Abstract: Proposed is a compound represented by Formula 1, where R1 is an alkyl group having 9 to 30 carbon atoms, an alkenyl group having 9 to 30 carbon atoms, or an alkynyl group having 9 to 30 carbon atoms, R2 is hydrogen, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or an alkynyl group having 2 to 10 carbon atoms, and R3 to R5 are each independently hydrogen, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or an alkynyl group having 2 to 10 carbon atoms. Alternatively, at least two of R3 to R5 are bonded together to form a hydrocarbon ring having 5 or 6 carbon atoms. In addition, proposed are a lube base oil and a lubricant composition comprising the compound.

Abstract: Provided is a cognitive experiment method for change in periphery region image quality for parameter determination of a foveated hologram. According to an embodiment, a cognitive experiment method for determining foveated image parameters includes: generating a foveated image which includes a foveal region and a periphery region while reducing image quality regarding the periphery region; displaying the generated foveated image; receiving an input of a response to image quality of the periphery region from a subject; and collecting information regarding appropriate image quality of the periphery region, based on the response inputted by the subject. Accordingly, in applying a foveated hologram generation algorithm for real-time reproduction, various parameters such as a boundary between a foveal region image and a periphery region image in a foveated hologram, and a degree of quality degradation of the periphery region image may be appropriately determined through a cognitive experiment.

Abstract: Provided is a holographic optical element printing method using a tunable focus lens and a rotating mirror. According to an embodiment, a holographic printer includes: a first optical engine and a second optical engine configured to adjust a phase of an incident collimated beam and emit the collimated beam; and a first reduction optical system and a second reduction optical system configured to reduce the beam emitted from the first optical engine and the second optical engine and to allow the beam to enter a holographic material, wherein each of the first optical engine and the second optical engine includes: a rotating mirror configured to reflect while adjusting the phase of the incident collimated beam through rotation; and a tunable focus lens configured to refract while adjusting the phase of the incident collimated beam reflected from the rotating mirror through focus tuning.

Abstract: Provided is a hologram image normalization method for a holographic printer. In a holographic printing method according to an embodiment, generating, encoding, and normalizing for the (n+1)-th hogel are performed in parallel with loading and recording of a normalized hologram for the n-th hogel, and moving and waiting for the (n+1)-th hogel. Accordingly, a global maximum value and a global minimum value for normalization may be calculated as approximate estimation values, and a hologram generation process and a printing process may be performed in parallel, so that a total printing time may be minimized and memory usage may be optimized when holographic printing is performed.

Abstract: A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.

Abstract: An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.

Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28 M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.35.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: A substrate treating method includes performing a developing process on a substrate subjected to an exposing process and a post-bake process by applying a developing fluid to the substrate, applying a rinsing fluid to the substrate subjected to the developing process, and moving, to a high-pressure chamber, the substrate having the rinsing fluid applied thereto and treating the substrate by using a supercritical fluid.

Abstract: An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.

Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.035.

Abstract: Disclosed are relate to an apparatus for supplying a cleaning liquid to a substrate. The cleaning liquid supply unit includes a mixing container having a liquid mixing space in the interior thereof, a first supply member configured to supply a first liquid into the liquid mixing space, a second supply member configured to supply a second liquid that is different from the first liquid into the liquid mixing space, and a mixing member configured to mix the first liquid and the second liquid supplied into the liquid mixing space, and the mixing member may include a circulation line, through which the liquids in the liquid mixing space circulate, and a pressure adjusting member configured to provide a pressure to the liquids such that the liquids in the liquid mixing space flows into the circulation line and adjust the pressure.

Abstract: Disclosed are an apparatus and a method for manufacturing a cleaning solution. The method includes mixing a surfactant chemical and pure water at a first temperature, and after the mixing of the surfactant chemical and the pure water at the first temperature, mixing the surfactant chemical and the pure water while cooling the surfactant chemical and the pure water to a second temperature that is lower than the first temperature.

Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.

Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.

Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.

Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.