Patents by Inventor Jeremiah Trammel

Jeremiah Trammel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND SYSTEM FOR LOW TEMPERATURE ALD
    Publication number: 20190309411
    Abstract: A method and chemical delivery system are provided for low temperature atomic layer deposition. Thus, methods of forming nitrogen-containing thin films by atomic layer deposition using a substantially water free hydrazine gas and plasma treatment are provided.
    Type: Application
    Filed: April 24, 2019
    Publication date: October 10, 2019
    Inventors: Jeffrey J. Spiegelman, Daniel Alvarez, JR., Jian Yang, Russell J. Holmes, Edward Heinlein, Christopher Ramos, Jeremiah Trammel
  • METHOD, SYSTEM, AND DEVICE FOR DELIVERY OF PROCESS GAS
    Publication number: 20190070521
    Abstract: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.
    Type: Application
    Filed: November 5, 2018
    Publication date: March 7, 2019
    Inventors: Daniel Alvarez, JR., Russell J. Holmes, Jeffrey J. Spiegelman, Edward Heinlein, Christopher Ramos, Jeremiah Trammel
  • Method, system, and device for delivery of process gas
    Patent number: 10150048
    Abstract: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.
    Type: Grant
    Filed: April 14, 2017
    Date of Patent: December 11, 2018
    Assignee: Rasirc, Inc.
    Inventors: Daniel Alvarez, Jr., Russell J. Holmes, Jeffrey J. Spiegelman, Edward Heinlein, Christopher Ramos, Jeremiah Trammel
  • METHOD, SYSTEM, AND DEVICE FOR DELIVERY OF PROCESS GAS
    Publication number: 20170216738
    Abstract: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.
    Type: Application
    Filed: April 14, 2017
    Publication date: August 3, 2017
    Inventors: Daniel Alvarez, JR., Russell J. Holmes, Jeffrey J. Spiegelman, Edward Heinlein, Christopher Ramos, Jeremiah Trammel