Patents by Inventor Jerry D. Leonhard

Jerry D. Leonhard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • WAFER PROFILING FOR ETCHING SYSTEM
    Publication number: 20230065641
    Abstract: A substrate etching system includes a support to hold a wafer in a face-up orientation, a dispenser arm movable laterally across the wafer on the support, the dispenser arm supporting a delivery port to selectively dispense a liquid etchant onto a portion of a top face of the wafer, and a monitoring system comprising a probe movable laterally across the wafer on the support.
    Type: Application
    Filed: November 9, 2022
    Publication date: March 2, 2023
    Inventors: Jeffrey Chi Cheung, John Ghekiere, Jerry D. Leonhard, David P. Surdock, Benjamin Shafer, Ray Young
  • Wafer profiling for etching system
    Patent number: 11501986
    Abstract: A substrate etching system includes a support to hold a wafer in a face-up orientation, a dispenser arm movable laterally across the wafer on the support, the dispenser arm supporting a delivery port to selectively dispense a liquid etchant onto a portion of a top face of the wafer, and a monitoring system comprising a probe movable laterally across the wafer on the support.
    Type: Grant
    Filed: May 5, 2017
    Date of Patent: November 15, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Jeffrey Chi Cheung, John Ghekiere, Jerry D. Leonhard, David P. Surdock, Benjamin Shafer, Ray Young
  • Photomask cleaning processes
    Patent number: 10816895
    Abstract: Methods of cleaning a photomask may include heating residual coupling material on a surface of the photomask. The photomask may be characterized by active regions and edge regions. The residual coupling material may be located on portions of the edge regions of the photomask. The methods may include applying an etchant to the residual coupling material. The methods may also include rinsing the etchant from the photomask. A portion of the active regions of the photomask may be maintained substantially free of the etchant during the method.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: October 27, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Bruce Fender, Jerry D. Leonhard
  • PHOTOMASK CLEANING PROCESSES
    Publication number: 20190079388
    Abstract: Methods of cleaning a photomask may include heating residual coupling material on a surface of the photomask. The photomask may be characterized by active regions and edge regions. The residual coupling material may be located on portions of the edge regions of the photomask. The methods may include applying an etchant to the residual coupling material. The methods may also include rinsing the etchant from the photomask. A portion of the active regions of the photomask may be maintained substantially free of the etchant during the method.
    Type: Application
    Filed: September 10, 2018
    Publication date: March 14, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Bruce Fender, Jerry D. Leonhard
  • WAFER PROFILING FOR ETCHING SYSTEM
    Publication number: 20170323806
    Abstract: A substrate etching system includes a support to hold a wafer in a face-up orientation, a dispenser arm movable laterally across the wafer on the support, the dispenser arm supporting a delivery port to selectively dispense a liquid etchant onto a portion of a top face of the wafer, and a monitoring system comprising a probe movable laterally across the wafer on the support.
    Type: Application
    Filed: May 5, 2017
    Publication date: November 9, 2017
    Inventors: Jeffrey Chi Cheung, John Ghekiere, Jerry D. Leonhard, David P. Surdock, Benjamin Shafer, Ray Young