Abstract: A developer spraying device for reducing usage quantity of developer includes a hollow inner tube unit and a hollow outer tube unit. The hollow inner tube unit includes a hollow inner tube and a plurality of nozzles communicating an inner portion of the hollow inner tube with external world. The hollow inner tube has at least one liquid receiving space formed therein, and the liquid receiving space is filled with the developer. The hollow outer tube unit includes a hollow outer tube disposed around the hollow inner tube and tightly mated with the hollow inner tube and an opening formed on the hollow outer tube and communicating with an inner portion of the hollow outer tube. The hollow outer tube is selectively rotated clockwise or anticlockwise relative to the hollow inner tube, thus the nozzles are selectively exposed from the opening or shaded by the hollow outer tube.

Abstract: A developer spraying device for reducing usage quantity of developer includes a hollow inner tube unit and a hollow outer tube unit. The hollow inner tube unit includes a hollow inner tube and a plurality of nozzles communicating an inner portion of the hollow inner tube with external world. The hollow inner tube has at least one liquid receiving space formed therein, and the liquid receiving space is filled with the developer. The hollow outer tube unit includes a hollow outer tube disposed around the hollow inner tube and tightly mated with the hollow inner tube and an opening formed on the hollow outer tube and communicating with an inner portion of the hollow outer tube. The hollow outer tube is selectively rotated clockwise or anticlockwise relative to the hollow inner tube, thus the nozzles are selectively exposed from the opening or shaded by the hollow outer tube.

Abstract: A mini clean room for preventing wafer pollution includes a robot arm, a clean room body slidably disposed on the robot arm and at least one lock unit which is rotatably connected with the clean room body. During operation, the robot arm extends out of the clean room body to carry a wafer waiting to be processed, and then moves back into the clean room body which can provide an isolated and protected space for the wafer to avoid that the wafer is polluted. The present invention also discloses a method of using a mini clean room for preventing wafer pollution.

Abstract: A mini clean room for preventing wafer pollution includes a robot arm, a clean room body slidably disposed on the robot arm and at least one lock unit which is rotatably connected with the clean room body. During operation, the robot arm extends out of the clean room body to carry a wafer waiting to be processed, and then moves back into the clean room body which can provide an isolated and protected space for the wafer to avoid that the wafer is polluted. The present invention also discloses a method of using a mini clean room for preventing wafer pollution.