Patents by Inventor Jeremy Bilde

Jeremy Bilde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing a colour conversion optoelectronic device, including a step of optically forming surface potential patterns in an electret layer
    Patent number: 12278315
    Abstract: A method for manufacturing an optoelectronic device including an array of diodes and photoluminescent pads arranged opposite at least one diode, including making an electret layer over the array of diodes, by localized polarization or depolarization, optically, so as to form surface potential patterns; and making the photoluminescent pads, by contact of the electret layer with a colloidal solution containing photoluminescent particles, which are then deposited over the upper face of the electret layer opposite the predefined surface potential patterns, thereby forming the photoluminescent pads.
    Type: Grant
    Filed: August 9, 2024
    Date of Patent: April 15, 2025
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Stephane Altazin, Etienne Quesnel, Aurelien Suhm, Jeremy Bilde
  • Method for etching a sacrificial layer for a micro-machined structure
    Patent number: 8541313
    Abstract: A method of etching a sacrificial layer for a micro-machined structure, the sacrificial layer positioned between a layer of a first material and a layer of a second material, the etching being carried out by an etching agent. The method includes: providing at least one species having an affinity for the etching agent greater than that of the layers of first material and second material and less than or equal to that of the sacrificial layer; and then etching the sacrificial layer by the etching agent, the etching being carried out to eliminate at least partially the sacrificial layer and then to eliminate at least partially the species.
    Type: Grant
    Filed: October 25, 2006
    Date of Patent: September 24, 2013
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Stéphan Borel, Jeremy Bilde
  • METHOD FOR ETCHING A SACRIFICIAL LAYER FOR A MICRO-MACHINED STRUCTURE
    Publication number: 20090124088
    Abstract: A method of etching a sacrificial layer for a micro-machined structure, the sacrificial layer positioned between a layer of a first material and a layer of a second material, the etching being carried out by an etching agent. The method includes: providing at least one species having an affinity for the etching agent greater than that of the layers of first material and second material and less than or equal to that of the sacrificial layer; and then etching the sacrificial layer by the etching agent, the etching being carried out to eliminate at least partially the sacrificial layer and then to eliminate at least partially the species.
    Type: Application
    Filed: October 25, 2006
    Publication date: May 14, 2009
    Applicant: Copmissariat A L'Energie Atomique
    Inventors: Stephan Borel, Jeremy Bilde