Patents by Inventor Jisung Jang

Jisung Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240377109
    Abstract: An air conditioner of the present disclosure includes one or more outdoor units comprising a compressor and an outdoor heat exchanger which exchanges heat between a refrigerant flowing through the compressor and external air; and a plurality of indoor units which are connected to the outdoor unit, and have an indoor heat exchanger, wherein the plurality of indoor units include a first indoor unit group and a second indoor unit group, wherein the outdoor unit and the first indoor unit group are connected by a first gas pipe and a liquid pipe, and wherein the outdoor unit and the second indoor unit group are connected by a second gas pipe and the liquid pipe.
    Type: Application
    Filed: May 7, 2024
    Publication date: November 14, 2024
    Inventors: Jiyoung JANG, Yongcheol SA, Chiwoo SONG, Jisung LEE
  • Patent number: 10557846
    Abstract: Provided are encoded polymeric microparticles and a multiplexed bioassay using the encoded polymeric microparticles. Each of the encoded polymeric microparticles includes an encoded polymeric microparticle core and a silica shell surrounding the microparticle core. Further provided is a method for producing encoded polymeric microparticles. The method includes: mixing a photocurable material with a linker having a functional group polymerizable with the photocurable material and an alkoxysilyl group; applying patterned energy to cure the mixture, followed by encoding to obtain encoded polymeric microparticle cores; and treating the encoded polymeric microparticle cores with a silica precursor to form a silica shell on each encoded polymeric microparticle core.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: February 11, 2020
    Assignee: QUANTAMATRIX INC.
    Inventors: Sunghoon Kwon, Mira Kim, Jisung Jang, Hyungjong Bae, Nari Kim
  • Patent number: 9856564
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: January 2, 2018
    Assignee: SNU R&DB FOUNDATION
    Inventors: Sunghoon Kwon, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • Publication number: 20160145744
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Application
    Filed: January 28, 2016
    Publication date: May 26, 2016
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sunghoon KWON, Sueun CHUNG, Seungah LEE, Jisung JANG, Sangkwon HAN
  • Patent number: 9323159
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: April 26, 2016
    Assignee: SNU R&DB FOUNDATION
    Inventors: Sung Hoon Kwon, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • Publication number: 20120236278
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Application
    Filed: March 29, 2012
    Publication date: September 20, 2012
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sung Hoon KWON, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • Publication number: 20120182714
    Abstract: Provided is a composite film used for a light emitting apparatus including a light emitting device. The composite film includes a fluorescent layer including phosphors and an optical plate disposed on the fluorescent layer, and diffusing, reducing or mixing at least one of light emitted by the light emitting device, light emitted by the phosphors and a combination thereof.
    Type: Application
    Filed: March 28, 2012
    Publication date: July 19, 2012
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sunghoon KWON, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han