Abstract: Systems and methods are provided for forming of batteries using carbon compositions as conductive additives for dense and conductive cathodes. An example battery may include an anode, an electrolyte, and a cathode including an active material, with the active material including 0D conductive carbon particles with nanoscale structure in three dimensions, and 1D conductive carbon particles with nanoscale structure in two dimensions. A ratio of the 1D conductive carbon particles to the 0D conductive carbon particles in the active material may be between 0.5 and 2. For example, the ratio of the 1D conductive carbon particles to the 0D conductive carbon particles may be approximately 1. The 1D carbon particles have a diameter of less than 120 nm, a surface area of 30 m2/g, and/or a dispersive surface energy of more than 180 mJ/m2. The 0D and 1D particles may comprise between 1% and 10% of the active material.

Abstract: Systems and methods for aromatic macrocyclic compounds (Phthalocyanines) as cathode additives for inhibition of transition metal dissolution and stable solid electrolyte interphase formation may include an anode, an electrolyte, and a cathode, where the cathode comprises an active material and a phthalocyanine additive, the additive being coordinated with different metal cationic center and functional groups. The active material may comprise one or more of: nickel cobalt aluminum oxide, nickel cobalt manganese oxide, lithium iron phosphate, lithium cobalt oxide, and lithium manganese oxide, Ni-rich layered oxides LiNi1-xMxO2 where M=Co, Mn, or Al, Li-rich xLi2MnO3(1-x)LiNiaCobMncO2, Li-rich layered oxides LiNi1+xM1?xO2 where M=Co, Mn, or Ni, and spinel oxides LiNi0.5Mn1.5O4.

Abstract: A cosmetic ink composition comprises a particulate material, a polymeric dispersant having a weight average molecular weight of less than about 20,000 daltons, and a polymeric rheology modifier. The particulate material can have a Particle Size Distribution D50 of about 100 nm to about 2,000 nm. The cosmetic ink composition can undergo controlled syneresis, forming a weak colloidal gel phase and a particle-lean, low viscosity phase, which can be printed without interventions such as agitation, mixing, or re-circulation to homogenize the composition.

Abstract: Systems and methods are provided for improvement of cycle life in Si/Li batteries using high temperature deep discharge cycling. One or more deep discharge cycles may be applied to a cell that includes a cathode, a separator, and a silicon-dominant anode, with each of the one or more deep discharge cycles including at least charging and discharging the cell, and with each of the one or more deep discharge cycles being performed at a higher temperature that is above normal operating temperature range. The higher temperature may be 40° C. or higher, 45° C. or higher, or around 45° C.

Abstract: Additives for energy storage devices comprising organic acid compounds are disclosed. The energy storage device comprises a first electrode and a second electrode, where at least one of the first electrode and the second electrode is a Si-based electrode, a separator between the first electrode and the second electrode, and an electrolyte composition. Organic acid compounds may serve as additives to the first electrode, the second electrode and/or the electrolyte.

Abstract: Systems and methods for aromatic macrocyclic compounds (Phthalocyanines) as cathode additives for inhibition of transition metal dissolution and stable solid electrolyte interphase formation may include an anode, an electrolyte, and a cathode, where the cathode comprises an active material and a phthalocyanine additive, the additive being coordinated with different metal cationic center and functional groups. The active material may comprise one or more of: nickel cobalt aluminum oxide, nickel cobalt manganese oxide, lithium iron phosphate, lithium cobalt oxide, and lithium manganese oxide, Ni-rich layered oxides LiNi1-xMxO2 where M=Co, Mn, or Al, Li-rich xLi2MnO3(1-x)LiNiaCobMncO2, Li-rich layered oxides LiNi1+xM1?xO2 where M=Co, Mn, or Ni, and spinel oxides LiNi0.5Mn1.5O4.

Abstract: Systems and methods for aromatic macrocyclic compounds (Phthalocyanines) as cathode additives for inhibition of transition metal dissolution and stable solid electrolyte interphase formation may include an anode, an electrolyte, and a cathode, where the cathode comprises an active material and a phthalocyanine additive, the additive being coordinated with different metal cationic center and functional groups. The active material may comprise one or more of: nickel cobalt aluminum oxide, nickel cobalt manganese oxide, lithium iron phosphate, lithium cobalt oxide, and lithium manganese oxide, Ni-rich layered oxides LiNi1?xMxO2 where M=Co, Mn, or Al, Li-rich xLi2MnO3(1?x)LiNiaCobMncO2, Li-rich layered oxides LiNi1+xM1?O2 where M=Co, Mn, or Ni, and spinel oxides LiNi0.5Mn1.5O4.

Abstract: Systems and methods for aromatic macrocyclic compounds (Phthalocyanines) as cathode additives for inhibition of transition metal dissolution and stable solid electrolyte interphase formation may include an anode, an electrolyte, and a cathode, where the cathode comprises an active material and a phthalocyanine additive, the additive being coordinated with different metal cationic center and functional groups. The active material may comprise one or more of: nickel cobalt aluminum oxide, nickel cobalt manganese oxide, lithium iron phosphate, lithium cobalt oxide, and lithium manganese oxide, Ni-rich layered oxides LiNi1?xMxO2 where M=Co, Mn, or Al, Li-rich xLi2MnO3(1?x)LiNiaCobMncO2, Li-rich layered oxides LiNi1+xM1?O2 where M=Co, Mn, or Ni, and spinel oxides LiNi0.5Mn1.5O4.

Abstract: Systems and methods for carbon compositions as conductive additives for dense and conductive cathodes may include a cathode, an electrolyte, and a cathode active material. The active material may comprise an anode, an electrolyte, and a cathode comprising an active material. The active material may comprise 0D conductive carbon particles with nanoscale structure in three dimensions, and 1D conductive carbon particles with nanoscale structure in two dimensions, where the 1D carbon particles have a diameter of less than 120 nm and a surface area of 30 m2/g. The 0D and 1D particles may comprise between 1% and 10% of the active material. The 1D conductive carbon particles may comprise carbon nanotubes, carbon nanofibers, and/or vapor grown carbon fibers. The cathode active material may comprise nickel cobalt aluminum oxide (NCA), nickel cobalt manganese oxide, lithium iron phosphate, lithium iron phosphate, lithium cobalt oxide, lithium manganese oxide, or mixtures and combinations thereof.

Abstract: Systems and methods for sulfur-containing chemicals as cathode additives for silicon-based lithium ion batteries may include a silicon-based anode, an electrolyte, and a cathode. The cathode may include an active material and a sulfur-containing additive. The cathode active material may include one or more of nickel cobalt aluminum oxide (NCA), nickel cobalt manganese oxide (NCM), lithium iron phosphate (LFP), lithium cobalt oxide (LCO), and lithium manganese oxide (LMO). The sulfur-containing additive may include elemental sulfur and/or Li2S. The sulfur-containing additive may include one or more of lithium polysulfides (Li2Sn, where n=2-8), polysulfides, and organic polysulfides. The sulfur-containing additive may include one or more of metal sulfides, transition metal polysulfide complexes, S-containing organic polymers or copolymer, polymeric sulfur, and transition metal sulfides.

Abstract: A cosmetic ink composition comprises a particulate material, a polymeric dispersant having a weight average molecular weight of less than about 20,000 daltons, and a polymeric rheology modifier. The particulate material can have a Particle Size Distribution D50 of about 100 nm to about 2,000 nm. The cosmetic ink composition can undergo controlled syneresis, forming a weak colloidal gel phase and a particle-lean, low viscosity phase, which can be printed without interventions such as agitation, mixing, or re-circulation to homogenize the composition.

Abstract: A cosmetic ink composition comprises a particulate material, a polymeric dispersant having a weight average molecular weight of less than about 20,000 daltons, and a polymeric rheology modifier. The particulate material can have a Particle Size Distribution D50 of about 100 nm to about 2,000 nm. The cosmetic ink composition can undergo controlled syneresis, forming a weak colloidal gel phase and a particle-lean, low viscosity phase, which can be printed without interventions such as agitation, mixing, or re-circulation to homogenize the composition.

Abstract: A cosmetic ink composition comprises a particulate material, a polymeric dispersant having a weight average molecular weight of less than about 20,000 daltons, and a polymeric rheology modifier. The particulate material can have a Particle Size Distribution D50 of about 100 nm to about 2,000 nm. The cosmetic ink composition can undergo controlled syneresis, forming a weak colloidal gel phase and a particle-lean, low viscosity phase, which can be printed without interventions such as agitation, mixing, or re-circulation to homogenize the composition.

Abstract: An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.

Abstract: An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.

Abstract: A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.

Abstract: An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.

Abstract: A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.

Abstract: A method of forming a semiconductor device is provided. A wafer with a dielectric layer disposed under a photoresist mask is placed in an etch chamber. The dielectric layer is etched. The wafer is raised. A cleaning gas is provided. A plasma is formed from the cleaning gas. A polymer that has formed on the bevel of the wafer is removed using the plasma from the cleaning gas. The wafer is removed from the etch chamber.

Abstract: An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.