Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: Disclosed is a method of micro/nano imprinting, which applies soft mold, pre-shaping sealing film, and soft holder arrangements to the micro/nano structure imprinting process of the curved substrates. The method of the present invention can prevent the curved surface from crumbling, which may result from high gas pressuring, and can obtain uniform imprinting pressure distribution throughout the whole curved substrate. Moreover, replicating micro/nano structures onto double-sided curve, both convex and concave, surfaces can also be achieved.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The present invention provides a composite light guiding curved surface structure, comprising a structure body and at least one light source. The structure body comprises a light-receiving surface being provided with a plurality of curved surfaces formed thereon, each of which being provided with a plurality of micro lenses. Each micro lens is further provided with a plurality of sub-wavelength anti-reflecting structures. The sub-wavelength anti-reflecting structures also cover the entire curved surface among lenses. At least one light source is disposed on one side of the light-receiving surface to generate a light field projecting to each of the curved surfaces on the light-receiving surface. In the present invention, the micro lens is capable of increasing the diffusing angle for light diffusion; meanwhile, the sub-wavelength anti-reflecting structures are capable of increasing the light transmission efficiency to reduce loss of light at the interface and enhance the utilization of light.

Abstract: Disclosed is a method of micro/nano imprinting, which applies soft mold, pre-shaping sealing film, and soft holder arrangements to the micro/nano structure imprinting process of the curved substrates. The method of the present invention can prevent the curved surface from crumbling, which may result from high gas pressuring, and can obtain uniform imprinting pressure distribution throughout the whole curved substrate. Moreover, replicating micro/nano structures onto double-sided curve, both convex and concave, surfaces can also be achieved.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The present invention provides a micro hot embossing method, which can quick heat and cool, and uniformly pressing an object to be embossed. The object is laid on a mold and a sealing chamber is used to enclose the object and the mold. A high pressure fluid which has a temperature sufficient to heat the object to be thermoplastic is introduced into the chamber for heating and pressing the object. The present invention can quick heat and cool the object, emboss the object using a mold made of bristle material such as glass or silicon wafer, and uniformly press the object in a very large area.