Patents by Inventor Ji-Haeng Han

Ji-Haeng Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask
    Patent number: 8153339
    Abstract: An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about ?70° to about +70°.
    Type: Grant
    Filed: June 24, 2010
    Date of Patent: April 10, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-An Kim, Ji-Haeng Han, Young-Bae Jung, Bae-Hyoun Jung
  • MASK AND MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE AND A THIN FILM TRANSISTOR ARRAY PANEL USING THE MASK
    Publication number: 20100261102
    Abstract: An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about ?70° to about +70°.
    Type: Application
    Filed: June 24, 2010
    Publication date: October 14, 2010
    Inventors: Jong-An KIM, Ji-Haeng Han, Young-Bae Jung, Bae-Hyoun Jung
  • Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask
    Patent number: 7767506
    Abstract: An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about ?70° to about +70°.
    Type: Grant
    Filed: October 24, 2008
    Date of Patent: August 3, 2010
    Assignee: Samsung Electronics Co. Ltd.
    Inventors: Jong-An Kim, Ji-Haeng Han, Young-Bae Jung, Bae-Hyoun Jung
  • Mask and Manufacturing Method of a Semiconductor Device and a Thin Film Transistor Array Panel Using the Mask
    Publication number: 20090053863
    Abstract: An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about ?70° to about +70°.
    Type: Application
    Filed: October 24, 2008
    Publication date: February 26, 2009
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong-An KIM, Ji-Haeng Han, Young-Bae Jung, Bae-Hyoun Jung
  • Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask
    Patent number: 7449352
    Abstract: An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about ?70° to about +70°.
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: November 11, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-An Kim, Ji-Haeng Han, Young-Bae Jung, Bae-Hyoun Jung
  • Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask
    Publication number: 20060128054
    Abstract: An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about ?70° to about +70°.
    Type: Application
    Filed: December 14, 2005
    Publication date: June 15, 2006
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong-An Kim, Ji-Haeng Han, Young-Bae Jung, Bae-Hyoun Jung