Abstract: Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a hinged pellicle that is rotated away from the photomask during exposure. The pellicle can be transparent or opaque. In one embodiment, the photomask is supported by a photomask base, and the pellicle is hinged to one side of the photomask base. The pellicle can be moved away from the photomask by a robot arm. When covering the photomask base, the pellicle can be secured to it with a securing mechanism such as a vacuum arrangement. Methods of use are also described.

Abstract: Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths either within or outside the visible spectrum include a pellicle that is removed during exposure. The pellicle sheet can be transparent or opaque. In one embodiment, a pellicle assembly comprises a base member aligned with a photomask, and an upper member in the form of a pellicle frame coupled to a pellicle sheet. The pellicle frame can be removed from the exposure path. When overlying the base member, the pellicle frame can be secured to it with a securing mechanism such as magnets, mating bevels, or mating male and female members. Detaching and handling elements, such as handles and/or recesses, can be provided to detach the pellicle frame from the base member and/or to move the pellicle assembly. Methods of using a pellicle assembly are also described.

Abstract: Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a hinged pellicle that is rotated away from the photomask during exposure. The pellicle can be transparent or opaque. In one embodiment, the photomask is supported by a photomask base, and the pellicle is hinged to one side of the photomask base. The pellicle can be moved away from the photomask by a robot arm. When covering the photomask base, the pellicle can be secured to it with a securing mechanism such as a vacuum arrangement. Methods of use are also described.

Abstract: Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths either within or outside the visible spectrum include a pellicle that is removed during exposure. The pellicle sheet can be transparent or opaque. In one embodiment, a pellicle assembly comprises a base member aligned with a photomask, and an upper member in the form of a pellicle frame coupled to a pellicle sheet. The pellicle frame can be removed from the exposure path. When overlying the base member, the pellicle frame can be secured to it with a securing mechanism such as magnets, mating bevels, or mating male and female members. Detaching and handling elements, such as handles and/or recesses, can be provided to detach the pellicle frame from the base member and/or to move the pellicle assembly. Methods of using a pellicle assembly are also described.