Abstract: An apparatus and method for purifying semiconductor silicon wafer processing chemicals in line, the apparatus comprising a non-reactive chemical support, and a crown ether polymer covalently bonded to said non-reactive support, is disclosed. In operation, the crown ether polymer contained within the housing is positioned in-line with a wet chemical recirculation line, transfill system or distribution system.

Abstract: An trace analyzer apparatus and method useful in semiconductor processing for measuring trace impurities in gases and liquids comprising a gas chromatograph serving to replace a bulk gas in a composition of bulk gas including contaminants in a bulk gas stream with a carrier gas having a higher ionization potential than that of said contaminants, where such gas chromatograph is connected to a hollow electrode (14) for initiating ionization of said contaminants by electrical discharge, where such electrode is electrically isolated from a source housing (44) and adjacent to a skimmer plate (16) that ionizes trace contaminants that are measured using a mass spectrometer, is disclosed.

Abstract: An apparatus and method for purifying semiconductor silicon wafer processing chemicals in line, the apparatus comprising a non-reactive chemical support, and a crown ether polymer covalently bonded to said non-reactive support, is disclosed. In operation, the crown ether polymer contained within the housing is positioned in-line with a wet chemical recirculation line, transfill system or distribution system.

Abstract: A light beam is passed through a tube containing a material being monitored and a contaminant wherein the light is absorbed by the contaminant or some form of the contaminant to the exclusion of the material being monitored. Since the amount of light passing through the tube is a function of the amount of contaminant in the tube, the amount of light detected at the downstream end of the tube is a function of the amount of contaminant in the material being monitored. The detected light can be used to provide a quantitative indication of the contaminant, to provide an alarm, to shut down the system to which the material being monitored is being delivered or for other purposes. When the material being monitored is HCl gas and the contaminant is moisture, the tube will generally be stainless steel to avoid galvanic effects since the remainder of the pipe system is generally also stainless steel and the light frequency will be from about 1.0 to about 2.

Abstract: A mass spectrometer having a tube permeable to a magnetic flux, preferably glass, and having an exterior surface and an interior surface, the tube having a pair of opposing excite electrodes and a pair of opposing detect electrodes disposed at the interior surface, a pair of spaced apart magnets disposed on the exterior surface of the tube, the excite electrodes and the detect electrodes being disposed at least in part between the pair of magnets, an evacuatable chamber containing the tube and magnets and a pump to evacuate the evacuatable chamber. The excite electrodes are disposed in a first pair of opposing quadrants and the detect electrodes are disposed in a second pair of opposing quadrants, the excite electrodes being parallel to each other and the detect electrodes being substantially parallel to each other and substantially normal to the excite electrodes. The magnets are rare earth magnets, preferably cobalt rare earth magnets or sumarium cobalt rare earth magnets.