Patents by Inventor Jer-Chyi Wang

Jer-Chyi Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabricating semiconductor device
    Publication number: 20060105530
    Abstract: A method for fabricating a semiconductor device with high-k materials. A high-k dielectric layer is formed on a substrate, followed by a fluorine-containing treatment of the high-k dielectric layer, forming an interface containing Si—F bonds.
    Type: Application
    Filed: November 12, 2004
    Publication date: May 18, 2006
    Applicant: NANYA TECHNOLOGY CORPORATION
    Inventors: Chao-Sung Lai, Woei-Cherng Wu, Jer-Chyi Wang, Kung-Ming Fan, Shian-Jyh Lin