Patents by Inventor Jeroen Fluit
Jeroen Fluit has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11915960Abstract: A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and an internal wall separating the cassette handling space and the wafer handling space. The cassette handling space is provided with a cassette storage configured to store a plurality of wafer cassettes. The cassette handling space is also provided with a cassette handler configured to transfer wafer cassettes between the cassette storage and a wafer transfer position. The wafer handling space is provided with a wafer handler configured to transfer wafers between a wafer cassette in the wafer transfer position and a wafer boat. The internal wall is provided with a wafer transfer opening adjacent the wafer transfer position for a wafer cassette from or to which wafers are to be transferred. The cassette storage comprises a cassette storage carousel with a diameter between 1.1 and 1.6 meter.Type: GrantFiled: July 22, 2020Date of Patent: February 27, 2024Assignee: ASM IP Holding B.V.Inventor: Jeroen Fluit
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Patent number: 11798830Abstract: A vertical batch furnace assembly for processing wafers having a cassette handling space, a wafer handling space, and a first wall and separating the cassette handling space from the wafer handling space. The first wall has at least one wafer transfer opening in front of which, at a side of the first wall which is directed to the cassette handling space, a wafer transfer position for a wafer cassette is provided. The cassette handling space comprises a cassette storage having a plurality of cassette storage positions and a cassette handler configured to transfer wafer cassettes between the cassette storage positions and the wafer transfer position. The cassette handler has a first cassette handler arm and a second cassette handler arm.Type: GrantFiled: November 3, 2022Date of Patent: October 24, 2023Assignee: ASM IP Holding B.V.Inventors: Theodorus G. M. Oosterlaken, Jeroen Fluit
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Publication number: 20230175136Abstract: The disclosure relates to a substrate processing apparatus, comprising: a first reactor constructed and arranged to process a rack with a plurality of substrates therein; a second reactor constructed and arranged to process a substrate; and, a substrate transfer device constructed and arranged to transfer substrates to and from the first and second reactor. The second reactor may be provided with an illumination system constructed and arranged to irradiate ultraviolet radiation within a range from 100 to 500 nanometers onto a top surface of at least a substrate in the second reactor.Type: ApplicationFiled: January 26, 2023Publication date: June 8, 2023Inventors: Dieter Pierreux, Werner Knaepen, Bert Jongbloed, Jeroen Fluit
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Patent number: 11629407Abstract: The disclosure relates to a substrate processing apparatus, comprising: a first reactor constructed and arranged to process a rack with a plurality of substrates therein; a second reactor constructed and arranged to process a substrate; and, a substrate transfer device constructed and arranged to transfer substrates to and from the first and second reactor. The second reactor may be provided with an illumination system constructed and arranged to irradiate ultraviolet radiation within a range from 100 to 500 nanometers onto a top surface of at least a substrate in the second reactor.Type: GrantFiled: February 21, 2020Date of Patent: April 18, 2023Assignee: ASM IP Holding B.V.Inventors: Dieter Pierreux, Werner Knaepen, Bert Jongbloed, Jeroen Fluit
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Publication number: 20230047885Abstract: A vertical batch furnace assembly for processing wafers having a cassette handling space, a wafer handling space, and a first wall and separating the cassette handling space from the wafer handling space. The first wall has at least one wafer transfer opening in front of which, at a side of the first wall which is directed to the cassette handling space, a wafer transfer position for a wafer cassette is provided. The cassette handling space comprises a cassette storage having a plurality of cassette storage positions and a cassette handler configured to transfer wafer cassettes between the cassette storage positions and the wafer transfer position. The cassette handler has a first cassette handler arm and a second cassette handler arm.Type: ApplicationFiled: November 3, 2022Publication date: February 16, 2023Inventors: Theodorus G.M. Oosterlaken, Jeroen Fluit
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Patent number: 11515187Abstract: A vertical batch furnace assembly for processing wafers having a cassette handling space, a wafer handling space, and a first wall and separating the cassette handling space from the wafer handling space. The first wall has at least one wafer transfer opening in front of which, at a side of the first wall which is directed to the cassette handling space, a wafer transfer position for a wafer cassette is provided. The cassette handling space comprises a cassette storage having a plurality of cassette storage positions and a cassette handler configured to transfer wafer cassettes between the cassette storage positions and the wafer transfer position. The cassette handler has a first cassette handler arm and a second cassette handler arm.Type: GrantFiled: April 28, 2021Date of Patent: November 29, 2022Assignee: ASM IP Holding B.V.Inventors: Theodorus G. M. Oosterlaken, Jeroen Fluit
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Patent number: 11447864Abstract: There is provided a method and apparatus to deposit a molybdenum comprising layer on a substrate by supplying a precursor comprising molybdenum(VI) dichloride dioxide and a first reactant comprising boron and hydrogen to the substrate in a reaction chamber to react and form the molybdenum layer. The first reactant comprising boron and hydrogen may be diborane.Type: GrantFiled: April 6, 2020Date of Patent: September 20, 2022Assignee: ASM IP Holding B.V.Inventor: Jeroen Fluit
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Patent number: 11378337Abstract: The disclosure relates to a door opener to open a door of a cassette with substrates, the opener having a first wall to engage with the cassette and having a first opening to transfer the door and the substrates and a second wall opposite the first wall and having a second opening to transfer substrates. The door opener may have a closure device to hold the door of the cassette and having first and second sides and moveable in a chamber formed between the first and second wall. The opener may have a first actuator to move the closure device in a first direction from a first closing position where the first side closes against the first wall to a second closing position where the second side closes against the second wall, and from the second closing position to a transport position in between the first and second closing positions.Type: GrantFiled: March 23, 2020Date of Patent: July 5, 2022Assignee: ASM IP Holding B.V.Inventor: Jeroen Fluit
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Publication number: 20210343554Abstract: A vertical batch furnace assembly for processing wafers having a cassette handling space, a wafer handling space, and a first wall and separating the cassette handling space from the wafer handling space. The first wall has at least one wafer transfer opening in front of which, at a side of the first wall which is directed to the cassette handling space, a wafer transfer position for a wafer cassette is provided. The cassette handling space comprises a cassette storage having a plurality of cassette storage positions and a cassette handler configured to transfer wafer cassettes between the cassette storage positions and the wafer transfer position. The cassette handler has a first cassette handler arm and a second cassette handler arm.Type: ApplicationFiled: April 28, 2021Publication date: November 4, 2021Inventors: Theodorus G.M. Oosterlaken, Jeroen Fluit
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Publication number: 20210035841Abstract: A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and an internal wall separating the cassette handling space and the wafer handling space. The cassette handling space is provided with a cassette storage configured to store a plurality of wafer cassettes. The cassette handling space is also provided with a cassette handler configured to transfer wafer cassettes between the cassette storage and a wafer transfer position. The wafer handling space is provided with a wafer handler configured to transfer wafers between a wafer cassette in the wafer transfer position and a wafer boat. The internal wall is provided with a wafer transfer opening adjacent the wafer transfer position for a wafer cassette from or to which wafers are to be transferred. The cassette storage comprises a cassette storage carousel with a diameter between 1.1 and 1.6 meter.Type: ApplicationFiled: July 22, 2020Publication date: February 4, 2021Inventor: Jeroen Fluit
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Publication number: 20200332416Abstract: There is provided a method and apparatus to deposit a molybdenum comprising layer on a substrate by supplying a precursor comprising molybdenum(VI) dichloride dioxide and a first reactant comprising boron and hydrogen to the substrate in a reaction chamber to react and form the molybdenum layer. The first reactant comprising boron and hydrogen may be diborane.Type: ApplicationFiled: April 6, 2020Publication date: October 22, 2020Inventor: Jeroen Fluit
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Publication number: 20200309455Abstract: The disclosure relates to a door opener to open a door of a cassette with substrates, the opener having a first wall to engage with the cassette and having a first opening to transfer the door and the substrates and a second wall opposite the first wall and having a second opening to transfer substrates. The door opener may have a closure device to hold the door of the cassette and having first and second sides and moveable in a chamber formed between the first and second wall. The opener may have a first actuator to move the closure device in a first direction from a first closing position where the first side closes against the first wall to a second closing position where the second side closes against the second wall, and from the second closing position to a transport position in between the first and second closing positions.Type: ApplicationFiled: March 23, 2020Publication date: October 1, 2020Inventor: Jeroen Fluit
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Publication number: 20200270752Abstract: The disclosure relates to a substrate processing apparatus, comprising: a first reactor constructed and arranged to process a rack with a plurality of substrates therein; a second reactor constructed and arranged to process a substrate; and, a substrate transfer device constructed and arranged to transfer substrates to and from the first and second reactor. The second reactor may be provided with an illumination system constructed and arranged to irradiate ultraviolet radiation within a range from 100 to 500 nanometers onto a top surface of at least a substrate in the second reactor.Type: ApplicationFiled: February 21, 2020Publication date: August 27, 2020Inventors: Dieter Pierreux, Werner Knaepen, Bert Jongbloed, Jeroen Fluit
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Publication number: 20200168485Abstract: The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured with an elevator to transfer a boat with substrates to the reactor. The apparatus having a boat transfer device to transfer the boat with substrates between a substrate loading station, the first and/or second elevator and a cool down station. The substrate loading station and the cool down station may be arranged on opposite sides of the first and second elevator.Type: ApplicationFiled: November 28, 2018Publication date: May 28, 2020Inventor: Jeroen Fluit
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Patent number: 7375795Abstract: Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.Type: GrantFiled: December 22, 2004Date of Patent: May 20, 2008Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Jeroen Fluit, Bernardus Antonius Johannes Luttikhuis, Peter Spit
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Publication number: 20060132735Abstract: Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.Type: ApplicationFiled: December 22, 2004Publication date: June 22, 2006Applicant: ASML Netherlands B.V.Inventors: Joeri Lof, Jeroen Fluit, Bernardus Luttikhuis, Peter Spit