Patents by Inventor Jeremy Austin

Jeremy Austin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240124625
    Abstract: The present disclosure provides, inter alia, a polymer and oil composition comprising a polymer component, and a synthetic hydrocarbon process oil with a unique branching composition which can be derived from naturally occurring sustainable sources.
    Type: Application
    Filed: October 16, 2023
    Publication date: April 18, 2024
    Inventors: Eduardo BARALT, Jeremy AUSTIN, Jason WELLS, Jason Charles ROSALLI
  • Patent number: 10395981
    Abstract: The present disclosure relates to semiconductor devices and manufacturing techniques in which topography-related contact failures may be reduced by providing a dielectric fill material in a late manufacturing stage. In sophisticated semiconductor devices, the material loss in the trench isolation regions may result in significant contact failures, which may be reduced by levelling the device topography, thereby tolerating a significant lateral overlap of contact elements with trench isolation regions.
    Type: Grant
    Filed: October 25, 2017
    Date of Patent: August 27, 2019
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Hans-Peter Moll, Jeremy Austin Wahl
  • Publication number: 20190122921
    Abstract: The present disclosure relates to semiconductor devices and manufacturing techniques in which topography-related contact failures may be reduced by providing a dielectric fill material in a late manufacturing stage. In sophisticated semiconductor devices, the material loss in the trench isolation regions may result in significant contact failures, which may be reduced by levelling the device topography, thereby tolerating a significant lateral overlap of contact elements with trench isolation regions.
    Type: Application
    Filed: October 25, 2017
    Publication date: April 25, 2019
    Inventors: Hans-Peter Moll, Jeremy Austin Wahl
  • Patent number: 9937760
    Abstract: A self-regulating tire valve for use in pneumatic tires. The self-regulating tire valve includes a tubular housing with a primary channel extending therethrough, a threaded collar on one end of the tubular housing adapted to connect to a source of pressurized air, a cavity positioned adjacent to the primary channel, and a release passageway connecting to a release outlet positioned on the exterior of the tubular housing. A diverting block is positioned with a secondary channel extending therethrough that is moveably positioned within the cavity. When the secondary channel of the diverting block is aligned with the release passageway, air can flow from a second end to a first end of the secondary channel, through the release passageway and exit at the release outlet.
    Type: Grant
    Filed: April 27, 2016
    Date of Patent: April 10, 2018
    Inventor: Jeremy Austin
  • Patent number: 9570344
    Abstract: A method can include forming a contact trench in a semiconductor structure so that the contact trench extends to a contact formation, the forming including using a hardmask layer, and filling the contact trench with a sacrificial material layer, the sacrificial material layer formed over the contact formation. A semiconductor structure can include a sacrificial material layer over a contact formation.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: February 14, 2017
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Vimal Kamineni, Nicholas Vincent Licausi, Shariq Siddiqui, Jeremy Austin Wahl
  • Publication number: 20160379872
    Abstract: A method can include forming a contact trench in a semiconductor structure so that the contact trench extends to a contact formation, the forming including using a hardmask layer, and filling the contact trench with a sacrificial material layer, the sacrificial material layer formed over the contact formation. A semiconductor structure can include a sacrificial material layer over a contact formation.
    Type: Application
    Filed: June 26, 2015
    Publication date: December 29, 2016
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Vimal KAMINENI, Nicholas Vincent LICAUSI, Shariq SIDDIQUI, Jeremy Austin WAHL
  • Patent number: 9508712
    Abstract: A nanowire device is disclosed that includes first and second nanowires, a gate structure positioned around a portion of the first and second nanowires and a phase change material surrounding at least a portion of the first nanowire in the source/drain regions of the device but not surrounding the second nanowire in the source/drain regions.
    Type: Grant
    Filed: January 2, 2014
    Date of Patent: November 29, 2016
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Jeremy Austin Wahl, Nicholas Vincent LiCausi
  • Publication number: 20160325593
    Abstract: A self-regulating tire valve for use in pneumatic tires. The self-regulating tire valve includes a tubular housing with a primary channel extending therethrough, a threaded collar on one end of the tubular housing adapted to connect to a source of pressurized air, a cavity positioned adjacent to the primary channel, and a release passageway connecting to a release outlet positioned on the exterior of the tubular housing. A diverting block is positioned with a secondary channel extending therethrough that is moveably positioned within the cavity. When the secondary channel of the diverting block is aligned with the release passageway, air can flow from a second end to a first end of the secondary channel, through the release passageway and exit at the release outlet.
    Type: Application
    Filed: April 27, 2016
    Publication date: November 10, 2016
    Inventor: Jeremy Austin
  • Publication number: 20160254145
    Abstract: Methods of forming condensed first layer and semiconductor structures formed from the methods are provided. The methods include, for instance providing at least one layer disposed over a substrate structure of a semiconductor structure, wherein the substrate structure includes an upper silicon region; and performing at least one oxidation process of the semiconductor structure, the at least one oxidation process reducing a thickness of the upper region, wherein the performing facilitates diffusing to form a condensed layer over the substrate structure.
    Type: Application
    Filed: February 27, 2015
    Publication date: September 1, 2016
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Dina H. TRIYOSO, Wei Hua TONG, Haoran SHI, Jeremy Austin WAHL, Amy Lynn CHILD
  • Publication number: 20150187762
    Abstract: A nanowire device is disclosed that includes first and second nanowires, a gate structure positioned around a portion of the first and second nanowires and a phase change material surrounding at least a portion of the first nanowire in the source/drain regions of the device but not surrounding the second nanowire in the source/drain regions.
    Type: Application
    Filed: January 2, 2014
    Publication date: July 2, 2015
    Applicant: GLOBALFOUNDRIES Inc.
    Inventors: Jeremy Austin Wahl, Nicholas Vincent LiCausi
  • Patent number: D737726
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: September 1, 2015
    Inventor: Chad Jeremy Austin