Patents by Inventor Ji Hye KWON

Ji Hye KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240387815
    Abstract: A cathode active material for a lithium secondary battery includes a lithium-nickel metal oxide particle having a form of a secondary particle in which a plurality of primary particles are aggregated therein. The lithium-nickel metal oxide particle includes a penetration region formed in an area extending from a surface to a point 70% or less of a radius of the particle in a direction to a center of the particle. The penetration region includes a tungsten compound at an interface between the primary particles. A relative standard deviation (RSD) value calculated from results of measuring a tungsten content from the surface of the secondary particle to a depth of 10 10 nm 10 times at different points using an X-ray Photoelectron Spectroscopy (XPS) is in a range from 10% to 40%.
    Type: Application
    Filed: April 30, 2024
    Publication date: November 21, 2024
    Inventors: Sang Min PARK, Oh Hun KWON, Sang Bok KIM, Dong Il JANG, Ji Hye JANG, Jae Young CHOI
  • Publication number: 20240262799
    Abstract: Disclosed are methods for treating or ameliorating metabolic diseases, cholestatic liver diseases, disorder of bile acid homeostasis, or organ fibrosis, which includes administering to a subject a therapeutically effective amount of a pharmaceutical composition containing an isoxazole derivative, a racemate, an enantiomer, or a diastereoisomer thereof, or a pharmaceutically acceptable salt of the derivative, the racemate, the enantiomer, or the diastereoisomer.
    Type: Application
    Filed: January 23, 2024
    Publication date: August 8, 2024
    Applicant: IL DONG PHARMACEUTICAL CO., LTD.
    Inventors: Jae-Hoon KANG, Hong-Sub LEE, Yoon-Suk LEE, Jin-Ah JEONG, Sung-Wook KWON, Jeong-Guen KIM, Kyung-Sun KIM, Dong-Keun SONG, Sun-Young PARK, Kyeo-Jin KIM, Ji-Hye CHOI, Hey-Min HWANG
  • Patent number: 10829577
    Abstract: The present invention relates to a photocured composition comprising (A) a photocurable monomer and (B) a monomer of chemical formula 1, a blocking layer comprising the same, and an encapsulated device comprising the same.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: November 10, 2020
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Seong Ryong Nam, Seung Jib Choi, Ji Hye Kwon, Yeon Soo Lee, Ji Yeon Lee, Chang Min Lee
  • Patent number: 10815391
    Abstract: A photocurable composition includes (A) a photocurable monomer and (B) a silicon-containing monomer or oligomer thereof, the silicon-containing monomer being represented by Formula 1
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: October 27, 2020
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Chang Min Lee, Seung Jib Choi, Ji Hye Kwon, Irina Nam, Jin Seong Park, Yeon Soo Lee, Kyoung Jin Ha
  • Patent number: 10392459
    Abstract: The present invention relates to: a photocurable composition containing (A) a photocurable monomer and (B) a monomer containing phosphorus and an amide group; and a device including a barrier layer formed of the composition.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: August 27, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Ji Hye Kwon, Hyo Young Kwon, Seong Ryong Nam, Se Il Oh, Chang Soo Woo, Yeon Soo Lee, Chang Min Lee, Seung Jib Choi, Kyoung Jin Ha
  • Patent number: 10382541
    Abstract: An application design server, method and system are provided. The application design server according to an exemplary embodiment includes a communicator configured to receive design data from a first host device and a controller configured to, in response to receiving a request for the design data from a second host device, transmit the received design data to the second host device, and in response to receiving updated design data corresponding to the design data from the first host device, control the communicator to transmit the updated design data to the second host device.
    Type: Grant
    Filed: November 11, 2014
    Date of Patent: August 13, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-hyun Park, Yoon-hoe Gu, Ji-hye Kwon, Soo-jung Kim, Go-eun Lee
  • Patent number: 10233350
    Abstract: The present invention relates to a photocurable composition including (A) a photocurable monomer, (B) a monomer of chemical formula 1 or an oligomer thereof and (C) an initiator, a barrier layer including the same and an enveloped device including the same.
    Type: Grant
    Filed: October 31, 2013
    Date of Patent: March 19, 2019
    Assignee: Cheil Industries, Inc.
    Inventors: Chang Min Lee, Seung Jib Choi, Kyoung Jin Ha, Sung Min Ko, Ji Hye Kwon, Seong Ryong Nam, Se Il Oh, Yeon Soo Lee, Ji Yeon Lee
  • Patent number: 10042087
    Abstract: Disclosed are a photosensitive resin composition for a color filter including (A) a colorant including a dye; (B) a photocurable dispersing agent; (C) an acrylic-based binder resin; (D) a photopolymerizable monomer; (E) a photopolymerization initiator; and (F) a solvent, and a color filter using the same.
    Type: Grant
    Filed: August 21, 2014
    Date of Patent: August 7, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Ju-Ho Jung, Ji-Hye Kwon, Jee-Hyun Ryu, In-Jae Lee, Min-Kyeol Chung, Sang-Won Cho, Mi-Jin Choi, Seung-Jib Choi, Soo-Young Heo
  • Patent number: 9957335
    Abstract: A composition for encapsulation and an encapsulated apparatus, the composition including a (meth)acrylic alkoxysilane monomer including a moiety represented by Formula 1 or 2, below, or an oligomer thereof; a multifunctional (meth)acrylate monomer or an oligomer thereof; and an initiator, wherein * and ** represent a binding site between elements.
    Type: Grant
    Filed: November 22, 2013
    Date of Patent: May 1, 2018
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Kyoung Jin Ha, Ji Hye Kwon, Seong Ryong Nam, Yeon Soo Lee, Chang Min Lee, Seung Jib Choi
  • Publication number: 20170362462
    Abstract: A photocurable composition includes (A) a photocurable monomer and (B) a silicon-containing monomer or oligomer thereof, the silicon-containing monomer being represented by Formula 1
    Type: Application
    Filed: August 30, 2017
    Publication date: December 21, 2017
    Inventors: Chang Min LEE, Seung Jib CHOI, Ji Hye KWON, Irina NAM, Jin Seong PARK, Yeon Soo LEE, Kyoung Jin HA
  • Patent number: 9715858
    Abstract: A display apparatus includes a display panel including a plurality of data lines arranged in a first direction, where the data line extends substantially in a second direction, and a plurality of pixels electrically connected to the data lines, and a data driver configured to output a first data voltage and a second data voltage to the data lines and configured to control the number of the data lines which receives the first data voltage and the number of the data lines which receive the second data voltage, where the first data voltage has a positive polarity during a first frame and a negative polarity during a second frame, and the second data voltage has the negative polarity during the first frame and the positive polarity during the second frame.
    Type: Grant
    Filed: July 2, 2014
    Date of Patent: July 25, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Tong-Ill Kwak, Ji-Hye Kwon, Min-Su Son, Yong-Oh Eom, Woon-Yong Lim, Ki-Hyun Pyun
  • Patent number: 9598582
    Abstract: The present invention relates to an encapsulating composition, a barrier layer including the same, and an encapsulated apparatus including the same, and the composition comprises (A) a photocurable monomer and (B) a photocurable monomer containing a carboxylic acid group, wherein (B) the photocurable monomer containing the carboxylic acid group has an amide bond.
    Type: Grant
    Filed: July 31, 2013
    Date of Patent: March 21, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Seong Ryong Nam, Ji Hye Kwon, Yeon Soo Lee, Ji Yeon Lee, Chang Min Lee, Min Haeng Cho, Seung Jib Choi, Kyoung Jin Ha
  • Patent number: 9587046
    Abstract: Disclosed are a photocurable composition which includes (A) a photocurable monomer and (B) a monomer represented by Formula 1, and an apparatus including a protective layers formed of the composition;
    Type: Grant
    Filed: June 12, 2013
    Date of Patent: March 7, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Chang Min Lee, Seung Jib Choi, Ji Hye Kwon, Kyoung Jin Ha, Yeon Soo Lee
  • Patent number: 9562123
    Abstract: The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: February 7, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Chang Min Lee, Seung Jib Choi, Ji Hye Kwon, Yeon Soo Lee, Kyoung Jin Ha
  • Publication number: 20160072098
    Abstract: The present invention relates to a photo-curing composition comprising (A) a photo-curable monomer, (B) a light-emitting substance, and (C) an initiator, wherein the light-emitting substance has a maximum light-emitting wavelength of about 400 to 500 nm during irradiation at a wavelength of 300-480 nm, and an encapsulated device comprising the same.
    Type: Application
    Filed: October 31, 2013
    Publication date: March 10, 2016
    Inventors: Chang Min LEE, Se Il OH, Sung Min KO, Ji Hye KWON, Seong Ryong NAM, Yeon Soo LEE, Ji Yeon LEE, Seung Jib CHOI, Kyoung Jin HA
  • Publication number: 20160017170
    Abstract: The present invention relates to a photocurable composition including (A) a photocurable monomer, (B) a monomer of chemical formula 1 or an oligomer thereof and (C) an initiator, a barrier layer including the same and an enveloped device including the same.
    Type: Application
    Filed: October 31, 2013
    Publication date: January 21, 2016
    Inventors: Chang Min LEE, Seung Jib CHOI, Kyoung Jin HA, Sung Min KO, Ji Hye KWON, Seong Ryong NAM, Se Il OH, Yeon Soo LEE, Ji Yeon LEE
  • Publication number: 20150344697
    Abstract: The present invention relates to an encapsulating composition, a barrier layer including the same, and an encapsulated apparatus including the same, and the composition comprises (A) a photocurable monomer and (B) a photocurable monomer containing a carboxylic acid group, wherein (B) the photocurable monomer containing the carboxylic acid group has an amide bond.
    Type: Application
    Filed: July 31, 2013
    Publication date: December 3, 2015
    Applicant: CHEIL INDUSTRIES, INC.
    Inventors: Seong Ryong NAM, Ji Hye KWON, Yeon Soo LEE, Ji Yeon LEE, Chang Min LEE, Min Haeng CHO, Seung Jib CHOI, Kyoung Jin HA
  • Publication number: 20150337065
    Abstract: The present invention relates to a photocured composition comprising (A) a photocurable monomer and (B) a monomer of chemical formula 1, a blocking layer comprising the same, and an encapsulated device comprising the same.
    Type: Application
    Filed: May 28, 2013
    Publication date: November 26, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Seong Ryong NAM, Seung Jib CHOI, Ji Hye KWON, Yeon Soo LEE, Ji Yeon LEE, Chang Min LEE
  • Publication number: 20150318482
    Abstract: The present invention relates to: a photocurable composition containing (A) a photocurable monomer and (B) a monomer containing phosphorus and an amide group; and a device including a barrier layer formed of the composition.
    Type: Application
    Filed: July 8, 2013
    Publication date: November 5, 2015
    Inventors: Ji Hye KWON, Hyo Young KWON, Seong Ryong NAM, Se Il OH, Chang Soo WOO, Yeon Soo LEE, Chang Min LEE, Seung Jib CHOI, Kyoung Jin HA
  • Patent number: 9175196
    Abstract: The present invention relates to a photocurable adhesive composition. The photocurable adhesive composition comprises a urethane(meth)acrylate resin, a functional-group-containing polybutadiene, a photocurable monomer and a photoinitiator; and the functional group is either an epoxy group or a hydroxyl group. The photocurable adhesive composition ensures good outdoor readability, has outstanding adhesive properties, and impact strength and optical transparency, and minimizes the phenomenon whereby substantial contraction occurs during photocuring, and thus can be suitably used for a display.
    Type: Grant
    Filed: August 6, 2012
    Date of Patent: November 3, 2015
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Kyoung Jin Ha, Ji Hye Kwon, Lee June Kim, Irina Nam, Se Il Oh, Seung Jib Choi