Patents by Inventor Jesse HUFFSTETLER

Jesse HUFFSTETLER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250028241
    Abstract: The present disclosure relates to thiol-acrylate photopolymerizable resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing in an oxygen environment, the resin comprising: a crosslinking component; at least one monomer and/or oligomer; and a chain transfer agent comprising at least one of a thiol, a secondary alcohol, and/or a tertiary amine, wherein the resin may be configured to react by exposure to light to form a cured material.
    Type: Application
    Filed: February 28, 2024
    Publication date: January 23, 2025
    Inventors: Benjamin LUND, Jesse HUFFSTETLER, Daniel ZAMORANO, Sushanta DAS, Crystal NIERMANN, Caleb LUND, Amy NGUYEN, Yili WU, Walter VOIT
  • Publication number: 20220356363
    Abstract: The present disclosure relates to thiol-acrylate photopolymerizable resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: an acrylate oligomer; a methacrylate monomer; and a thiol wherein the resin may be configured to react by exposure to light to form a cured material. The resin may further comprise one or more oligomeric additives. For example, polyether oligomeric additives such as polytetrahydrofuran.
    Type: Application
    Filed: July 23, 2020
    Publication date: November 10, 2022
    Applicant: Adaptive 3D Technologies, LLC
    Inventors: Benjamin R. Lund, Jesse HUFFSTETLER
  • Publication number: 20210088898
    Abstract: The present disclosure relates to thiol-acrylate photopolymerizable resin compositions. The resin compositions may be used for additive manufacturing. One embodiments of the invention includes a photopolymerizable resin for additive manufacturing in an oxygen environment, the resin comprising: a crosslinking component; at least one monomer and/or oligomer; and a chain transfer agent comprising at least one of a thiol, a secondary alcohol, and/or a tertiary amine, wherein the resin may be configured to react by exposure to light to form a cured material.
    Type: Application
    Filed: December 7, 2020
    Publication date: March 25, 2021
    Inventors: Benjamin LUND, Jesse HUFFSTETLER, Daniel ZAMORANO, Sushanta DAS, Crystal NIERMANN, Caleb LUND, Amy NGUYEN, Yili WU, Walter VOIT
  • Publication number: 20210088900
    Abstract: The present disclosure relates to thiol-acrylate photopolymerizable resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing in an oxygen environment, the resin comprising: a crosslinking component; at least one monomer and/or oligomer and a chain transfer agent comprising at least one of a thiol, a secondary alcohol, and/or a tertiary amine, wherein the resin may be configured to react by exposure to light to form a cured material.
    Type: Application
    Filed: December 7, 2020
    Publication date: March 25, 2021
    Inventors: Benjamin LUND, Jesse HUFFSTETLER, Daniel ZAMORANO, Sushanta DAS, Crystal NIERMANN, Caleb LUND, Amy NGUYEN, Yili WU, Walter VOIT
  • Publication number: 20210018835
    Abstract: The present disclosure relates to thiol-acrylate photopolymerizable resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing in an oxygen environment, the resin comprising: a crosslinking component; at least one monomer and/or oligomer; and a chain transfer agent comprising at least one of a thiol, a secondary alcohol, and/or a tertiary amine, wherein the resin may be configured to react by exposure to light to form a cured material.
    Type: Application
    Filed: March 28, 2019
    Publication date: January 21, 2021
    Inventors: Benjamin LUND, Jesse HUFFSTETLER, Daniel ZAMORANO, Sushanta DAS, Caleb LUND, Crystal NIERMANN, Amy NGUYEN, Yili WU, Walter VOIT