Patents by Inventor Jeroen Sophia Maria Mertens

Jeroen Sophia Maria Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070132979
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: July 7, 2006
    Publication date: June 14, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Maria Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Lambertus Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Maria Meijer, Jeroen Sophia Maria Mertens, Johannes Hubertus Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Santen
  • Prewetting of substrate before immersion exposure
    Publication number: 20060121209
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.
    Type: Application
    Filed: December 7, 2004
    Publication date: June 8, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Matheus Baselmans, Sjoerd Lambertus Donders, Christiaan Hoogendam, Jeroen Sophia Maria Mertens, Johannes Hubertus Mulkens, Bob Streefkerk