Abstract: An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

Abstract: An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

Abstract: A device for improving resolution capability of an x-ray optical apparatus for an x-ray incident from a direction of incidence includes a mirror element including a mirror edge formed as a cylindrical shell section around an edge axis. The mirror element is spaced apart, in a radial direction, from a focal axis that is parallel to the direction of incidence. The edge axis is oriented at a first non-zero angle relative to the focal axis when viewed along a radial axis. The edge axis is oriented at a second non-zero angle relative to the focal axis.

Abstract: The present invention describes a device for improving the resolution capability of an x-ray optical apparatus for an x-ray (24) incident from a direction of incidence, which device comprises a mirror element (52, 54) with a mirror edge (52), the mirror edge (52) being formed around an edge axis (58) by a cylindrical shell section, the mirror element (52, 54) being arranged spaced apart in a radial direction (42) with respect to a focal axis (25) parallel to the direction of incidence by a focal point of the x-ray optical apparatus, and the mirror element (52, 54) being furthermore arranged rotated about an axis extending in the radial direction (42) with respect to the direction of incidence such that the edge axis (58) is tilted with respect to the direction of incidence.

Abstract: An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

Abstract: A system is described for the optical detection of a distant object, having a light beam generating device for generating a parallel light beam, a scanning unit for generating a scan pattern by deflecting the parallel light beam over a defined angular range, and a detector unit for detecting light reflected by the distant object. The scanning unit includes a rotating polygonal mirror with several reflecting partial mirror surfaces. The light beam generating device is provided for generating a parallel light beam in two different beam positions which, in response to a rotating position indicating signal indicating the rotating position of the polygonal mirror, can be switched over from a partial mirror surface to an adjacent partial mirror surface. Accordingly, a system is provided for the optical direction of a distant object, which system has a high capacity.

Abstract: A fly's eye condenser (15) for converting an input light distribution into an output light distribution has at least one raster arrangement of optical groups (21, 22), of which at least some comprise polarization-changing means (30) suitable for changing polarization. The polarization-changing means include at least one layer of birefringent material associated with an optical group. The layer of birefringent material of at least two optical groups has a different thickness in a passage direction of the light. The fly's eye condenser thus permits specific, location-dependent control of the polarization state of the output light distribution. If the fly's eye condenser is used in an illumination system (10), then it can be used not only to homogenize the light distribution on the illumination plane of the illumination system but, at the same time, a location-dependent or angle-dependent polarization distribution can also be set in the illumination plane.

Abstract: An optical system for providing a useful light beam, having one or more optical components (3, 4, 5) which attenuate a useful light fraction with a first linear polarization state less strongly than a useful light fraction with a second linear polarization state different from the first state. A compensation unit is provided which includes a transmission plate (9) that is introduced into the useful light beam path (7) inclined (?) to the optical axis, and attenuates the useful light fraction with the first linear polarization state more strongly than that with the second linear polarization state. As a result, the imbalance, caused by the system without a compensation unit, of the two useful light fractions can be compensated completely or in any case partially. The optical system is used, for example, in illuminating systems and projection objectives of microlithographic projection exposure apparatuses.

Abstract: A system is described for the optical detection of a distant object, having a light beam generating device for generating a parallel light beam, a scanning unit for generating a scan pattern by deflecting the parallel light beam over a defined angular range, and a detector unit for detecting light reflected by the distant object. The scanning unit includes a rotating polygonal mirror with several reflecting partial mirror surfaces. The light beam generating device is provided for generating a parallel light beam in two different beam positions which, in response to a rotating position indicating signal indicating the rotating position of the polygonal mirror, can be switched over from a partial mirror surface to an adjacent partial mirror surface. Accordingly, a system is provided for the optical direction of a distant object, which system has a high capacity.

Abstract: A zoom system that is particularly suited to use on an illumination device of a microlithographic projection exposure system and is configured in the form of a focal-length-zooming lens. The lenses of the zoom system define an object plane (6) and an image plane (8) that is a Fourier transform of the object plane. Both an intermediate pupillary plane (25) that is conjugate to the image plane and an intermediate field plane (27) that is a Fourier transform of the image plane lie between the object plane (6) and image plane (8). At least one movable lens (31, 32) is arranged in the vicinity of these intermediate image planes (25, 27). The system is characterized by a large expansion of the illuminated area on the image plane for short lengths of travel and light weights of these movable lenses (31, 32).

Abstract: An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.

Abstract: A zoom system for an illumination device of a microlithographic projection exposure system is configured in the form of a focal-length zoom lens. The lenses of the zoom system define an object plane (6) and an image plane (8) that is a Fourier transform of the object plane. The zoom system is characterized by a large expansion of the illuminated area in the image plane, where expansion factors (D) in excess of four are feasible and are obtained by employing lens groups (33, 36) that are movable over large moving ranges.

Abstract: A zoom system that is particularly suited to use on an illumination device of a microlithographic projection exposure system and is configured in the form of a focal-length-zooming lens. The lenses of the zoom system define an object plane (6) and an image plane (8) that is a Fourier transform of the object plane. Both an intermediate pupillary plane (25) that is conjugate to the image plane and an intermediate field plane (27) that is a Fourier transform of the image plane lie between the object plane (6) and image plane (8). At least one movable lens (31, 32) is arranged in the vicinity of these intermediate image planes (25, 27). The system is characterized by a large expansion of the illuminated area on the image plane for short lengths of travel and light weights of these movable lenses (31, 32).

Abstract: An optical system for providing a useful light beam, having one or more optical components (3, 4, 5) which attenuate a useful light fraction with a first linear polarization state less strongly than a useful light fraction with a second linear polarization state different from the first state. A compensation unit is provided which includes a transmission plate (9) that is introduced into the useful light beam path (7) inclined (&bgr;) to the optical axis, and attenuates the useful light fraction with the first linear polarization state more strongly than that with the second linear polarization state. As a result, the imbalance, caused by the system without a compensation unit, of the two useful light fractions can be compensated completely or in any case partially. The optical system is used, for example, in illuminating systems and projection objectives of microlithographic projection exposure apparatuses.

Abstract: An optical integrator for an illumination device of a microlithographic projection exposure system has a rod made of a material transparent for ultraviolet light and with a rectangular cross-section. A rod arrangement with, for example, seven small rods made of the same material is arranged before the entrance surface of the rod. The aspect ratio between width and height of the small rods is the inverse of the aspect ratio between width and height of the rod. The rod arrangement, or some analogous structure, surface or treatment substituted therefor, serves to compensate the direction-dependent total reflection losses of the rod.

Abstract: A projection exposure system, in particular for microlithography, serves to generate an image of an object disposed in an object plane in an image plane. For this purpose, use is made of a light source emitting projection light, illumination optics disposed in the beam path between the light source and the object plane and projection optics disposed in the beam path between the object plane and the image plane. Disposed in the vicinity of a field plane of the illumination optics is at least one optical element that changes the angular illumination distribution of the projection light passing through. The change, impressed by the optical element, in the angular illumination distribution is non-rotationally symmetrical with respect to the optical axis. The optical element can be disposed in various angular positions around an axis perpendicular to the field plane. Such an optical element makes it possible to modify the symmetry of the angular illumination distribution flexibly.

Abstract: An illumination system having a rod integrator and an objective for imaging an object field onto an image field, which has an entry surface, an exit surface, and reflecting side surfaces. A lens-free interspace with an axial size of at least 30 mm is in the objective. A plane within this interspace is optically conjugate to the plane of the entry surface. All rays starting from a central field within the entry surface that are not reflected at the side surfaces have smaller ray heights in the lens-free interspace in relation to the optical axis than all the rays starting from the central field that are reflected at the side surfaces; the ratio of the field width to the width of the entry surface is at most 0.7. The ratio of the field height to the height of the entry surface is at most 0.7.

Abstract: A microlithographic projection exposure arrangement has an off-axis field and has a catoptric or catadioptric projection objective (P). In this arrangement, the illumination system (ILL) is made as small as possible in that a lateral offset (&Dgr;y) of the optical axes (OAI, OAP) is introduced relative to each other. A corrective element (AE) is arranged off-axis and functions to adapt the telecentry.

Abstract: The invention relates to an illuminating system of a microlithographic projection exposure arrangement having a light source (1), a first objective (7), a fly-eye-integrator (11), a diaphragm plane (13), a condenser optic (15), and an image plane (21) having a field to be illuminated. The fly-eye-integrator (11) includes at least a first one-dimensional array (39) of first cylinder lenses having first cylinder axes and a second one-dimensional array (47) of second cylinder lenses having second cylinder axes. The second cylinder axes are aligned perpendicularly to the first cylinder axes. A third one-dimensional array (35) of third cylinder lenses having third cylinder axes are mounted forward of the first array (39) to increase divergence. The third cylinder axes are aligned parallelly to the first cylinder axes and a fourth one-dimensional array (43) of fourth cylinder lenses having fourth cylinder axes is arranged forward of the second array (47) for increasing divergence.

Abstract: A zoom system for an illumination device of a microlithographic projection exposure system is configured in the form of a focal-length zoom lens. The lenses of the zoom system define an object plane (6) and an image plane (8) that is a Fourier transform of the object plane. The zoom system is characterized by a large expansion of the illuminated area in the image plane, where expansion factors (D) in excess of four are feasible and are obtained by employing lens groups (33, 36) that are movable over large moving ranges.