Patents by Inventor Jeong Min Hong

Jeong Min Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240140191
    Abstract: The present disclosure provides a sealing device and an in-wheel motor including the sealing device. The in-wheel motor includes a stator, a rotor rotatably disposed with respect to the stator, an annular inner seal connected to the stator and spaced apart from the rotor by a predetermined gap so as to be disposed between the stator and the rotor, and an annular slinger coupled to an end portion of the rotor, wherein the annular inner seal seals between the slinger and the in-wheel motor.
    Type: Application
    Filed: May 1, 2023
    Publication date: May 2, 2024
    Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATION
    Inventors: Ki Tack Lim, Jae Young Jeun, Jeong Uk An, Kyung Ku Yeo, Kam Chun Lee, Yong Gyu Lee, Sung Min Hong, Hong Wook Lee, Kyung Jun Lee
  • Patent number: 8663739
    Abstract: The present invention relates to a method of manufacturing a mat containing aerogel and to a mat manufactured using this method. A method of manufacturing a mat containing silica aerogel according to an aspect of the invention includes: (S1) producing a wet gel by mixing water glass and alcohol in a reactor; (S2) modifying a surface of the wet gel by adding an organic silane compound and an organic solvent to the reactor and mixing; (S3) separating a upper liquid from a solution in the reactor and impregnating a fibrous matrix with the upper liquid; and (S4) drying the fibrous matrix impregnated with the upper liquid. According to an aspect of the invention, a mat containing silica aerogel can be manufactured using only water glass as raw material, even when applying the drying process in an ambient environment, without using expensive materials or supercritical apparatus.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: March 4, 2014
    Assignee: Korea Institute of Energy Research
    Inventors: Jeong-Gu Yeo, Young-Soo Ahn, Churl-Hee Cho, Jeong Min Hong
  • Publication number: 20120025127
    Abstract: The present invention relates to a method of manufacturing a mat containing aerogel and to a mat manufactured using this method. A method of manufacturing a mat containing silica aerogel according to an aspect of the invention includes: (S1) producing a wet gel by mixing water glass and alcohol in a reactor; (S2) modifying a surface of the wet gel by adding an organic silane compound and an organic solvent to the reactor and mixing; (S3) separating a upper liquid from a solution in the reactor and impregnating a fibrous matrix with the upper liquid; and (S4) drying the fibrous matrix impregnated with the upper liquid. According to an aspect of the invention, a mat containing silica aerogel can be manufactured using only water glass as raw material, even when applying the drying process in an ambient environment, without using expensive materials or supercritical apparatus.
    Type: Application
    Filed: June 10, 2010
    Publication date: February 2, 2012
    Applicant: KOREA INSTITUTE OF ENERGY RESEARCH
    Inventors: Jeong-Gu Yeo, Young-Soo Ahn, Churl-Hee Cho, Jeong Min Hong
  • Patent number: 7662448
    Abstract: A photosensitive resin composition for forming column spacers for a liquid crystal display device is provided. The composition includes an alkali-soluble resin, a reactive unsaturated compound, a photoinitiator and a solvent. The alkali-soluble resin includes structural units represented by Formulae 1, 2 and 3, which are described in the specification. A pattern formed using the composition is also provided. The pattern shows improved thickness uniformity, good developability without leaving any residual image, superior solvent resistance and high recovery rate.
    Type: Grant
    Filed: December 10, 2007
    Date of Patent: February 16, 2010
    Assignee: Cheil Industries Inc.
    Inventors: Jae Sun Han, Jeong Min Hong, Jung Sik Choi, Kil Sung Lee
  • Publication number: 20090208854
    Abstract: Disclosed is a photosensitive resin composition used to form spacers of a liquid crystal display device. The photosensitive resin composition comprises [A] an alkali-soluble resin, [B] a reactive unsaturated compound, [C] a photopolymerization initiator and [D] a solvent wherein the alkali-soluble resin [A] is a copolymer including structural units represented by Formulae 1 to 3, which are described in the specification. Column spacers formed using the photosensitive resin composition exhibit high compressive displacement, elastic recovery and residual film ratio.
    Type: Application
    Filed: April 27, 2009
    Publication date: August 20, 2009
    Applicant: Cheil Industries Inc.
    Inventors: Jung Sik CHOI, Jae Sun HAN, Jeong Min HONG, Kil Sung LEE
  • Publication number: 20090122239
    Abstract: The present invention relates to a color filter ink composition including an acryl-based resin, a polymerizable monomer, a pigment, a leveling agent, and a solvent. The pigment is represented by the following Chemical Formula 1, and the leveling agent is a polymer including a repeating unit including at least one of the following Chemical Formula 2, Chemical Formula 3, or combinations thereof. In the above Formulae 1 to 3, each substituent is the same as in the detailed description.
    Type: Application
    Filed: November 6, 2008
    Publication date: May 14, 2009
    Applicant: Cheil Industries Inc.
    Inventors: Jong-Seung PARK, In-Jae LEE, Jin-Ki HONG, Jeong-Min HONG, Dong-Seon UH, Kyung-Hee HYUNG
  • Publication number: 20080146694
    Abstract: A photosensitive resin composition for forming column spacers for a liquid crystal display device is provided. The composition includes an alkali-soluble resin, a reactive unsaturated compound, a photoinitiator and a solvent. The alkali-soluble resin includes structural units represented by Formulae 1, 2 and 3, which are described in the specification. A pattern formed using the composition is also provided. The pattern shows improved thickness uniformity, good developability without leaving any residual image, superior solvent resistance and high recovery rate.
    Type: Application
    Filed: December 10, 2007
    Publication date: June 19, 2008
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Jae Sun HAN, Jeong Min HONG, Jung Sik CHOI, Kil Sung LEE