Patents by Inventor Jeroen Johannes Sophia Mara Mertens

Jeroen Johannes Sophia Mara Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20080174752
    Abstract: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
    Type: Application
    Filed: March 21, 2008
    Publication date: July 24, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: PIETER RENAAT MARIA HENNUS, JEROEN JOHANNES SOPHIA MARA MERTENS, PATRICK JOHANNES CORNELUS HENDRIK SMULDERS, PETER SMITS
  • Lithographic apparatus and device manufacturing method
    Patent number: 7365827
    Abstract: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
    Type: Grant
    Filed: December 8, 2004
    Date of Patent: April 29, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Renaat Maria Hennus, Jeroen Johannes Sophia Mara Mertens, Patrick Johannes Cornelus Hendrik Smulders, Peter Smits