Patents by Inventor Jeroen Broekhuijse

Jeroen Broekhuijse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method of measurement, system and method of alignment, lithographic apparatus and method
    Publication number: 20050046845
    Abstract: A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.
    Type: Application
    Filed: July 2, 2004
    Publication date: March 3, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gerrit Nijmeijer, Anastasius Jacobus Bruinsma, Christiaan Hoogendam, Jeroen Broekhuijse, Sigurd Dressler, Edwin Eduard Nicolaas Krijnen, Robbert Van Leeuwen, Roeland Vanneer, Cornelis Ottens