Abstract: According to at least one example embodiment, a substrate treating apparatus includes a substrate support structure including a spin head, the substrate support structure configured to support a substrate, and rotate the substrate, at least one treating liquid recovery container configured to recover at least one substrate treating liquid, and a discharging device including a first nozzle and a second nozzle, the first nozzle configured to discharge a chemical onto the substrate, and the second nozzle configured to discharge deionized water onto the substrate, wherein the first nozzle includes a surface pattern configured to provide roughness on an inner surface of the first nozzle.

Abstract: An optical device includes a light receiving element for detecting light reflected and transmitted from a subject; a voltage part for providing a first bias voltage or a second bias voltage to the light receiving element; and a controller for controlling the voltage part so that the second bias voltage provided from the voltage part is synchronized with a light output of a light emitting part to be provided to the light receiving element.

Abstract: Disclosed is a method for pre-detecting a defective porous polymer substrate for a separator, including selecting a porous polymer substrate having a plurality of pores; observing the selected porous polymer substrate with a scanning electron microscope (SEM) to obtain an image of the porous polymer substrate; quantifying the average value of pore distribution index (PDI); correcting the quantified average value of pore distribution index to obtain the corrected average value of pore distribution index; determining whether or not the corrected average value of pore distribution index is 60 a.u. (arbitrary unit) or less; and classifying the porous polymer substrate as a good product, when the corrected average value of pore distribution index is determined to be 60 a.u. or less, and classifying the porous polymer substrate as a defective product, when the corrected average value of pore distribution index is determined to be larger than 60 a.u.

Abstract: An apparatus and method for estimating a vehicle pitch relative to a road. The apparatus includes a wheel speed sensor part which obtains wheel speed data, an inertial measurement unit (IMU) sensor part which obtains IMU data, a preprocessing part which extracts a stop section and a moving section on the basis of the wheel speed data and the IMU data, and a slope estimation part which estimates a vehicle pitch in the stop section and a road slope in the moving section and estimates a vehicle pitch relative to a road on the basis of the vehicle pitch and the road slope.

Abstract: The device includes at least one acceleration sensor provided to detect acceleration of a vehicle in at least one direction, a wheel speed sensor provided to detect a speed of a wheel, a lamp provided to emit light, a driving unit connected to the lamp to adjust a direction of light, and a controller configured to, when the vehicle is traveling, calculate a dynamic angle value of the vehicle with respect to a road surface while the vehicle is in acceleration or deceleration and calculate a first static angle value based on the dynamic angle value of the vehicle, and, when the vehicle is stopped, to calculate a second static angle value and a road slope value of a road on which the vehicle is positioned, and then control a direction of the light emitted forward of the lamp based on the first or the second static angle value.

Abstract: A dry etching device which can be used to etch products or used in processes regardless of materials and exhibits an excellent accuracy, and a method for controlling the same. The dry etching device includes: an anode part; a cathode part disposed at an upper side of the anode part and facing the anode part, receiving bi-directional voltage power in which polarity of a voltage alternates between a positive voltage and a negative voltage depending on time, and spaced apart from the anode part; a leveling part disposed in close contact with a surface of the cathode part facing the anode part, and for positioning a work-piece in a flat state; a holding part for holding the work-piece and the leveling part to the surface of the cathode part facing the anode part; and a bi-directional voltage power supplier for applying the bi-directional voltage power to the cathode part.

Abstract: The present invention relates to a dry etching apparatus which can be applied regardless of materials. The dry etching apparatus may include: an anode unit; a cathode unit configured to receive a bidirectional voltage source of which the voltage polarity alternates between a positive voltage and a negative voltage with time, and separated from the anode unit; a positioning unit configured to position a work piece at a surface of the cathode unit, facing the anode unit; and a bidirectional voltage source supply unit configured to apply the bidirectional voltage source to the cathode unit.

Abstract: The device includes at least one acceleration sensor provided to detect acceleration of a vehicle in at least one direction, a wheel speed sensor provided to detect a speed of a wheel, a lamp provided to emit light, a driving unit connected to the lamp to adjust a direction of light, and a controller configured to, when the vehicle is traveling, calculate a dynamic angle value of the vehicle with respect to a road surface while the vehicle is in acceleration or deceleration and calculate a first static angle value based on the dynamic angle value of the vehicle, and, when the vehicle is stopped, to calculate a second static angle value and a road slope value of a road on which the vehicle is positioned, and then control a direction of the light emitted forward of the lamp based on the first or the second static angle value.

Abstract: The present invention relates to a control method of a dry etching apparatus which can be applied regardless of materials. The control method of a dry etching apparatus may include: a work piece positioning step of positioning a work piece close to a surface of a cathode unit, facing an anode unit; a bidirectional voltage source applying step of applying a voltage to the cathode unit, the voltage having a polarity alternating between a positive voltage and a negative voltage with time; and an etching step of etching the surface of the work piece using plasma generated by the bidirectional voltage source applied to the cathode unit.

Abstract: A dry etching device which can be used to etch products or used in processes regardless of materials and exhibits an excellent accuracy, and a method for controlling the same. The dry etching device includes: an anode part; a cathode part disposed at an upper side of the anode part and facing the anode part, receiving bi-directional voltage power in which polarity of a voltage alternates between a positive voltage and a negative voltage depending on time, and spaced apart from the anode part; a leveling part disposed in close contact with a surface of the cathode part facing the anode part, and for positioning a work-piece in a flat state; a holding part for holding the work-piece and the leveling part to the surface of the cathode part facing the anode part; and a bi-directional voltage power supplier for applying the bi-directional voltage power to the cathode part.

Abstract: The present invention relates to a dry etching apparatus which can be applied regardless of materials. The dry etching apparatus may include: an anode unit; a cathode unit configured to receive a bidirectional voltage source of which the voltage polarity alternates between a positive voltage and a negative voltage with time, and separated from the anode unit; a positioning unit configured to position a work piece at a surface of the cathode unit, facing the anode unit; and a bidirectional voltage source supply unit configured to apply the bidirectional voltage source to the cathode unit.

Abstract: The present invention relates to a control method of a dry etching apparatus which can be applied regardless of materials. The control method of a dry etching apparatus may include: a work piece positioning step of positioning a work piece close to a surface of a cathode unit, facing an anode unit; a bidirectional voltage source applying step of applying a voltage to the cathode unit, the voltage having a polarity alternating between a positive voltage and a negative voltage with time; and an etching step of etching the surface of the work piece using plasma generated by the bidirectional voltage source applied to the cathode unit.

Abstract: The present invention is related to a high load resistance (HLR) type static random access memory (SRAM) which is small enough to have a profit in device integration. The present invention also provides an SRAM cell, which is easy to convert the thin film transistor (TFT) type SRAM cell into the HLR type SRAM as occasion calls. A high load resistance type static random access memory cell according to the present invention has four polysilicon layers and two metal lines, this is similar to a conventional TFT type SRAM cell. One layer of the four polysilicon layers is used for a high load resistance element and a power line according to the amount of the impurity implanted in the polysilicon layer.