Patents by Inventor Ji Ho Uh

Ji Ho Uh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250054224
    Abstract: The present disclosure relates to a method and apparatus for representing dynamic neural radiance fields from unsynchronized videos. A method of acquiring a video at an arbitrary viewpoint based on a dynamic neural radiance fields model according to an embodiment of the present disclosure may comprise: inputting one or more videos acquired from one or more views for one scene into the dynamic neural radiance fields model; inputting a time embedding for the one or more videos into the dynamic neural radiance fields model; and rendering the video at the arbitrary viewpoint based on color information and density information output by the dynamic neural radiance fields model. Herein, time synchronization related to the time embedding may be performed by applying an individual time offset learned for each view, for the one or more views.
    Type: Application
    Filed: August 9, 2024
    Publication date: February 13, 2025
    Applicants: Electronics and Telecommunications Research Institute, UIF (University Industry Foundation), Yonsei University
    Inventors: Ha Hyun LEE, Gun Bang, Soo Woong Kim, Ji Hoon Do, Seong Jun Bae, Jin Ho Lee, Jung Won Kang, Young Jung Uh, Seo Ha Kim, Jung Min Bae, Young Sik Yun
  • Publication number: 20240279003
    Abstract: A wafer transfer apparatus includes a plate, a first belt unit on a first surface of the plate and including a first linear motion (LM) guide movable up and down, a second belt unit on the first surface of the plate and including a second LM guide movable up and down, a robot between the first belt unit and the second belt unit connected to the first LM guide and the second LM guide, and configured to transfer a wafer in a vertical direction, and a buffer unit between the first belt unit and the second belt unit in a first direction and disposed between the plate and the robot in a second direction perpendicular to the first direction, wherein the buffer unit includes a plurality of centrifugal fans configured to discharge fluid from an inner space of the buffer unit to an outside of the buffer unit.
    Type: Application
    Filed: September 22, 2023
    Publication date: August 22, 2024
    Inventors: Hyun Joo JEON, Jin Hyuk CHOI, Kyu Sang LEE, Myung Ki SONG, Ji Ho UH, Kong Woo LEE, Hyun Soo CHUN, Beom Soo HWANG
  • Publication number: 20240278437
    Abstract: A substrate processing apparatus includes a body which includes an upper face and side faces, and extends in a first direction, a plurality of robot arms which are installed on the upper face of the body, extend in the first direction, are spaced apart from each other in a second direction perpendicular to the upper face of the body, and are able to grip a wafer, and an alignment jig (JIG) which is installed on the upper face and side faces of the body, and senses positions of the plurality of robot arms, wherein the alignment jig includes, a horizontal frame disposed on the upper face of the body, a vertical frame disposed on the side faces of the body, and a displacement sensor installed on the horizontal frame and the vertical frame to sense coordinates of upper faces of the plurality of robot arms and side faces of the plurality of robot arms, the displacement sensor includes a first sensor and a second sensor which are spaced apart from side faces of the plurality of robot arms in a third direction perpe
    Type: Application
    Filed: January 16, 2024
    Publication date: August 22, 2024
    Inventors: Hyeon Dong SONG, Jun Young MOON, Sang Woo PARK, Un Ki JEONG, Ji Ho UH, Hyun Soo CHUN
  • Patent number: 11098406
    Abstract: A substrate support unit according to an example embodiment of the present inventive concept may include a support having an upper surface on which a substrate is disposed; a coupling ring on which an edge of the substrate is disposed, the coupling ring being having an annular shape, wherein the coupling ring is disposed on an edge of the support; and an arm part for raising and lowering the coupling ring and the substrate, wherein the arm part is disposed below the coupling ring and under a portion of the coupling ring, wherein the coupling ring has a first region disposed on the arm part and a second region disposed around the first region, wherein the first region has a thickness greater than that of the second region.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: August 24, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Il Jun Jeon, Ji Ho Uh, Je Hak Lee, Jun Sung Lee, Ji Woon Im
  • Patent number: 11021796
    Abstract: A gas injector includes first and second gas introduction passages extending in a first direction toward a central axis of a process chamber respectively, a first bypass passage extending from the first gas introduction passage in a second direction that is substantially perpendicular to the first direction, a second bypass passage extending from the second gas introduction passage in a reverse direction to the second direction, a first distribution passage isolated from the first bypass passage in the first direction and extending from an outlet of the first bypass passage in the reverse direction to the second direction, a second distribution passage isolated from the second bypass passage in the first direction and extending from an outlet of the second bypass passage in the second direction, and a plurality of spray holes in an outer surface of the first and second distribution passages and configured to spray the process gas.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: June 1, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-Hyun Lee, Young-Kwon Kim, Woo-Jae Kim, Seung-Min Ryu, Ji-Ho Uh
  • Publication number: 20190330741
    Abstract: A gas injector includes first and second gas introduction passages extending in a first direction toward a central axis of a process chamber respectively, a first bypass passage extending from the first gas introduction passage in a second direction that is substantially perpendicular to the first direction, a second bypass passage extending from the second gas introduction passage in a reverse direction to the second direction, a first distribution passage isolated from the first bypass passage in the first direction and extending from an outlet of the first bypass passage in the reverse direction to the second direction, a second distribution passage isolated from the second bypass passage in the first direction and extending from an outlet of the second bypass passage in the second direction, and a plurality of spray holes in an outer surface of the first and second distribution passages and configured to spray the process gas.
    Type: Application
    Filed: December 6, 2018
    Publication date: October 31, 2019
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jong-Hyun LEE, Young-Kwon KIM, Woo-Jae KIM, Seung-Min RYU, Ji-Ho UH
  • Publication number: 20190203353
    Abstract: A substrate support unit according to an example embodiment of the present inventive concept may include a support having an upper surface on which a substrate is disposed; a coupling ring on which an edge of the substrate is disposed, the coupling ring being having an annular shape, wherein the coupling ring is disposed on an edge of the support; and an arm part for raising and lowering the coupling ring and the substrate, wherein the arm part is disposed below the coupling ring and under a portion of the coupling ring, wherein the coupling ring has a first region disposed on the arm part and a second region disposed around the first region, wherein the first region has a thickness greater than that of the second region.
    Type: Application
    Filed: July 24, 2018
    Publication date: July 4, 2019
    Inventors: IL JUN JEON, Ji Ho Uh, Je Hak Lee, Jun Sung Lee, Ji Woon Im
  • Publication number: 20160115583
    Abstract: A device for vacuum evaporating includes a thermal evaporation module that generates vapor in a vacuum chamber through a circular opening by heating a vapor evaporation material accommodated therein. A moving stage is positioned in an atmospheric area separated from the vacuum chamber and adjusts a position of the thermal evaporation module under the thermal evaporation module. A sealing part is combined with the thermal evaporation module to isolate the vacuum chamber and the atmospheric area from each other and maintain a vacuum state of the vacuum chamber while surrounding the thermal evaporation module and permitting movement of the thermal evaporation module.
    Type: Application
    Filed: May 29, 2015
    Publication date: April 28, 2016
    Inventors: JI-HO UH, Jun-Sung Lee
  • Patent number: 9263414
    Abstract: Flip chip packaging methods, and flux head manufacturing methods used in the flip chip packaging methods may be provided. In particular, a flip chip packaging method including printing flux on a pad of a printed circuit board (PCB), mounting the die in a flip chip manner on the PCB such that a bump of the die faces the pad of the PCB, and bonding the bump of the die to the pad of the PCB using the flux may be provided.
    Type: Grant
    Filed: December 17, 2013
    Date of Patent: February 16, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyeong Min Yeo, Seung Min Ryu, Dae Jung Kim, Ji Ho Uh, Suk Won Lee
  • Publication number: 20140242753
    Abstract: Flip chip packaging methods, and flux head manufacturing methods used in the flip chip packaging methods may be provided. In particular, a flip chip packaging method including printing flux on a pad of a printed circuit board (PCB), mounting the die in a flip chip manner on the PCB such that a bump of the die faces the pad of the PCB, and bonding the bump of the die to the pad of the PCB using the flux may be provided.
    Type: Application
    Filed: December 17, 2013
    Publication date: August 28, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyeong Min YEO, Seung Min RYU, Dae Jung KIM, Ji Ho UH, Suk Won LEE
  • Publication number: 20130255766
    Abstract: The present inventive concepts provide a conductive paste composition including conductive particles, a thickening agent, a dispersing agent, a thixotropic agent, an organic solvent, and glass frit, wherein the conductive paste composition has a thixotropic index of about 2 to 7 and a viscosity of about 50,000 to 300,000 cps at a temperature of 25° C.
    Type: Application
    Filed: March 12, 2013
    Publication date: October 3, 2013
    Inventors: Jung-hwan Shin, Yong-in Lee, Jong-woo Lee, Eun-ah Park, Ji-ho Uh, Cecilia Lee
  • Patent number: 8482870
    Abstract: Example embodiments are directed to a lens module manufactured from a wafer and a wafer level lens module manufacturing apparatus. The wafer level lens module manufacturing apparatus to mold lenses on a wafer provided with lens holes includes a first master substrate and a second master substrate disposed such that the wafer is between the first master substrate and the second master substrate. The wafer level lens module manufacturing apparatus also includes lens molding parts that enter the lens holes and are on at least one of the first master substrate and the second master substrate. The lens is molded to have a thickness less than that of the wafer using the first lens molding parts and second lens molding parts, and both surfaces of the lens are inside the lens hole. Therefore, even if wafers provided with lenses are stacked on each other, the lens does not contact the surfaces of the neighboring wafers or the lenses molded on the neighboring wafers.
    Type: Grant
    Filed: May 19, 2011
    Date of Patent: July 9, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Ji Ho Uh
  • Publication number: 20110286118
    Abstract: Example embodiments are directed to a lens module manufactured from a wafer and a wafer level lens module manufacturing apparatus. The wafer level lens module manufacturing apparatus to mold lenses on a wafer provided with lens holes includes a first master substrate and a second master substrate disposed such that the wafer is between the first master substrate and the second master substrate. The wafer level lens module manufacturing apparatus also includes lens molding parts that enter the lens holes and are on at least one of the first master substrate and the second master substrate. The lens is molded to have a thickness less than that of the wafer using the first lens molding parts and second lens molding parts, and both surfaces of the lens are inside the lens hole. Therefore, even if wafers provided with lenses are stacked on each other, the lens does not contact the surfaces of the neighboring wafers or the lenses molded on the neighboring wafers.
    Type: Application
    Filed: May 19, 2011
    Publication date: November 24, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Ji Ho Uh