Patents by Inventor Jeong-Jin Hong

Jeong-Jin Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11961030
    Abstract: A method includes receiving trace sensor data associated with a first manufacturing process of a manufacturing chamber. The method further includes processing the trace sensor data by a processing device to generate summary data associated with the trace sensor data. The method further includes generating a quality index score based on the summary data. The method further includes providing an alert to a user based on the quality index score. The alert includes an indication that the manufacturing chamber performance does not meet a first threshold.
    Type: Grant
    Filed: January 27, 2022
    Date of Patent: April 16, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Sejune Cheon, Jeong Jin Hong, Mikyung Shim, Xiaoqun Zou, Jinkyeong Lee, Sang Hong Kim
  • Publication number: 20240112718
    Abstract: An electronic device includes a target address generation circuit configured to generate a counting signal by counting the number of times each logic level combination of an address is input by performing an internal read operation and an internal write operation during an active operation, configured to store the counting signal as the storage counting signal when the counting signal is counted more than a storage counting signal that is stored therein, and configured to store the address, corresponding to the counting signal, as a target address; and a refresh control circuit configured to control a smart refresh operation on the target address.
    Type: Application
    Filed: December 11, 2023
    Publication date: April 4, 2024
    Applicant: SK hynix Inc.
    Inventors: Jeong Jin HWANG, Sung Nyou YU, Duck Hwa HONG, Sang Ah HYUN, Soo Hwan KIM
  • Publication number: 20230367288
    Abstract: Embodiments disclosed herein include a method for use with a semiconductor processing tool. In an embodiment, the method comprises configuring the semiconductor processing tool, running a benchmark test on the semiconductor processing tool, providing hardware operating window (HOW) analytics, generating a design of experiment (DoE) using the HOW analytics, implementing process optimization, and releasing an iteration of the process recipe. In an embodiment, the method further comprises margin testing the iteration of the process recipe.
    Type: Application
    Filed: May 16, 2022
    Publication date: November 16, 2023
    Inventors: Jeong Jin Hong, Mi Hyun Jang, Sidharth Bhatia, Sejune Cheon, Joshua Maher, Upendra Ummethala
  • Publication number: 20230259112
    Abstract: A method includes receiving first data associated with measurements taken by a sensor during a first manufacturing procedure of a manufacturing chamber. The method further includes receiving second data. The second data includes reference data associated with the first data. The method further includes providing the first and second data to a comparison model. The method further includes receiving a similarity score from the comparison model, associated with the first and second data. The method further includes performance of a corrective action in view of the similarity score.
    Type: Application
    Filed: January 27, 2022
    Publication date: August 17, 2023
    Inventors: Sejune Cheon, Jeong Jin Hong, Mikyung Shim, Xiaoqun Zou, Jinkyeong Lee, Sang Hong Kim
  • Publication number: 20230260767
    Abstract: The subject matter of this specification can be implemented in, among other things, methods, systems, computer-readable storage medium. A method can include receiving (i) sensor data indicating a first state of an environment of a processing chamber processing a substrate subsequent to a chamber recovery procedure, and (ii) substrate process data indicating a set of process parameter values associated with performing a substrate processing procedure by the processing chamber having the environment in a second state prior to the chamber recovery procedure. The method further includes processing the sensor data and the substrate process data using one or more machine learning models to determine one or more outputs. The one or more outputs include an update to at least one of the set of process parameter values. The update is associated with performing the substrate processing procedure by the processing chamber having the environment in the first state.
    Type: Application
    Filed: February 15, 2022
    Publication date: August 17, 2023
    Inventors: Jeong Jin Hong, Sang Hong Kim, Mihyun Jang, Jin Kyeong Lee, Sejune Cheon
  • Publication number: 20230237412
    Abstract: A method includes receiving trace sensor data associated with a first manufacturing process of a manufacturing chamber. The method further includes processing the trace sensor data by a processing device to generate summary data associated with the trace sensor data. The method further includes generating a quality index score based on the summary data. The method further includes providing an alert to a user based on the quality index score. The alert includes an indication that the manufacturing chamber performance does not meet a first threshold.
    Type: Application
    Filed: January 27, 2022
    Publication date: July 27, 2023
    Inventors: Sejune Cheon, Jeong Jin Hong, Mikyung Shim, Xiaoqun Zou, Jinkyeong Lee, Sang Hong Kim
  • Publication number: 20230236586
    Abstract: A method includes receiving trace sensor data associated with a first manufacturing process of a processing chamber. The method further includes processing the trace sensor data using one or more trained machine learning models that generate a representation of the trace sensor data, and then generate reconstructed sensor data based on the representation of the trace sensor data. The method further includes comparing the trace sensor data to the reconstructed sensor data. The method further includes determining one or more differences between the reconstructed sensor data and the trace sensor data. The method further includes determining whether to recommend a corrective action associated with the processing chamber based on the one or more differences between the trace sensor data and the reconstructed sensor data.
    Type: Application
    Filed: January 27, 2022
    Publication date: July 27, 2023
    Inventors: Sejune Cheon, Jeong Jin Hong, Mikyung Shim, Xiaoqun Zou, Jinkyeong Lee, Sang Hong Kim
  • Publication number: 20230222394
    Abstract: The subject matter of this specification can be implemented in, among other things, methods, systems, computer-readable storage medium. A method can include a processing device receiving training data. The training data may include first sensor data indicating a first state of an environment of a first processing chamber processing a first substrate. The training data may further include first process tool data indicating a state of first processing tools processing the first substrate. The training data may further include first process result data corresponding to the first substrate processed by the first process tool. The processing device may further train a first model using the training data. The trained first model receives new input having second sensor data and second process tool data to produce second output based on the new input. The second output indicating a second process result data corresponding to a second substrate.
    Type: Application
    Filed: January 7, 2022
    Publication date: July 13, 2023
    Inventors: Jeong Jin Hong, Sejune Cheon
  • Publication number: 20230185255
    Abstract: The subject matter of this specification can be implemented in, among other things, methods, systems, computer-readable storage medium. A method can include a processing device receiving sensor data indicating a state of an environment of a processing chamber processing a series of substrates according to a substrate processing procedure. The series of substrates may be processed subsequent to a preventive maintenance procedure. The processing device may determine a first set of values based on the sensor data. The set of values may indicate a likelihood an associated substrate comprises a first process result that meets a threshold condition of the substrate processing procedure. The processing device may further predict a first test result based on the first set of values. The first test result may indicate a likelihood a first substrate processed subsequent to processing the series of substrates comprises a second process result that meets the threshold condition.
    Type: Application
    Filed: December 14, 2021
    Publication date: June 15, 2023
    Inventors: Jeong Jin Hong, Mihyun Jang
  • Patent number: 9779647
    Abstract: A display device according to an exemplary embodiment of the present invention includes: a display panel including a plurality of pixels respectively displaying a first color, a second color, and a third color; and a signal controller controlling the display panel by processing an input image signal, wherein, in a color weakness mode, at least one color among the first to third colors is displayed with a higher gray than an input gray of the input image signal, and the other colors are displayed with the same gray as the input gray of the input image signal.
    Type: Grant
    Filed: February 16, 2015
    Date of Patent: October 3, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Chan Young Park, Jong Sung Bae, Dong Hyeon Lee, Jusuck Lee, Hee Soon Jeong, Seong Min Cho, Eun Sil Han, Jeong Jin Hong
  • Publication number: 20160071468
    Abstract: A display device according to an exemplary embodiment of the present invention includes: a display panel including a plurality of pixels respectively displaying a first color, a second color, and a third color; and a signal controller controlling the display panel by processing an input image signal, wherein, in a color weakness mode, at least one color among the first to third colors is displayed with a higher gray than an input gray of the input image signal, and the other colors are displayed with the same gray as the input gray of the input image signal.
    Type: Application
    Filed: February 16, 2015
    Publication date: March 10, 2016
    Inventors: Chan Young PARK, Jong Sung BAE, Dong Hyeon LEE, Jusuck LEE, Hee Soon JEONG, Seong Min CHO, Eun Sil HAN, Jeong Jin HONG
  • Patent number: 7674716
    Abstract: Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms a adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material to cationically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: March 9, 2010
    Assignee: LG Chem. Ltd.
    Inventors: Gi Ra Yi, Jong Pil Kim, Jung Hee Lee, Jeong Jin Hong, Young Jun Hong, No Ma Kim, An Na Lee
  • Patent number: 7204877
    Abstract: The present invention relates to a coating composition for forming an anti-reflective coating layer for a display device, comprising a fluorinated silane with low surface tension, a conductive polymer with antistatic properties, water, and a solvent. Thus, the coating film of the present invention prepared by coating the composition has high anti-reflection, excellent stain resistance to liquid-phase stains such as fingerprints and the solid-phase stains such as dust by controlling the refractive index, surface energy, and conductivity, and thus can be usefully applied to the outermost side of a display device, regardless of the type of substrates such as a Braun tube or a flat display film and the presence of other coating layers such as a hard coating layer and an anti-glare coating layer.
    Type: Grant
    Filed: April 13, 2005
    Date of Patent: April 17, 2007
    Assignee: LG Chem, Ltd.
    Inventors: Young-Eun Lee, Mi-Young Han, Yeong-Rae Chang, Jeong-Jin Hong, Sung-Hoon Jang
  • Publication number: 20060141741
    Abstract: Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms a adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material to cationically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed.
    Type: Application
    Filed: December 28, 2005
    Publication date: June 29, 2006
    Inventors: Gi Yi, Jong Kim, Jung Hee Lee, Jeong Jin Hong, Young Jun Hong, No Ma Kim, An Na Lee
  • Publication number: 20050239933
    Abstract: The present invention relates to a coating composition for forming an anti-reflective coating layer for a display device, comprising a fluorinated silane with low surface tension, a conductive polymer with antistatic properties, water, and a solvent. Thus, the coating film of the present invention prepared by coating the composition has high anti-reflection, excellent stain resistance to liquid-phase stains such as fingerprints and the solid-phase stains such as dust by controlling the refractive index, surface energy, and conductivity, and thus can be usefully applied to the outermost side of a display device, regardless of the type of substrates such as a Braun tube or a flat display film and the presence of other coating layers such as a hard coating layer and an anti-glare coating layer.
    Type: Application
    Filed: April 13, 2005
    Publication date: October 27, 2005
    Inventors: Young-Eun Lee, Mi-Young Han, Yeong-Rae Chang, Jeong-Jin Hong, Sung-Hoon Jang