Patents by Inventor Jeroen BOUWKNEGT

Jeroen BOUWKNEGT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11086234
    Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Satish Achanta, Jeroen Bouwknegt, Abraham Alexander Soethoudt
  • Publication number: 20210053177
    Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.
    Type: Application
    Filed: January 24, 2019
    Publication date: February 25, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Bert Dirk SCHOLTEN, Satish ACHANTA, Aydar AKCHURIN, Pavlo ANTONOV, Coen Hubertus Matheus BALTIS, Jeroen BOUWKNEGT, Ann-Sophie m. FARLE, Christopher John MASON, Ralph Nicholas PALERMO, Thomas POIESZ, Yuri Johannes Gabriel VAN DE VIJVER, Jimmy Matheus Wilhelmus VAN DE WINKEL
  • Publication number: 20200292947
    Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.
    Type: Application
    Filed: October 11, 2018
    Publication date: September 17, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thomas POIESZ, Satish ACHANTA, Jeroen BOUWKNEGT, Abraham Alexander SOETHOUDT
  • Patent number: 10719019
    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: July 21, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Satish Achanta, Mehmet Ali Akbas, Pavlo Antonov, Jeroen Bouwknegt, Joost Wilhelmus Maria Frenken, Evelyn Wallis Pacitti, Nicolaas Ten Kate, Bruce Tirri, Jan Verhoeven
  • Publication number: 20190332015
    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.
    Type: Application
    Filed: July 6, 2017
    Publication date: October 31, 2019
    Inventors: Thomas POIESZ, Satish ACHANTA, Mehmet Ali AKBAS, Pavlo ANTONOV, Jeroen BOUWKNEGT, Joost Wilhelmus Maria FRENKEN, Evelyn Wallis PACITTI, Nicolaas TEN KATE, Bruce TIRRI, Jan VERHOEVEN