Abstract: There is provided a thin optical system for real-world occlusion in an augmented reality display. The optical system according to an embodiment includes: a first DCRA configured to reflect light beams focused on holes; a mask positioned on a light emitting surface of the first DCRA to pass or block the light beams emitted from the first DCRA; and a second DCRA configured to reflect the light beams which are focused on holes after passing through the mask. Accordingly, the optical system can implement real-world occlusion in the unit of pixel while having a thin form factor.

Abstract: There is provided an object attribute-based watermarking method for preventing leakage of a digital content. A video watermarking method according to an embodiment may acquire a requested video and watermarking information upon receiving a request for video streaming from a user, may determine some of objects appearing in the video according to the watermarking information, may transform attributes of the determined objects, and may stream the transformed video. Accordingly, by watermarking an attribute of an object appearing in a video differently according to a user and providing the video, a watermark may be difficult to perceive, robustness against various attacks may be guaranteed, and a leakage path of a content may be checked.

Abstract: Disclosed herein are a method, an apparatus and a storage medium for image encoding/decoding using a binary mask. An encoding method includes generating a latent vector using an input image, generating a selected latent vector component set using a binary mask, and generating a main bitstream by performing entropy encoding on the selected latent vector component set. A decoding method includes generating a selected latent vector component set including one or more selected latent vector components by performing entropy decoding on a main bitstream and generating the latent vector in which the one or more selected latent vector components are relocated by relocating the selected latent vector component set in the latent vector.

Abstract: Disclosed therein are a method, an apparatus, and a storage medium for image encoding/decoding. Templating matching is used for prediction for a target block. Prediction information to be applied to encoding of the target block is determined, and prediction for the target block that uses the determined prediction information is performed. The prediction information includes a list and multiple candidates in the list. When the multiple candidates in the list are configured, template matching between blocks may be used. A candidate selected from among multiple candidates configured using template matching is used for prediction for the target block.

Abstract: A display device includes: a plurality of data lines extending in a first direction, and first to third pixels connected to the plurality of data lines. The first pixel includes a first pixel electrode overlapping the plurality of data lines in a plan view in a thickness direction. The second pixel includes a second pixel electrode spaced apart from the plurality of data lines in the plan view in the thickness direction. The third pixel includes a third pixel electrode overlapping the plurality of data lines in the plan view in the thickness direction.

Abstract: A display device includes pixels, and a power supply to supply a first initialization voltage to the pixels through a first initialization power line, and to supply a second initialization voltage to the pixels through a second initialization power line. At least one of the pixels includes a first transistor, a second transistor, a third transistor, and a light emitting element.

Abstract: A substrate processing apparatus includes a body which includes an upper face and side faces, and extends in a first direction, a plurality of robot arms which are installed on the upper face of the body, extend in the first direction, are spaced apart from each other in a second direction perpendicular to the upper face of the body, and are able to grip a wafer, and an alignment jig (JIG) which is installed on the upper face and side faces of the body, and senses positions of the plurality of robot arms, wherein the alignment jig includes, a horizontal frame disposed on the upper face of the body, a vertical frame disposed on the side faces of the body, and a displacement sensor installed on the horizontal frame and the vertical frame to sense coordinates of upper faces of the plurality of robot arms and side faces of the plurality of robot arms, the displacement sensor includes a first sensor and a second sensor which are spaced apart from side faces of the plurality of robot arms in a third direction perpe

Abstract: A display apparatus includes a substrate including a display area, a peripheral area surrounding the display area, a function-adding area, of which at least a portion is surrounded by the display area, and a detour area disposed between the display area and the function-adding area. The display apparatus includes a plurality of pixel circuits disposed in the display area. A plurality of driving lines are electrically connected to the pixel circuits and extend in a direction in the display area. A first detour line is disposed in the detour area and is electrically connected to a first driving line. A second detour line is disposed in the detour area. The second detour line is electrically connected to a second driving line and is disposed in a different layer from the first detour line.

Abstract: A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.

Abstract: An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.

Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28 M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.35.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

Abstract: A substrate treating method includes performing a developing process on a substrate subjected to an exposing process and a post-bake process by applying a developing fluid to the substrate, applying a rinsing fluid to the substrate subjected to the developing process, and moving, to a high-pressure chamber, the substrate having the rinsing fluid applied thereto and treating the substrate by using a supercritical fluid.

Abstract: An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.

Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.035.

Abstract: Disclosed are relate to an apparatus for supplying a cleaning liquid to a substrate. The cleaning liquid supply unit includes a mixing container having a liquid mixing space in the interior thereof, a first supply member configured to supply a first liquid into the liquid mixing space, a second supply member configured to supply a second liquid that is different from the first liquid into the liquid mixing space, and a mixing member configured to mix the first liquid and the second liquid supplied into the liquid mixing space, and the mixing member may include a circulation line, through which the liquids in the liquid mixing space circulate, and a pressure adjusting member configured to provide a pressure to the liquids such that the liquids in the liquid mixing space flows into the circulation line and adjust the pressure.

Abstract: Disclosed are an apparatus and a method for manufacturing a cleaning solution. The method includes mixing a surfactant chemical and pure water at a first temperature, and after the mixing of the surfactant chemical and the pure water at the first temperature, mixing the surfactant chemical and the pure water while cooling the surfactant chemical and the pure water to a second temperature that is lower than the first temperature.