Patents by Inventor Jeremiah Baldwin

Jeremiah Baldwin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system
    Patent number: 11255017
    Abstract: A method for delivering vaporized precursor in a substrate processing system using a vapor delivery system includes (a) selectively supplying push gas to an inlet of an ampoule storing liquid and vaporized precursor during a deposition period of a substrate; (b) measuring a pressure of the push gas and the vaporized precursor at an outlet of the ampoule during the deposition period; (c) determining a maximum pressure during the deposition period; (d) determining an integrated area for the deposition period based on a sampling interval and the maximum pressure during the sampling interval; and (e) repeating (a), (b), (c) and (d) for a plurality of the deposition periods for the substrate.
    Type: Grant
    Filed: June 28, 2019
    Date of Patent: February 22, 2022
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Jun Qian, Purushottam Kumar, Adrien Lavoie, You Zhai, Jeremiah Baldwin, Sung Je Kim
  • SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY SYSTEM OF A SUBSTRATE PROCESSING SYSTEM
    Publication number: 20200407849
    Abstract: A method for delivering vaporized precursor in a substrate processing system using a vapor delivery system includes (a) selectively supplying push gas to an inlet of an ampoule storing liquid and vaporized precursor during a deposition period of a substrate; (b) measuring a pressure of the push gas and the vaporized precursor at an outlet of the ampoule during the deposition period; (c) determining a maximum pressure during the deposition period; (d) determining an integrated area for the deposition period based on a sampling interval and the maximum pressure during the sampling interval; and (e) repeating (a), (b), (c) and (d) for a plurality of the deposition periods for the substrate.
    Type: Application
    Filed: June 28, 2019
    Publication date: December 31, 2020
    Inventors: Jun QIAN, Purushottam KUMAR, Adrien LAVOIE, You ZHAI, Jeremiah BALDWIN, Sung Je KIM
  • Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system
    Patent number: 10351953
    Abstract: A method for delivering vaporized precursor in a substrate processing system using a vapor delivery system includes (a) selectively supplying push gas to an inlet of an ampoule storing liquid and vaporized precursor during a deposition period of a substrate; (b) measuring a pressure of the push gas and the vaporized precursor at an outlet of the ampoule during the deposition period; (c) determining a maximum pressure during the deposition period; (d) determining an integrated area for the deposition period based on a sampling interval and the maximum pressure during the sampling interval; and (e) repeating (a), (b), (c) and (d) for a plurality of the deposition periods for the substrate.
    Type: Grant
    Filed: March 16, 2017
    Date of Patent: July 16, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Jun Qian, Purushottam Kumar, Adrien LaVoie, You Zhai, Jeremiah Baldwin, Sung Je Kim
  • SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY SYSTEM OF A SUBSTRATE PROCESSING SYSTEM
    Publication number: 20180265983
    Abstract: A method for delivering vaporized precursor in a substrate processing system using a vapor delivery system includes (a) selectively supplying push gas to an inlet of an ampoule storing liquid and vaporized precursor during a deposition period of a substrate; (b) measuring a pressure of the push gas and the vaporized precursor at an outlet of the ampoule during the deposition period; (c) determining a maximum pressure during the deposition period; (d) determining an integrated area for the deposition period based on a sampling interval and the maximum pressure during the sampling interval; and (e) repeating (a), (b), (c) and (d) for a plurality of the deposition periods for the substrate.
    Type: Application
    Filed: March 16, 2017
    Publication date: September 20, 2018
    Inventors: Jun Qian, Purushottam Kumar, Adrien LaVoie, You Zhai, Jeremiah Baldwin, Sung Je Kim
  • Systems and methods for vapor delivery in a substrate processing system
    Patent number: 9970108
    Abstract: A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node.
    Type: Grant
    Filed: July 14, 2015
    Date of Patent: May 15, 2018
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Jun Qian, Hu Kang, Purushottam Kumar, Chloe Baldasseroni, Heather Landis, Andrew Kenichi Duvall, Mohamed Sabri, Ramesh Chandrasekharan, Karl Leeser, Shankar Swaminathan, David Smith, Jeremiah Baldwin, Eashwar Ranganathan, Adrien LaVoie, Frank Pasquale, Jeongseok Ha, Ingi Bae
  • SYSTEMS AND METHODS FOR VAPOR DELIVERY
    Publication number: 20160032453
    Abstract: A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node.
    Type: Application
    Filed: July 14, 2015
    Publication date: February 4, 2016
    Inventors: Jun Qian, Hu Kang, Purushottam Kumar, Chloe Baldasseroni, Heather Landis, Andrew Kenichi Duvall, Mohamed Sabri, Ramesh Chandrasekharan, Karl Leeser, Shankar Swaminathan, David Smith, Jeremiah Baldwin, Eashwar Ranganathan, Adrien LaVoie, Frank Pasquale, Jeongseok Ha, lngi Bae
  • Connector backshell
    Patent number: D986825
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: May 23, 2023
    Assignee: Lam Research Corporation
    Inventors: Jeremiah Baldwin, Sudarshan Manjunath, Samuel Jacob Monroe