Patents by Inventor Jer-Mind Yang

Jer-Mind Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patterned resist and process
    Patent number: 4737425
    Abstract: A patterned image including on a substrate, a patterned image of a first resist polymeric material and patterned image of a second and different resist material on the first resist polymeric material. The polymeric material contains reactive hydrogen functional groups and/or reactive hydrogen precursor groups. At least the surface layer of the delineated and uncovered first resist polymer material is reacted with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of the polymeric material.
    Type: Grant
    Filed: June 10, 1986
    Date of Patent: April 12, 1988
    Assignee: International Business Machines Corporation
    Inventors: Burn J. Lin, Bea-Jane L. Yang, Jer-Mind Yang