Abstract: A substrate can include a feature pattern included in an integrated circuit on the substrate and an in-situ metrology pattern spaced apart from the feature pattern on the substrate, the in-situ metrology pattern and the feature pattern both configured to have equal heights relative to a surface of the substrate.

Abstract: A photomask includes a focus metrology mark region that includes a plurality of focus monitor patterns. To measure a focal variation of a feature pattern formed on a substrate, a substrate target for lithography metrology including a focus metrology mark formed on the same level as the feature pattern is used. A lithography metrology apparatus includes a projection device including a polarizer; a detection device detecting the powers of ±n-order diffracted light beams from among output beams diffracted by the focus metrology mark of a to-be-measured substrate; and a determination device which determines, from a power deviation between the ±n-order diffracted light beams, defocus experienced by the feature pattern.

Abstract: A substrate can include a feature pattern included in an integrated circuit on the substrate and an in-situ metrology pattern spaced apart from the feature pattern on the substrate, the in-situ metrology pattern and the feature pattern both configured to have equal heights relative to a surface of the substrate.

Abstract: A photomask includes a focus metrology mark region that includes a plurality of focus monitor patterns. To measure a focal variation of a feature pattern formed on a substrate, a substrate target for lithography metrology including a focus metrology mark formed on the same level as the feature pattern is used. A lithography metrology apparatus includes a projection device including a polarizer; a detection device detecting the powers of ±n-order diffracted light beams from among output beams diffracted by the focus metrology mark of a to-be-measured substrate; and a determination device which determines, from a power deviation between the ±n-order diffracted light beams, defocus experienced by the feature pattern.

Abstract: The present disclosure provides: (a) a composition for preparing gluten-free wet rice noodle, rice cake, baked rice confectionery, rice cookie and rice bread, (b) gluten-free wet rice noodle, rice cake, baked rice confectionery, rice cookie and rice bread, and (c) a method for preparing the same. The present disclosure not only provides superior gustatory sensation over wet wheat noodle, wheat cake, baked wheat confectionery, wheat cookie and wheat bread but also provides well-being diet cake for health improvement in terms of nutrition since intake of sugar and sweet substances as well as fats can be reduced. In addition, the present disclosure will find useful applications in the well-being health food industry and the agricultural processed food industry since wheat allergy can be avoided owing to the absence of wheat and the gluten-free food is of great help to patients with celiac disease or atopy.