Patents by Inventor Jesse Chien-Hua Shan

Jesse Chien-Hua Shan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for deposition of high stress silicon dioxide using silane based dual frequency PECVD process
    Patent number: 6207590
    Abstract: A method of forming a silicon dioxide layer in a process chamber is disclosed. The process comprises: flowing silane into the process chamber; flowing N2O into the process chamber; generating a RF signal at a first predetermined power at a first frequency; and generating a RF signal at a second predetermined power at a second frequency.
    Type: Grant
    Filed: November 19, 1999
    Date of Patent: March 27, 2001
    Assignee: Wafertech, Inc.
    Inventor: Jesse Chien-Hua Shan