Patents by Inventor Jeroen-Frank Dekkers

Jeroen-Frank Dekkers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic Projection Apparatus
    Publication number: 20110134399
    Abstract: A lithographic apparatus arranged to transfer a pattern onto a substrate is disclosed. The lithographic apparatus comprises a power supply and an electrical connector. The electrical connector electrically connects the power supply to another component of the lithographic apparatus. The electrical connector comprises a laminate that comprises, in order, a first conducting layer, a first flexible insulating layer, a conductor configured to carry an electrical current, a second flexible insulating layer and a second conducting layer.
    Type: Application
    Filed: June 11, 2010
    Publication date: June 9, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Wilhelmus Damen, Anko Jozef Cornelus Sijben, Johannes Albert Rozenveld, Jeroen-Frank Dekkers, Eugene Maria Brinkhof, Hermannus Antonius Langeler, Petrus Albertus Johannes Francisca Van Gompel
  • Patterning device
    Patent number: 7593094
    Abstract: A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: September 22, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Bert Pieter Van Drieënhuizen, Antonius Johannes Maria Montagne, Jeroen-Frank Dekkers, Paul Klatser, Marcus Hagting
  • Patterning device
    Publication number: 20070296944
    Abstract: A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.
    Type: Application
    Filed: June 26, 2006
    Publication date: December 27, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Bert Pieter Van Drieenhuizen, Anton Montagne, Jeroen-Frank Dekkers, Paul Klatser, Marcus Hagting