Abstract: A method for performing an assessment of vision is provided, and comprises: determining a current difficulty level for the assessment; displaying a question of the assessment, the question including a visual element that has a movable pattern, the movable pattern having at least one variable attribute that is related to the current difficulty level; in response to receipt of an inputted answer, determining whether the inputted answer is correct; and determining whether the assessment is to be concluded, and in the affirmative, generating a result of the assessment based on the current difficulty level.

Abstract: A method for performing an assessment of vision is provided, and comprises: determining a current difficulty level for the assessment; displaying a question of the assessment, the question including a visual element that has a movable pattern, the movable pattern having at least one variable attribute that is related to the current difficulty level; in response to receipt of an inputted answer, determining whether the inputted answer is correct; and determining whether the assessment is to be concluded, and in the affirmative, generating a result of the assessment based on the current difficulty level.

Abstract: A bonding system and a bonding method for alignment are provided. An optical semiconductor includes a light source and a plurality of protruded elements on a surface thereof. A semiconductor bench includes a light receiving element and a plurality of recess elements on a surface thereof. A sidewall of the protruded elements or a sidewall of the recess elements is slanted. A first metallized layer is disposed on a bonding surface of each protruded element and a second metallized layer is disposed on a bottom surface of each recess element, wherein the first metallized layer is used for bonding with the second metallized layer.

Abstract: A bonding system and a bonding method for alignment are provided. An optical semiconductor includes a light source and a plurality of protruded elements on a surface thereof. A semiconductor bench includes a light receiving element and a plurality of recess elements on a surface thereof. A sidewall of the protruded elements or a sidewall of the recess elements is slanted. A first metallized layer is disposed on a bonding surface of each protruded element and a second metallized layer is disposed on a bottom surface of each recess element, wherein the first metallized layer is used for bonding with the second metallized layer.

Abstract: Compositions having good wrinkle resistance and other properties when made into garments an be made from an ethylene multi-block copolymers. The resulting fabrics and garments often have good chemical resistance, heat-resistances, and are dimensionally stable.

Abstract: Knit fabric compositions have now been discovered that often have a balanced combination of desirable properties. Said fibric compositions comprise fibers of olefin block interpolymers or homogeneous branched ethylene polymers or a combination thereof. The fibers are characterized by an amount of crosslinking such that the fabric is capable of being molded.

Abstract: Dyed fabric compositions have now been discovered that often have a balanced combination of desirable properties. The dyed fabric comprises one or more elastic fibers wherein the elastic fibers comprise the reaction product of at least one ethylene olefin block polymer and at least one crosslinking agent. Often the fabrics are characterized by a color change of greater than or equal to about 3.0 according to AATCC evaluation after a first wash by AATCC61-2003-2A.

Abstract: Knit fabric compositions have now been discovered that often have a balanced combination of desirable properties. Said fibric compositions comprise fibers of olefin block interpolymers or homogeneous branched ethylene polymers or a combination thereof. The fibers are characterized by an amount of crosslinking such that the fabric is capable of being molded.

Abstract: Compositions having good wrinkle resistance and other properties when made into garments an be made from an ethylene multi-block copolymers. The resulting fabrics and garments often have good chemical resistance, heat-resistances, and are dimensionally stable.

Abstract: A plasticized polyurethane gel system comprising the reaction product of an isocyanate compound and a polyol in the presence of an ester plasticizer compound having a total solubility parameter of between about 8.3 and 8.9 or between about 9.1 and 9.7. Said polyurethane systems are cured, cross-linked, non-spewing, grease compatible, and reenterable. This extended polyurethane is further characterized as having superior insulating properties so that it can be used of repairing, encapsulating or reclaiming electrical or telecommunication cables as well as for hard volume encapsulants or general elastomer use.