Patents by Inventor Jeroen Maria Mertens

Jeroen Maria Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sensor and lithographic apparatus
    Publication number: 20070152178
    Abstract: A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.
    Type: Application
    Filed: December 30, 2005
    Publication date: July 5, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rob Adrianus Bastiaensen, Marcel Hemerik, Marcus Van De Kerkhof, Jeroen Maria Mertens, Jacob Sonneveld
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060176458
    Abstract: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
    Type: Application
    Filed: March 15, 2006
    Publication date: August 10, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Maria Derksen, Sjoerd Donders, Christiaan Hoogendam, Joeri Lof, Erik Loopstra, Jeroen Maria Mertens, Johannes Mulkens, Timotheus Sengers, Alexander Straaijer, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060033898
    Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: August 17, 2005
    Publication date: February 16, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Cadee, Johannes Jacobs, Nicolaas Kate, Erik Loopstra, Aschwin Lodewijk Vermeer, Jeroen Maria Mertens, Christianus De Mol, Marcel Hubertus Muitjens, Antonius Van Der Net, Joost Ottens, Johannes Quaedackers, Maria Reuhman-Huisken, Marco Stavenga, Patricius Tinnemans, Martinus Verhagen, Jacobus Johannus Hendricus Verspay, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Smeets, Bart Schoondermark, Franciscus Janssen, Michel Riepen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050264778
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: June 1, 2004
    Publication date: December 1, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Meijer, Jeroen Maria Mertens, Johannes Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen