Patents by Inventor Jeroen Johannes Sophia M. Mertens

Jeroen Johannes Sophia M. Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8860924
    Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
    Type: Grant
    Filed: August 20, 2012
    Date of Patent: October 14, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia M. Mertens, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
  • Lithographic apparatus and device manufacturing method
    Patent number: 8248577
    Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
    Type: Grant
    Filed: May 3, 2005
    Date of Patent: August 21, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia M. Mertens, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen