Abstract: The present invention relates to hybrid exosomes, a use of the same, and a preparation method of the same, and the hybrid exosomes provided from the present invention have excellent skin inflammation amelioration, skin wrinkle amelioration, skin moisturization efficacy, and skin regeneration efficacy compared to using hydrangea-derived exosomes and liposomes alone, and thus can be effectively utilized as a cosmetic composition containing the same as an active ingredient. In addition, the hybrid exosomes have better stability and biocompatibility compared to existing exosomes.

Abstract: A display device includes a power supply to supply a first initialization power source to the pixels through a first initialization and to supply a second initialization power source to the pixels through a second power line.

Abstract: Disclosed herein are a method, an apparatus, and a storage medium for image encoding/decoding. An intra-prediction mode for the target block is derived, and intra-prediction for the target block that uses the derived intra-prediction mode is performed. The intra-prediction mode for the target block is derived using an artificial neural network, and an MPM list for the target block is derived using information about the target block, pieces of information about blocks adjacent to the target block, and the artificial neural network. The artificial neural network outputs one or more available intra-prediction modes. Further, the artificial neural network outputs match probabilities for one or more candidate intra-prediction modes, and each of the match probabilities for the candidate intra-prediction modes indicates a probability that the corresponding candidate intra-prediction mode matches the intra-prediction mode for the target block.

Abstract: A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.

Abstract: An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.

Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28 M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.35.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: A substrate treating method includes performing a developing process on a substrate subjected to an exposing process and a post-bake process by applying a developing fluid to the substrate, applying a rinsing fluid to the substrate subjected to the developing process, and moving, to a high-pressure chamber, the substrate having the rinsing fluid applied thereto and treating the substrate by using a supercritical fluid.

Abstract: An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.

Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.035.

Abstract: Disclosed are relate to an apparatus for supplying a cleaning liquid to a substrate. The cleaning liquid supply unit includes a mixing container having a liquid mixing space in the interior thereof, a first supply member configured to supply a first liquid into the liquid mixing space, a second supply member configured to supply a second liquid that is different from the first liquid into the liquid mixing space, and a mixing member configured to mix the first liquid and the second liquid supplied into the liquid mixing space, and the mixing member may include a circulation line, through which the liquids in the liquid mixing space circulate, and a pressure adjusting member configured to provide a pressure to the liquids such that the liquids in the liquid mixing space flows into the circulation line and adjust the pressure.

Abstract: Disclosed are an apparatus and a method for manufacturing a cleaning solution. The method includes mixing a surfactant chemical and pure water at a first temperature, and after the mixing of the surfactant chemical and the pure water at the first temperature, mixing the surfactant chemical and the pure water while cooling the surfactant chemical and the pure water to a second temperature that is lower than the first temperature.

Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.

Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.

Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.

Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.