Patents by Inventor Jeong-in Doh

Jeong-in Doh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
    Publication number: 20240120213
    Abstract: A method of fabricating a semiconductor device is provided. The method includes: loading a substrate into a substrate processing apparatus; and processing the substrate, using the substrate processing apparatus. The processing the substrate includes: providing a process gas; generating a process etchant from the process gas, using plasma ignition, the process etchant including a first etchant and a second etchant; processing the substrate, using the process etchant; identifying a composition rate of the process etchant; and controlling the processing of the substrate based on a process result according to the composition rate of the process etchant.
    Type: Application
    Filed: August 30, 2023
    Publication date: April 11, 2024
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Woo Rim LEE, Myoung Jae SEO, Sung Gil KANG, Hyun Ho DOH, Sung Yong PARK, In Hye JEONG
  • Pattern matching apparatus and method that considers distance and direction
    Patent number: 6128410
    Abstract: An apparatus and method for matching sets of patterns. The apparatus matches an input pattern with reference patterns by extracting feature points of the input pattern to obtain a feature vector, and compares the feature vector of the input pattern with previously stored feature vectors of the reference patterns.
    Type: Grant
    Filed: June 8, 1998
    Date of Patent: October 3, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hee-seon Park, Jeong-in Doh