Abstract: The present invention relates to a method for predicting the shape of a three-dimensional object which has been subjected to a diffusion process for a predetermined duration. The prediction method uses a law of vertical morphing and a law of lateral morphing. The law of lateral morphing applies to a description of the contours of different slices of a sample at standardised heights. The description of the contour of a slice is obtained by a curvilinear Fourier transform of the contour or by a two-dimensional spatial Fourier transform of a contour line approximating said contour. The present invention also relates to the manufacture of a three-dimensional object of a given material and a given nominal shape.

Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, the method including producing an experimental image representative of the structure of the sample and derived from a scanning electron microscope, from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model obtained by algebraic summation of a corrective term, the corrective term being the convolution product between a given convolution kernel and the first theoretical model, the second theoretical model comprising a set of parameters to determine, and determining the set of parameters present in the second theoretical model by means of an adjustment between the second theoretical model and the experimental image.

Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, includes producing an experimental image; from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model U(Pi,ti) describing the signal measured at the position Pi at the instant ti, the second model U(Pi,ti) being obtained by algebraic summation of a corrective term S(Pi,ti); determining the set of parameters present in the second theoretical model; wherein the corrective term S(Pi,ti) is calculated by summing the signal coming from the electric charges deposited by the primary electron beam at a plurality of instants t less than or equal to ti.

Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, includes producing an experimental image; from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model U(Pi,ti) describing the signal measured at the position Pi at the instant ti, the second model U(Pi,ti) being obtained by algebraic summation of a corrective term S(Pi,ti); determining the set of parameters present in the second theoretical model; wherein the corrective term S(Pi,ti) is calculated by summing the signal coming from the electric charges deposited by the primary electron beam at a plurality of instants t less than or equal to ti.

Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, the method including producing an experimental image representative of the structure of the sample and derived from a scanning electron microscope, from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model obtained by algebraic summation of a corrective term, the corrective term being the convolution product between a given convolution kernel and the first theoretical model, the second theoretical model comprising a set of parameters to determine, and determining the set of parameters present in the second theoretical model by means of an adjustment between the second theoretical model and the experimental image.

Abstract: A computer system processing heterogeneous measurements from various metrology apparatuses includes a processor, a storage, and a software platform. The storage includes a recording of direct models expressing the heterogeneous measurements as a function of predefined features of electronic devices or parameters for processing the measurements. The software platform includes a functional cost calculation module and an interface selecting one of plural cost functions. The functional module provides an estimation of a cost by comparison of the heterogeneous measurements with an estimation of the measurements obtained by an application of the direct models to values of predefined features or processing parameters. The software platform includes a functional solver module and an interface selecting one of plural solvers, for an iterative optimization by the solver of the values based on the output of the cost calculation module and by inversion of the direct models.

Abstract: A bolometric detector including an absorption membrane, for converting an incident electromagnetic radiation into heat; and a reflector, for reflecting to the absorption membrane part of the incident electromagnetic radiation having passed there through, is provided. The bolometric detector includes a non-metallic layer, situated between the absorption membrane and the reflector, having a series of index jumps, so as to form a network resonating at a wavelength of interest ?0; the mean pitch of the network is less than ?0; and the optical distance between the absorption membrane and the reflector is substantially equal to a multiple of ?0/2.

Abstract: A calibration method for a CD-SEM technique, includes determining a match function converting at least one parameter obtained by modelling a measurement supplied by the CD-SEM technique into a function of at least one parameter representative of a measurement supplied by a characterisation technique different from the CD-SEM technique, the match function being characterised by a plurality of coefficients; performing measurements on a plurality of patterns chosen to cover the desired validity range for the calibration, the measurements being done using both the CD-SEM technique to be calibrated and the reference technique; determining, from the measurements, a set of coefficients of the match function minimising the distance between the functions of the parameters measured using the reference technique and applying the match function to the parameters obtained by modelling measurements supplied by the CD-SEM; using the set of coefficients during the implementation of the calibrated CD-SEM technique.

Abstract: A bolometric detector including an absorption membrane, for converting an incident electromagnetic radiation into heat; and a reflector, for reflecting to the absorption membrane part of the incident electromagnetic radiation having passed there through, is provided. The bolometric detector includes a non-metallic layer, situated between the absorption membrane and the reflector, having a series of index jumps, so as to form a network resonating at a wavelength of interest ?0; the mean pitch of the network is less than ?0; and the optical distance between the absorption membrane and the reflector is substantially equal to a multiple of ?0/2.

Abstract: A computer system processing heterogeneous measurements from various metrology apparatuses includes a processor, a storage, and a software platform. The storage includes a recording of direct models expressing the heterogeneous measurements as a function of predefined features of electronic devices or parameters for processing the measurements. The software platform includes a functional cost calculation module and an interface selecting one of plural cost functions. The functional module provides an estimation of a cost by comparison of the heterogeneous measurements with an estimation of the measurements obtained by an application of the direct models to values of predefined features or processing parameters. The software platform includes a functional solver module and an interface selecting one of plural solvers, for an iterative optimization by the solver of the values based on the output of the cost calculation module and by inversion of the direct models.

Abstract: An array bolometric detector for detecting an electromagnetic radiation in a predetermined infrared or terahertz wavelength range, including a substrate, and an array of bolometric microplates for the detection of the radiation, suspended above the substrate by support elements. The detector includes a membrane arranged above each microplate, and having patterns having a refractive index smaller than that of the membrane formed therein. The patterns are placed periodically along at least one axis of the membrane, according to a period shorter than or equal to ? n , where ? is a wavelength to be detected and n is the average refractive index of the medium separating the microplate from the membrane. The width of the patterns along the axis increases from a central location of the membrane towards the periphery thereof.

Abstract: A calibration method for a CD-SEM technique, includes determining a match function converting at least one parameter obtained by modelling a measurement supplied by the CD-SEM technique into a function of at least one parameter representative of a measurement supplied by a characterisation technique different from the CD-SEM technique, the match function being characterised by a plurality of coefficients; performing measurements on a plurality of patterns chosen to cover the desired validity range for the calibration, the measurements being done using both the CD-SEM technique to be calibrated and the reference technique; determining, from the measurements, a set of coefficients of the match function minimising the distance between the functions of the parameters measured using the reference technique and applying the match function to the parameters obtained by modelling measurements supplied by the CD-SEM; using the set of coefficients during the implementation of the calibrated CD-SEM technique.

Abstract: Spectral filtering device including a dielectric substrate, a first filter capable of acting as a passband filter in the visible range and having a plurality of first nanostructures with a uniform spacing between each other. Each nanostructure has a portion of dielectric material arranged between two portions of metallic material such that one of the two portions of metallic material is arranged between the substrate and the portion of dielectric material. A second filter capable of acting as a passband filter in the infrared range is also included having a plurality of second nanostructures with a uniform spacing between each other and each comprising a portion of dielectric material of which only one face is in contact with a portion of metallic material.

Abstract: An array bolometric detector for detecting an electromagnetic radiation in a predetermined infrared or terahertz wavelength range, including a substrate, and an array of bolometric microplates for the detection of the radiation, suspended above the substrate by support elements. The detector includes a membrane arranged above each microplate, and having patterns having a refractive index smaller than that of the membrane formed therein. The patterns are placed periodically along at least one axis of the membrane, according to a period shorter than or equal to ? n , where ? is a wavelength to be detected and n is the average refractive index of the medium separating the microplate from the membrane. The width of the patterns along the axis increases from a central location of the membrane towards the periphery thereof.

Abstract: A process for producing an electromagnetic radiation filter includes at least two color filters, each formed from a stack on a stiff substrate of at least one dielectric layer and of metal layers in alternation, in order to transmit at least two colors. The process comprises depositing on said substrate a first metal layer, depositing on said first metal layer a first mechanically deformable dielectric layer having a set thickness e0, depositing on said first dielectric layer a second metal layer, imprinting the stack obtained with a mold applied to the entire surface of the stack and allowing material to be simultaneously moved in at least two zones of the stack, wherein in said at least two zones, two different thicknesses e1, e2 of said first dielectric layer are obtained, these two thicknesses being different from the set thickness e0 in the second depositing step, and removing the mold.

Abstract: Spectral filtering device comprising: a dielectric substrate; a first filter capable of acting as a passband filter in the visible range and comprising a plurality of first nanostructures with a uniform spacing between each other and each comprising a portion of dielectric material arranged between two portions of metallic material such that one of the two portions of metallic material is arranged between the substrate and the portion of dielectric material; a second filter capable of acting as a passband filter in the infrared range and comprising a plurality of second nanostructures with a uniform spacing between each other and each comprising a portion of dielectric material of which only one face is in contact with a portion of metallic material.

Abstract: The general field of the invention is that of devices for focusing light to subwavelength dimensions including at least one focusing structure having a metal film provided with a first aperture that penetrates the film, the aperture having dimensions an order of magnitude smaller than the working wavelength of the focusing device. In the devices according to the invention, the focusing structure has at least one optical cavity placed around the aperture so that, when the structure is illuminated with a radiant flux at the working wavelength of the device, a large part of this flux is concentrated on the aperture by said cavity. Several embodiments are described using various cavities that may comprise plasmon reflectors.

Abstract: The general field of the invention is that of devices for focusing light to subwavelength dimensions including at least one focusing structure having a metal film provided with a first aperture that penetrates the film, the aperture having dimensions an order of magnitude smaller than the working wavelength of the focusing device. In the devices according to the invention, the focusing structure has at least one optical cavity placed around the aperture so that, when the structure is illuminated with a radiant flux at the working wavelength of the device, a large part of this flux is concentrated on the aperture by said cavity. Several embodiments are described using various cavities that may comprise plasmon reflectors.

Abstract: An irreversible optical recording medium comprises at least an active layer presenting a rear face and a front face designed to receive at least an optical writing radiation. The optical writing radiation enables gas bubbles forming write marks to be formed locally in said active layer by means of a layer forming a gas source arranged on the rear face of the active layer. The layer forming the gas source moreover has a thickness less than or equal to 100 nm so as to limit the height of the bubbles formed in the active layer and therefore to improve tracking when read operations are performed. The layer forming the gas source is preferably made of carbon-doped hydrogenated amorphous silicon oxide.

Abstract: A structure, decomposable into at least one elementary structure or base element, is illuminated and then provides an optical response, at least one geometrical parameter of the base element is determined, and a value is attributed to it, a regression algorithm is implemented which determines modified values of the parameter(s), in order to make the difference between the theoretical response of the base element and the acquired result at most equal to a threshold, and to obtain an image of the structure, and as long as the separation between the acquired and theoretical responses is not satisfactory, new subdivisions of the base element(s) are performed.