Patents by Inventor Jheng-Jie Ruan

Jheng-Jie Ruan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflection substrate structure and manufacturing method thereof
    Patent number: 10236395
    Abstract: A manufacturing method of antireflection substrate structure includes: providing a silicon wafer having a first rough surface; forming an antireflection optical film on the silicon wafer, wherein the antireflection optical film conformally overlays the first rough surface; performing a surface treatment on the antireflection optical film so that the antireflection optical film has a hydrophilic surface, and the hydrophilic surface is relatively far away from the silicon wafer; dropping a colloidal solution on the hydrophilic surface of the antireflection optical film, wherein the colloidal solution includes a solution and multiple nano-balls and the nano-balls are adhered onto the hydrophilic surface; and performing an etching process on the hydrophilic surface of the antireflection optical film by taking the nano-balls as an etching mask so as to form a second rough surface, wherein the roughness of the second rough surface is different from the roughness of the first rough surface.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: March 19, 2019
    Assignees: Tatung Company, TATUNG UNIVERSITY
    Inventors: Chiung-Wei Lin, Jheng-Jie Ruan, Yi-Liang Chen, Hsien-Chieh Lin
  • ANTIREFLECTION SUBSTRATE STRUCTURE AND MANUFACTURING METHOD THEREOF
    Publication number: 20160079449
    Abstract: A manufacturing method of antireflection substrate structure includes: providing a silicon wafer having a first rough surface; forming an antireflection optical film on the silicon wafer, wherein the antireflection optical film conformally overlays the first rough surface; performing a surface treatment on the antireflection optical film so that the antireflection optical film has a hydrophilic surface, and the hydrophilic surface is relatively far away from the silicon wafer; dropping a colloidal solution on the hydrophilic surface of the antireflection optical film, wherein the colloidal solution includes a solution and multiple nano-balls and the nano-balls are adhered onto the hydrophilic surface; and performing an etching process on the hydrophilic surface of the antireflection optical film by taking the nano-balls as an etching mask so as to form a second rough surface, wherein the roughness of the second rough surface is different from the roughness of the first rough surface.
    Type: Application
    Filed: November 24, 2015
    Publication date: March 17, 2016
    Inventors: Chiung-Wei Lin, Jheng-Jie Ruan, Yi-Liang Chen, Hsien-Chieh Lin
  • Antireflection substrate structure and manufacturing method thereof
    Patent number: 9224893
    Abstract: A manufacturing method of antireflection substrate structure includes: providing a silicon wafer having a first rough surface; forming an antireflection optical film on the silicon wafer, wherein the antireflection optical film conformally overlays the first rough surface; performing a surface treatment on the antireflection optical film so that the antireflection optical film has a hydrophilic surface, and the hydrophilic surface is relatively far away from the silicon wafer; dropping a colloidal solution on the hydrophilic surface of the antireflection optical film, wherein the colloidal solution includes a solution and multiple nano-balls and the nano-balls are adhered onto the hydrophilic surface; and performing an etching process on the hydrophilic surface of the antireflection optical film by taking the nano-balls as an etching mask so as to form a second rough surface, wherein the roughness of the second rough surface is different from the roughness of the first rough surface.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: December 29, 2015
    Assignees: Tatung Company, TATUNG UNIVERSITY
    Inventors: Chiung-Wei Lin, Jheng-Jie Ruan, Yi-Liang Chen, Hsien-Chieh Lin
  • ANTIREFLECTION SUBSTRATE STRUCTURE AND MANUFACTURING METHOD THEREOF
    Publication number: 20140159187
    Abstract: A manufacturing method of antireflection substrate structure includes: providing a silicon wafer having a first rough surface; forming an antireflection optical film on the silicon wafer, wherein the antireflection optical film conformally overlays the first rough surface; performing a surface treatment on the antireflection optical film so that the antireflection optical film has a hydrophilic surface, and the hydrophilic surface is relatively far away from the silicon wafer; dropping a colloidal solution on the hydrophilic surface of the antireflection optical film, wherein the colloidal solution includes a solution and multiple nano-balls and the nano-balls are adhered onto the hydrophilic surface; and performing an etching process on the hydrophilic surface of the antireflection optical film by taking the nano-balls as an etching mask so as to form a second rough surface, wherein the roughness of the second rough surface is different from the roughness of the first rough surface.
    Type: Application
    Filed: February 7, 2013
    Publication date: June 12, 2014
    Applicants: TATUNG UNIVERSITY, TATUNG COMPANY
    Inventors: Chiung-Wei Lin, Jheng-Jie Ruan, Yi-Liang Chen, Hsien-Chieh Lin