalytic stability and may be used for a long time.Type: ApplicationFiled: January 11, 2024Publication date: May 2, 2024Inventors: Chang Hyun KO, Ji Yoon Jeon, Jeong Woo Yun, Eun Gyong Park
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Patent number: 11969711Abstract: The present invention relates to a carbon-based precious metal-transition metal composite catalyst and a preparation method therefor, and more particularly, to a catalyst synthesis method in which, when preparing a high-content precious metal-transition metal composite catalyst, a catalyst having uniform particles and composition can be prepared, and cyclohexane dimethanol (CHDM) is efficiently produced by the hydrogenation reaction of cyclohexane dicarboxylic acid (CHDA) in an aqueous solution.Type: GrantFiled: December 10, 2019Date of Patent: April 30, 2024Assignee: HANWHA SOLUTIONS CORPORATIONInventors: Jeong Kwon Kim, Sun Woo Yook, Bong Sik Jeon, Wan Jae Myeong
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Patent number: 11918981Abstract: The present invention relates to a perovskite metal oxide catalyst substituted with metal ions for reducing carbon deposition, a method for producing the same, and a process for performing a methane reforming reaction using this catalyst. According to the present invention, a novel type of catalyst is produced in which Ni, iron or cobalt in ionic form is substituted at a portion of the Ti site (B-site) of SrTiO3, MgTiO3, CaTiO3 or BaTiO3, which is a multicomponent metal oxide having a perovskite (ABO3) structure. Then, various methane reforming reactions (e.g., steam-methane reforming (SMR), dry reforming of methane (DRM), catalytic partial oxidation of methane (CPOM), etc.) may be efficiently and economically performed using this catalyst. The nickel-substituted perovskite metal oxide catalyst according to the present invention has a structure in which Ni2+, Co2+, Fe2+, Co3+ or Fe3+ is substituted in the perovskite lattice structure.Type: GrantFiled: November 6, 2017Date of Patent: March 5, 2024Assignee: INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITYInventors: Chang Hyun Ko, Ji Yoon Jeon, Jeong Woo Yun, Eun Gyong Park
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Publication number: 20240072328Abstract: The present disclosure relates to a heat transfer member capable of preventing propagation of thermal runaway and a battery module including the same, and more particularly, to a heat transfer member capable of preventing propagation of thermal runaway in which heat or flame is propagated due to ignition or the like of at least one battery cell in a battery module, and a battery module including the same. According to the present embodiment, a heat transfer member provided in contact with a cooling member in a battery module or a stack composed of a plurality of battery cells includes a thermally expandable material having a thermal expansion initiation temperature of 90 to 150° C.Type: ApplicationFiled: August 29, 2023Publication date: February 29, 2024Inventors: Jeong Woo HAN, Ji San KIM, Bon Seok KU, Hae Ryong JEON
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Patent number: 11912653Abstract: Provided are a noble metal-transition metal complex catalyst supported on a carbon-coated silica-alumina support and a preparation method therefor, the catalyst being capable of obtaining a fast reaction rate and catalyst stability, as compared to a conventional catalyst, when cyclohexane dimethanol (CHDM) production is carried out by a cyclohexane dicarboxylic acid (CHDA) hydrogenation reaction in an aqueous solution by using a carbon-coated supported catalyst.Type: GrantFiled: December 26, 2018Date of Patent: February 27, 2024Assignee: HANWHA SOLUTIONS CORPORATIONInventors: Jeong Kwon Kim, Wan Jae Myeong, Sun Woo Yook, Bong Sik Jeon
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Patent number: 9190239Abstract: Disclosed is an apparatus and method for low-temperature plasma immersion processing of a variety of workpieces using accelerated ions, wherein low-temperature plasma is distributed around a cylindrical workpiece placed in a chamber, the workpiece is enclosed with a housing including a multi-slot extracting electrode to isolate the workpiece from plasma, and a negative potential sufficient to induce sputtering is applied to the workpiece and the electrode, so that ions from plasma are accelerated within the sheath formed between the extracting electrode and plasma, pass through the slot part of the electrode and bombard the workpiece, thus polishing the surface of the workpiece. This apparatus and method is effective for surface smoothing to ones of nm of large cylindrical substrates particularly substrates for micro or nanopattern transfer.Type: GrantFiled: October 27, 2010Date of Patent: November 17, 2015Assignee: Korea Electrotechnology Research InstituteInventors: Sung Il Chung, Hyeon Seok Oh, S. A. Nikiforov, Pan Kyeom Kim, Hyeon Taeg Kim, Jeong Woo Jeon, Jong Moon Kim
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Patent number: 8964167Abstract: The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time.Type: GrantFiled: October 28, 2010Date of Patent: February 24, 2015Assignee: Korea Electrotechnology Research InstituteInventors: Jeong Woo Jeon, Hyeon Seok Oh, Mitica Caraiani, Sung Il Chung, Hyeon Taeg Kim, Chang Rin Lee, Jong Moon Kim
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Patent number: 8591711Abstract: The present invention relates to an inductively coupled plasma processing chamber and method for a cylindrical workpiece with a three-dimensional profile, and more particularly to an inductively coupled plasma processing reactor and method for a cylindrical workpiece with a three-dimensional profile, in which the workpiece serving as an internal RF antenna is connected to an RF power source through an impedance matching network at one end, and a terminating capacitor at another end so as to achieve low plasma contamination, confine dense uniform plasma in the substrate vicinity and suppress secondary electrons emitted from the substrate, and a plasma process can be applied to a 3-D linear semiconductor device, a metal, glass, ceramic or polymer substrate having planar or 3-D structured micro or nano patterns, and the like.Type: GrantFiled: September 29, 2008Date of Patent: November 26, 2013Assignees: Korea Electrotechnology Research Institute, New Optics, Ltd.Inventors: Sung Il Chung, Sergey Alexandrovich Nikiforov, Hyeon Seok Oh, Pan Kyeom Kim, Hyeon Taeg Gim, Jeong Woo Jeon
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Publication number: 20130120732Abstract: The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time.Type: ApplicationFiled: October 28, 2010Publication date: May 16, 2013Applicant: Korea Electrotechnology Research InstituteInventors: Jeong Woo Jeon, Hyeon Seok Oh, Mitica Caraiani, Sung Il Chung, Hyeon Taeg Kim, Chang Rin Lee, Jong Moon Kim
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Patent number: 8354908Abstract: The present invention provides a cylindrical magnetic levitation stage which includes a cylindrical substrate used to form micro-patterns of various arbitrary shapes on a large-area semiconductor substrate or display panel substrate, a cylindrical substrate, a combination of a first permanent magnet array and a first coil array and a combination of a first permanent magnet array and a first coil array, which are coupled to the cylindrical substrate, so that levitation, axial translation and rotation of the cylindrical substrate can be made finely through the control of a magnetic force generated by the interaction between a magnetic field generated by electric current applied to the coil arrays and a magnetic field generated from the permanent magnet arrays corresponding to the coil arrays.Type: GrantFiled: September 29, 2008Date of Patent: January 15, 2013Assignee: Korea Electrotechnology Research InstituteInventors: Jeong Woo Jeon, Hyun Seok Oh, Sung Il Chung, Yeon Ho Jeong, Do Hyun Kang, S. A. Nikiforov, Mitica Caraiani
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Publication number: 20120222952Abstract: Disclosed is an apparatus and method for low-temperature plasma immersion processing of a variety of workpieces using accelerated ions, wherein low-temperature plasma is distributed around a cylindrical workpiece placed in a chamber, the workpiece is enclosed with a housing including a multi-slot extracting electrode to isolate the workpiece from plasma, and a negative potential sufficient to induce sputtering is applied to the workpiece and the electrode, so that ions from plasma are accelerated within the sheath formed between the extracting electrode and plasma, pass through the slot part of the electrode and bombard the workpiece, thus polishing the surface of the workpiece. This apparatus and method is effective for surface smoothing to ones of nm of large cylindrical substrates particularly substrates for micro or nanopattern transfer.Type: ApplicationFiled: October 27, 2010Publication date: September 6, 2012Applicant: Korea Electrotechnology Research InstituteInventors: Sung Il Chung, Hyeon Seok Oh, S.A. Nikiforov, Pan Kyeom Kim, Hyeon Taeg Kim, Jeong Woo Jeon, Jong Moon Kim
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Publication number: 20110253674Abstract: The present invention relates to an inductively coupled plasma processing chamber and method for a cylindrical workpiece with a three-dimensional profile, and more particularly to an inductively coupled plasma processing reactor and method for a cylindrical workpiece with a three-dimensional profile, in which the workpiece serving as an internal RF antenna is connected to an RF power source through an impedance matching network at one end, and a terminating capacitor at another end so as to achieve low plasma contamination, confine dense uniform plasma in the substrate vicinity and suppress secondary electrons emitted from the substrate, and a plasma process can be applied to a 3-D linear semiconductor device, a metal, glass, ceramic or polymer substrate having planar or 3-D structured micro or nano patterns, and the like.Type: ApplicationFiled: September 29, 2008Publication date: October 20, 2011Applicants: New Optics, Ltd., Korea Electrotechnology Research InstituteInventors: Sung Il Chung, S.A. Nikiforov, Hyeon Seok Oh, Pan Kyeom Kim, Hyeon Taeg Gim, Jeong Woo Jeon
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Publication number: 20110234343Abstract: The present invention provides a cylindrical magnetic levitation stage which includes a cylindrical substrate used to form micro-patterns of various arbitrary shapes on a large-area semiconductor substrate or display panel substrate, a cylindrical substrate, a combination of a first permanent magnet array and a first coil array and a combination of a first permanent magnet array and a first coil array, which are coupled to the cylindrical substrate, so that levitation, axial translation and rotation of the cylindrical substrate can be made finely through the control of a magnetic force generated by the interaction between a magnetic field generated by electric current applied to the coil arrays and a magnetic field generated from the permanent magnet arrays corresponding to the coil arrays.Type: ApplicationFiled: September 29, 2008Publication date: September 29, 2011Applicant: Korea Electrotechnology Research InstituteInventors: Jeong Woo Jeon, Hyun Seok Oh, Sung II Chung, Yeon Ho Jeong, Do Hyun Kang, S.A. Nikiforov, Mitica Caraiani
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Patent number: 6849969Abstract: A transverse flux linear motor with permanent magnet excitation having a stator including stator cores and windings respectively wound around the stator cores and supplied with current, and a mover arranged at a central portion of the stator, the mover including mover cores and permanent magnets. Each of the permanent magnets is arranged between adjacent ones of the mover cores. Each stator core has a pair of column portions spaced apart from each other by a desired distance. The windings are arranged in pairs such that each of the winding pairs has two windings wound around respective column portions of an associated one of the stator cores.Type: GrantFiled: December 26, 2002Date of Patent: February 1, 2005Assignee: Korea Electrotechnology Research InstituteInventors: Do Hyun Kang, Jeong Woo Jeon
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Publication number: 20030127917Abstract: Disclosed is a transverse flux linear motor with permanent magnet excitation, which has a simple configuration as compared to systems using hydraulic or pneumatic pressure, or a rotary motor and a power transmission device, while being capable of generating high force, thereby achieving a high efficiency, as compared to conventional linear motors. The transverse flux linear motor includes a stator including stator cores and windings respectively wound around the stator cores and supplied with current, and a mover arranged at a central portion of the stator, the mover including mover cores and permanent magnets. Each of the permanent magnets is arranged between adjacent ones of the mover cores. Each stator core has a pair of column portions spaced apart from each other by a desired distance. The windings are arranged in pairs such that each of the winding pairs has two windings wound around respective column portions of an associated one of the stator cores.Type: ApplicationFiled: December 26, 2002Publication date: July 10, 2003Inventors: Do Hyun Kang, Jeong Woo Jeon
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Patent number: 6580185Abstract: The present invention relates to an integrated system in which a bilateral permanent magnet excited synchronous motor part and a non-contact power feeding part are combined in order to generate a linear driving force and to feed an electric power without any contact.Type: GrantFiled: December 31, 2001Date of Patent: June 17, 2003Assignee: Korea Electrotechnology Research InstituteInventors: Do Hyun Kang, Yeong Han Chun, Jeong Woo Jeon
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Publication number: 20020093252Abstract: The present invention relates to an integrated system in which a bilateral permanent magnet excited synchronous motor part and a non-contact power feeding part are combined in order to generate a linear driving force and to feed an electric power without any contact.Type: ApplicationFiled: December 31, 2001Publication date: July 18, 2002Applicant: KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTEInventors: Do Hyun Kang, Yeong Han Chun, Jeong Woo Jeon