Patents by Inventor JHIH-GONG LIN

JHIH-GONG LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing pad and method for making the same
    Patent number: 10906154
    Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a second surface. The polishing layer is disposed on the first surface of the base layer and has a plurality of second fibers, a polymeric elastomer and a plurality of pores. The second fibers are arranged irregularly and cross each other to form the pores, and the polymeric elastomer is attached to the second fibers and does not fill the pores.
    Type: Grant
    Filed: January 25, 2018
    Date of Patent: February 2, 2021
    Assignee: SAN FANG CHEMICAL INDUSTRY CO., LTD.
    Inventors: Chung-Chih Feng, I-Peng Yao, Chih-Yi Lin, Tai-Yun Fu, Yung-Chang Hung, Jhih-Gong Lin
  • POLISHING PAD AND METHOD FOR MAKING THE SAME
    Publication number: 20180147690
    Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a second surface. The polishing layer is disposed on the first surface of the base layer and has a plurality of second fibers, a polymeric elastomer and a plurality of pores. The second fibers are arranged irregularly and cross each other to form the pores, and the polymeric elastomer is attached to the second fibers and does not fill the pores.
    Type: Application
    Filed: January 25, 2018
    Publication date: May 31, 2018
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, CHIH-YI LIN, TAI-YUN FU, YUNG-CHANG HUNG, JHIH-GONG LIN
  • POLISHING PAD AND METHOD FOR MAKING THE SAME
    Publication number: 20160136778
    Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a second surface. The polishing layer is disposed on the first surface of the base layer and has a plurality of second fibers, a polymeric elastomer and a plurality of pores. The second fibers are arranged irregularly and cross each other to form the pores, and the polymeric elastomer is attached to the second fibers and does not fill the pores.
    Type: Application
    Filed: June 12, 2015
    Publication date: May 19, 2016
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, CHIH-YI LIN, TAI-YUN FU, YUNG-CHANG HUNG, JHIH-GONG LIN