Abstract: A rotary tool assembly includes a main body, a motor disposed in the main body, and a power source coupled to the main body. The power source being configured to provide electrical power to the motor. A rotary tool attached to the main body. The rotary tool configured to be actuated by the motor. A first bit storage area disposed on the main body. The first bit storage area being configured to receive a first bit. A second bit storage area disposed on the main body. The second bit storage area being configured to receive a second bit.

Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.

Abstract: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of hot gas layers present on the face of the grating. In preferred embodiments a stream of gas is directed across the face of the grating. In other embodiments the effect of the hot gas layer is reduced with the use of helium as a purge gas and in other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.

Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.

Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.

Abstract: A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage, wavelength by controlling the position of an RMAX mirror and bandwidth is controller by adjusting the curvature of a grating to shapes more complicated than simple convex or simple concave. A preferred embodiment provides seven piezoelectric driven pressure-tension locations on the back side of the grating at 5 horizontal locations to produce shapes such as S shapes, W shapes and twisted shapes. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt.

Abstract: A portable laser beam monitor utilizes a plurality of optical trains to monitor ultraviolet laser beam profiles at a plurality of positions along a laser beam path. A preferred embodiment useful for monitoring beam profiles of lithography lasers measures the beam profile at the front aperture, the rear aperture, the shutter plane and at infinity (the divergence plane). The beam profiles are imaged on a fluorescent screen which is monitored by a visible light camera. Images of the profiles may be discharged on the screen of a lap top computer.

Abstract: The present invention includes a system and method for characterizing the wavelength of a beam of radiation using a known reference transition. The invention comprises a vapor including a material having a transition which absorbs radiation of a known wavelength, the vapor being contained in a container. The container includes an optical path along which the beam of radiation can propagate through the vapor. A dispersive optical element is aligned along the optical path. A detector is aligned along the optical path after the dispersive element. Wavelength information about the beam of radiation is determined from the position of a dip in the detector signal that is correlated to the known reference transition. This method is most useful when the laser bandwidth substantially exceeds the transition bandwidth.

Abstract: A first double pass etalon based spectrometer. In a preferred embodiment a second etalon matched to the first double pass etalon is used to produce extremely precise fringe data. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are directed through a second etalon and focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing the extremely precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.

Abstract: A wavelength system for measuring the bandwidth of a narrowband laser utilizing prior art equipment normally provided for calibrating wavelength measurement equipment. The prior art includes a wavemeter for measuring incremental changes in wavelength and an atomic wavelength reference for calibrating the wavemeter. The atomic wavelength reference includes a vapor cell for providing a vapor having at least one absorption line near a desired operating wavelength. The system includes a wavelength tuning device with a tuning range sufficient to tune the laser to operate at the wavelength of the absorption line in order to calibrate the wavemeter. Measurements of the bandwidth of the absorption spectrum obtained by scanning the laser output wavelength over the absorption line are used to estimate the bandwidth of the output beam. This estimate in a preferred embodiment is used to confirm the accuracy of the normal bandwith measurements. In a preferred system the laser is a KrF laser and the vapor is iron vapor.

Abstract: A first double pass etalon based spectrometer. In a preferred embodiment a second etalon matched to the first double pass etalon is used to produce extremely precise fringe data. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are directed through a second etalon and focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing the extremely precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.

Abstract: A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage, wavelength by controlling the position of an RMAX mirror in a line narrowing module and bandwidth is controller by adjusting the curvature of a grating in the line narrowing module. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt.

Abstract: A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage. Wavelength is controlled by very fine and rapid positioning of an RMAX mirror in a line narrowing module. Bandwidth is controller by adjusting the curvature of a grating in the line narrowing module. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt. Other preferred embodiments include automatic adjustment of the horizontal position of the laser chamber within the resonance cavity. In preferred embodiments, feedback signals from a wavelength monitor are used to position the RMAX mirror. In other preferred embodiments a separate laser beam reflected off the RMAX mirror on to a photodiode array is used to position the mirror.

Abstract: In one embodiment of the invention, phosphor powder in a binder is deposited on a flat first side of a fused silica substrate. The UV output of a laser beam is reflected off an angled beam splitter so as to be incident upon a flat second side of the fused silica substrate. The phosphor is energized by the UV light transmitted through the fused silica and re-radiates a visible wavelength. The binder is selected to be opaque to UV wavelengths so that only a thin layer (10-20 microns) of the phosphor is energized by the incident UV beam. Since the energized phosphor layer against the first side of the substrate is extremely thin and flat, the energized phosphor produces a visible light which precisely corresponds to the incident UV light. The visible light may then be used to determine the characteristics of the UV beam.

Abstract: An apparatus for responding to incident electromagnetic radiation includes a first medium having a surface and through which incident electromagnetic radiation may be transmitted, a second such medium having a surface, the surfaces being generally parallel, and smectic liquid crystal between said surfaces and aligned generally in parallel in layers that extend generally parallel to each other and perpendicularly to such surfaces (bookshelf alignment), the liquid crystal material being operative to undergo self-focusing in response to a characteristic of incident electromagnetic radiation exceeding a value and being cooperative with at least one of such media thereby automatically to limit the energy or energy density of electromagnetic radiation exiting the apparatus.