Patents by Inventor Jiyeon Ryu

Jiyeon Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240079008
    Abstract: A method of improving output content through iterative generation is provided. The method includes receiving a natural language input, obtaining user intention information based on the natural language input by using a natural language understanding (NLU) model, setting a target area in base content based on a first user input, determining input content based on the user intention information or a second user input, generating output content related to the base content based on the input content, the target area, and the user intention information by using a neural network (NN) model, generating a caption for the output content by using an image captioning model, calculating similarity between text of the natural language input and the generated output content, and iterating generation of the output content based on the similarity.
    Type: Application
    Filed: November 7, 2023
    Publication date: March 7, 2024
    Inventors: Seohyun BACK, Yonghyun RYU, Wonho RYU, Haejun LEE, Cheolseung JUNG, Sai CHETAN, Jiyeon HONG
  • Publication number: 20230312825
    Abstract: Embodiments relate to a polyamide-based film, a manufacturing method therefor, and a cover window and a display device each comprising same, wherein the polyamide-based film has excellent optical characteristics, such as transmittance, haze, and yellowness, and excellent mechanical characteristics, such as modulus and thickness uniformity. The polyamide-based film contains a polyamide-based polymer and includes a sum XRD peak obtained by adding up a first XRD peak having the maximum value in the section where the 2? value is 10° (inclusive) to 20° (exclusive) and a second XRD peak having the maximum value in the section where the 2? value is 20° to 25°, on the XRD graph, wherein the full width at half maximum of the first XRD peak is 6° or less.
    Type: Application
    Filed: September 8, 2021
    Publication date: October 5, 2023
    Inventors: Han Jun KIM, Dae Seong OH, Sun Hwan KIM, Jin Woo LEE, Heung Sik KIM, Jiyeon RYU
  • Patent number: 11613611
    Abstract: A film for laminating glass includes a polyvinyl acetal, a plasticizer, inorganic particles, and a trioxane-based compound.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: March 28, 2023
    Assignee: SKC Co., Ltd.
    Inventors: Hyejin Kim, Jiyeon Ryu, Kyuhun Kim, Sungjin Chung
  • Patent number: 11498313
    Abstract: A film for glass lamination includes a pigment portion occupying some or a whole of the film, wherein the pigment portion includes a polyvinyl acetal resin, a pigment, a plasticizer, and a trioxane-based compound.
    Type: Grant
    Filed: January 8, 2021
    Date of Patent: November 15, 2022
    Assignee: SKC CO., LTD.
    Inventors: Hyejin Kim, Jiyeon Ryu, Sungjin Chung, Heungsik Kim
  • Publication number: 20220214609
    Abstract: A blank mask including a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The phase shift film has XRD maximum peak at 2? of 15° to 30° when normal mode XRD analysis is performed on an upper surface of the phase shift film. The transparent substrate has XRD maximum peak at 2? of 15° to 30° when performing normal mode XRD analysis on a lower surface of the transparent substrate. AI1 value of the blank mask expressed by below Equation is 0.9 to 1.1. AI ? ? 1 = XM ? ? 1 XQ ? ? 1 XM1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on upper surface of the phase shift film. XQ1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on the lower surface of the transparent substrate.
    Type: Application
    Filed: January 3, 2022
    Publication date: July 7, 2022
    Applicant: SKC solmics Co., Ltd.
    Inventors: Hyung-joo LEE, Kyuhun KIM, JiYeon RYU, INKYUN SHIN, Seong Yoon KIM, Suk Young CHOI, Suhyeon KIM, SUNG HOON SON, Min Gyo JEONG
  • Publication number: 20220206380
    Abstract: The present disclosure relates to a blank mask and the like, and comprises a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The blank mask has a TFT1 value of 0.25 ?m/100° C. or less expressed by Equation 1 below: TFT ? ? 1 = ? ? ? PM T ? ? 2 - T ? ? 1 [ Equation ? ? 1 ] where, when the thermal variation of the processed blank mask, which is formed by processing the thickness of the transparent substrate of the blank mask to be 0.6 mm and removing the light shielding film, is analyzed in a thermomechanical analyzer, the measuring temperature of the thermomechanical analyzer is increased from T1 to T2, and ?PM is a position change of the upper surface of the phase shift film in the thickness direction at T2, based on a position of the upper surface of the phase shift film at T1.
    Type: Application
    Filed: January 3, 2022
    Publication date: June 30, 2022
    Applicant: SKC solmics Co., Ltd.
    Inventors: Hyung-joo LEE, Jiyeon RYU, Kyuhun KIM, INKYUN SHIN, Seong Yoon KIM, Suk Young CHOI, Suhyeon KIM, SUNG HOON SON, Min Gyo JEONG
  • Publication number: 20210155725
    Abstract: A method of producing a polyvinyl butyral resin composition including: preparing a reaction composition including i) a polyvinyl alcohol resin, ii) a butanal, and iii) a butanoic acid; and obtaining the polyvinyl butyral resin composition, wherein a conversion rate of butanal is 77% or more.
    Type: Application
    Filed: February 4, 2021
    Publication date: May 27, 2021
    Applicant: SKC Co., Ltd.
    Inventors: Hyejin KIM, Jiyeon RYU, Jooyoung JUNG, Haksoo LEE
  • Publication number: 20210130599
    Abstract: The method of producing a polyvinyl butyral resin of the present disclosure enable manufacture of a film of which yellow index is low and durability is enhanced, when a film for lamination is manufactured, by advancing acetalization reaction of a polyvinyl alcohol resin and a butanal in the presence of a hydroxy butyric acid.
    Type: Application
    Filed: January 4, 2021
    Publication date: May 6, 2021
    Applicant: SKC Co., Ltd.
    Inventors: Hyejin KIM, Jooyoung JUNG, Jiyeon RYU, Jewon YEON
  • Publication number: 20210129496
    Abstract: A film for glass lamination includes a pigment portion occupying some or a whole of the film, wherein the pigment portion includes a polyvinyl acetal resin, a pigment, a plasticizer, and a trioxane-based compound.
    Type: Application
    Filed: January 8, 2021
    Publication date: May 6, 2021
    Applicant: SKC Co., Ltd.
    Inventors: Hyejin KIM, Jiyeon RYU, Sungjin CHUNG, Heungsik KIM
  • Publication number: 20210078292
    Abstract: A film for laminating glass includes a polyvinyl acetal, a plasticizer, inorganic particles, and a trioxane-based compound.
    Type: Application
    Filed: November 30, 2020
    Publication date: March 18, 2021
    Applicant: SKC Co., Ltd.
    Inventors: Hyejin KIM, Jiyeon RYU, Kyuhun KIM, Sungjin CHUNG
  • Publication number: 20190345275
    Abstract: A polyvinyl acetal resin composition includes a polyvinyl acetal, an aldehyde, and an alkanol, wherein the alkanol is present in an amount of 50 parts by weight or more with respect to 100 parts by weight of the aldehyde.
    Type: Application
    Filed: December 18, 2018
    Publication date: November 14, 2019
    Applicant: SKC Co., Ltd.
    Inventors: Hyejin Kim, Kyuhun Kim, JiYeon Ryu, Jewon Yeon, Hak Soo Lee, Sung Jin Chung
  • Publication number: 20110124888
    Abstract: The present invention relates to a novel compound which efficiently inhibits the formation of beta-amyloid fibrils in the brain to be useful for preventing or treating a degenerative brain disease, a method for preparing same, and a pharmaceutical composition comprising same as an active ingredient.
    Type: Application
    Filed: June 12, 2009
    Publication date: May 26, 2011
    Applicants: Korea Institute of Science and Technology, HANMI HOLDINGS CO., LTD
    Inventors: Dong Jin Kim, Kyung Ho Yoo, Ji Hun Byun, YoungSoo Kim, Hye Yun Kim, Gwan Sun Lee, Maeng Sup Kim, Young Gil Ahn, Ji Hoon Lee, Myoung-Hwan Lee, Hana Hwang, Jiyeon Ryu