Patents by Inventor Ji-Youn KWON

Ji-Youn KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11975500
    Abstract: Provided is a method for manufacturing a polarizing plate, comprising a step of irradiating an optical laminate with ultraviolet rays having an emission wavelength band of 380 nm to 410 nm. The optical laminate sequentially comprises a first base film, a first adhesive layer, a linear polarizer, a second adhesive layer, a second base film and a reverse dispersion liquid crystal layer. The first adhesive layer and the second adhesive layer each comprise a photosensitizer for initiating a curing reaction in a wavelength band of 350 nm to 410 nm, and the ultraviolet rays are irradiated on the first base film side of the optical laminate.
    Type: Grant
    Filed: February 11, 2020
    Date of Patent: May 7, 2024
    Assignee: LG Chem, Ltd.
    Inventors: Young Sik Kim, Jin Yong Park, Yeon Ok Jung, Min Woo Hwang, Jung Geun Kwon, Yong Su Ju, Chan Youn Kim, Ji Hoon Park, Seong Min Lim
  • Patent number: 10254333
    Abstract: A quality affecting factor generation method for a semiconductor manufacturing process is provided. The method includes receiving data of a customer evaluation result obtained by a real use of shipped semiconductor products, preprocessing the data of the customer evaluation result, determining critical quality factors that affect a quality of the semiconductor products by applying a statistical model to the preprocessed data of the customer evaluation result; and determining a semiconductor product to be shipped to a customer company as a good product and a failed product using the determined critical quality factors and generating quality affecting factors of the semiconductor products to be managed to improve yield in a semiconductor manufacturing process.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: April 9, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: SeungLi Kim, Bokyoung Kang, Ji-Youn Kwon, Gilhan Kim, Chanhun Park, Byonghun Cho, SeHoon Kim
  • Publication number: 20160202312
    Abstract: A quality affecting factor generation method for a semiconductor manufacturing process is provided. The method includes receiving data of a customer evaluation result obtained by a real use of shipped semiconductor products, preprocessing the data of the customer evaluation result, determining critical quality factors that affect a quality of the semiconductor products by applying a statistical model to the preprocessed data of the customer evaluation result; and determining a semiconductor product to be shipped to a customer company as a good product and a failed product using the determined critical quality factors and generating quality affecting factors of the semiconductor products to be managed to improve yield in a semiconductor manufacturing process.
    Type: Application
    Filed: December 1, 2015
    Publication date: July 14, 2016
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: SeungLi KIM, Bokyoung KANG, Ji-Youn KWON, Gilhan KIM, Chanhun PARK, Byonghun CHO, SeHoon KIM