Patents by Inventor Jeroen Verjauw

Jeroen Verjauw has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12087994
    Abstract: A method for forming a modified resonator is provided. In one aspect, the method includes obtaining a resonator on top of a substrate, thereby forming an interface area between a bottom surface of the resonator and a top surface of the substrate. The resonator can include niobium or tantalum. The method also includes contacting the resonator and the substrate with a liquid acidic etching solution selected so as to have a higher etch rate towards the substrate than towards the resonator and a nonzero etch rate towards the resonator.
    Type: Grant
    Filed: October 12, 2021
    Date of Patent: September 10, 2024
    Assignees: IMEC vzw, Katholieke Universiteit Leuven
    Inventors: Antoine Pacco, Massimo Mongillo, Anton Potocnik, Danny Wan, Jeroen Verjauw
  • Publication number: 20220115759
    Abstract: A method for forming a modified resonator is provided. In one aspect, the method includes obtaining a resonator on top of a substrate, thereby forming an interface area between a bottom surface of the resonator and a top surface of the substrate. The resonator can include niobium or tantalum. The method also includes contacting the resonator and the substrate with a liquid acidic etching solution selected so as to have a higher etch rate towards the substrate than towards the resonator and a nonzero etch rate towards the resonator.
    Type: Application
    Filed: October 12, 2021
    Publication date: April 14, 2022
    Inventors: Antoine Pacco, Massimo Mongillo, Anton Potocnik, Danny Wan, Jeroen Verjauw