Abstract: A method for creating metal patterns. A metal oxide film/metal film is deposited on a substrate in a reactor. After the metal oxide film/metal film has been deposited, the desired metal regions/metal oxide regions are formed on the metal oxide film/metal film using a reduction/oxidation reaction. A reducing/oxidizing gas is fed into the reactor. Furthermore, a heat source, such as a thermal probe or a high intensity laser beam, is pulsed to heat and form metal regions/metal oxide regions on the metal oxide film/metal film within the metal's reduction/oxidation window. In this manner, benefits over prior patterning techniques are achieved, including greater control and uniformity, reduced cost, less waste and potential for sub-5 nm features.