Patents by Inventor Jesper Erdman Hansen

Jesper Erdman Hansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for providing alignment of a probe
    Patent number: 8378697
    Abstract: A method for aligning a probe relative to a supporting substrate defining a first planar surface, an edge, and a first crystal plane includes the steps of masking the surface of the substrate to define an exposed area on the first surface at the edge; and etching, using an etch reagent, a recess in the exposed area, the recess defining first and second opposed sidewalls, an end wall remote from the edge, and a bottom wall. The method further includes the step of providing a probe substrate defining a second planar surface and a second crystal plane identical to the first crystal plane, and positioning the probe substrate so that the first and the second crystal planes are positioned identically when forming a probe from the probe substrate using the etch reagent, wherein the probe defines congruent surfaces to the first and second sidewalls.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: February 19, 2013
    Assignee: Capres A/S
    Inventors: Peter Folmer Nielsen, Peter R. E. Petersen, Jesper Erdman Hansen
  • METHOD FOR PROVIDING ALIGNMENT OF A PROBE
    Publication number: 20110169515
    Abstract: A method for aligning a probe relative to a supporting substrate defining a first planar surface, an edge, and a first crystal plane includes the steps of masking the surface of the substrate to define an exposed area on the first surface at the edge; and etching, using an etch reagent, a recess in the exposed area, the recess defining first and second opposed sidewalls, an end wall remote from the edge, and a bottom wall. The method further includes the step of providing a probe substrate defining a second planar surface and a second crystal plane identical to the first crystal plane, and positioning the probe substrate so that the first and the second crystal planes are positioned identically when forming a probe from the probe substrate using the etch reagent, wherein the probe defines congruent surfaces to the first and second sidewalls.
    Type: Application
    Filed: March 25, 2011
    Publication date: July 14, 2011
    Inventors: Peter Folmer NIELSEN, Peter R.E. PETERSEN, Jesper Erdman HANSEN
  • Method for providing alignment of a probe
    Patent number: 7936176
    Abstract: A method for aligning a probe relative to a supporting substrate defining a first planar surface, an edge, and a first crystal plane includes the steps of masking the surface of the substrate to define an exposed area on the first surface at the edge; and etching, using an etch reagent, a recess in the exposed area, the recess defining first and second opposed sidewalls, an end wall remote from the edge, and a bottom wall. The method further includes the step of providing a probe substrate defining a second planar surface and a second crystal plane identical to the first crystal plane, and positioning the probe substrate so that the first and the second crystal planes are positioned identically when forming a probe from the probe substrate using the etch reagent, wherein the probe defines congruent surfaces to the first and second sidewalls.
    Type: Grant
    Filed: June 21, 2005
    Date of Patent: May 3, 2011
    Assignee: Capres A/S
    Inventors: Peter Folmer Nielsen, Peter R. E. Petersen, Jesper Erdman Hansen
  • Method for Providing Alignment of a Probe
    Publication number: 20090009200
    Abstract: A method for aligning a probe relative to a Supporting substrate defining a first planar surface, an edge, and a first crystal plane includes the steps of masking the surface of the substrate to define an exposed area on the first surface at the edge; and etching, using an etch reagent, a recess in the exposed area, the recess defining first and second opposed sidewalls, an end wall remote from the edge, and a bottom wall. The method further includes the step of providing a probe substrate defining a second planar surface and a second crystal plane identical to the first crystal plane, and positioning the probe substrate so that the first and the second crystal planes are positioned identically when forming a probe from the probe substrate using the etch reagent, wherein the probe defines congruent surfaces to the first and second sidewalls.
    Type: Application
    Filed: June 21, 2005
    Publication date: January 8, 2009
    Applicant: Capres A/S
    Inventors: Peter Folmer Nielsen, Peter R.E. Petersen, Jesper Erdman Hansen