Patents by Inventor Jia-Chang Wu

Jia-Chang Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12009410
    Abstract: A semiconductor device includes an active fin disposed on a substrate, a gate structure, and a pair of gate spacers disposed on sidewalls of the gate structure, in which the gate structure and the gate spacers extend across a first portion of the active fin, and a bottom surface of the gate structure is higher than a bottom surface of the gate spacers.
    Type: Grant
    Filed: April 17, 2023
    Date of Patent: June 11, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Zhi-Chang Lin, Wei-Hao Wu, Jia-Ni Yu
  • Patent number: 11996481
    Abstract: A semiconductor device includes a semiconductor layer. A gate structure is disposed over the semiconductor layer. A spacer is disposed on a sidewall of the gate structure. A height of the spacer is greater than a height of the gate structure. A liner is disposed on the gate structure and on the spacer. The spacer and the liner have different material compositions.
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: May 28, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Huan-Chieh Su, Chih-Hao Wang, Kuo-Cheng Chiang, Wei-Hao Wu, Zhi-Chang Lin, Jia-Ni Yu, Yu-Ming Lin, Chung-Wei Hsu
  • Patent number: 11978802
    Abstract: Provided are FinFET devices and methods of forming the same. A dummy gate having gate spacers on opposing sidewalls thereof is formed over a substrate. A dielectric layer is formed around the dummy gate. An upper portion of the dummy gate is removed and upper portions of the gate spacers are removed, so as to form a first opening in the dielectric layer. A lower portion of the dummy gate is removed to form a second opening below the first opening. A metal layer is formed in the first and second openings. The metal layer is partially removed to form a metal gate.
    Type: Grant
    Filed: December 13, 2018
    Date of Patent: May 7, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chung-Wei Hsu, Chih-Hao Wang, Huan-Chieh Su, Wei-Hao Wu, Zhi-Chang Lin, Jia-Ni Yu
  • Publication number: 20240088145
    Abstract: Examples of an integrated circuit with gate cut features and a method for forming the integrated circuit are provided herein. In some examples, a workpiece is received that includes a substrate and a plurality of fins extending from the substrate. A first layer is formed on a side surface of each of the plurality of fins such that a trench bounded by the first layer extends between the plurality of fins. A cut feature is formed in the trench. A first gate structure is formed on a first fin of the plurality of fins, and a second gate structure is formed on a second fin of the plurality of fins such that the cut feature is disposed between the first gate structure and the second gate structure.
    Type: Application
    Filed: November 27, 2023
    Publication date: March 14, 2024
    Inventors: Zhi-Chang Lin, Wei-Hao Wu, Jia-Ni Yu, Chih-Hao Wang, Kuo-Cheng Ching
  • Publication number: 20080253559
    Abstract: In a data security method for preventing a desktop search tool from exposing encrypted data, when a virtual secure disk receives a control instruction, it is first determined if the control instruction came from the desktop search tool. If not, tasks are performed on the virtual secure disk according to the control instruction. On the other hand, if yes, processing is ended to prevent the desktop search tool from indexing the virtual secure disk, thereby achieving the effects of ensuring data security and privacy.
    Type: Application
    Filed: October 11, 2007
    Publication date: October 16, 2008
    Applicant: EGIS INC.
    Inventors: Hsi-Wei Chao, Yu-Wei Ho, Jia-Chang Wu
  • Publication number: 20060294377
    Abstract: In an e-mail encryption/decryption method, an e-mail encryption process is executed at a sending end before sending an e-mailmessagetoareceivingend. The e-mail encryption process is includes providing an e-mail message having a header and text, requesting selection of at least one portion of the text and decision of a password set corresponding to the selected portion, and encrypting the selected portion into an encrypted text region to be decrypted using the password set before sending the e-mail message to the receiving end upon receipt of a sending request. The header, encrypted text region and non-selected text portion of the e-mail message are timely displayed when the receiving end receives the e-mail message. Thus, the sending end can select to encrypt an e-mail message in part to facilitate use.
    Type: Application
    Filed: June 23, 2006
    Publication date: December 28, 2006
    Applicant: HiTRUST.COM Incorporated
    Inventors: Yu-Wei Ho, Jia-Chang Wu, Tsai-Ching Yang
  • Publication number: 20060294391
    Abstract: In a data encryption method, a request to input an encryption password set is made upon receipt of an encryption request to encrypt data, and the data are encrypted such that the encrypted data can be decrypted using one of the encryption password set and a predetermined supervisor password set upon receipt of the encryption password set. Thus, during decryption, one of the encryption password set and the supervisor password set can be used for decryption, thereby providing a restoring mechanism.
    Type: Application
    Filed: June 23, 2006
    Publication date: December 28, 2006
    Applicant: HiTRUST.Com Incorporated
    Inventor: Jia-Chang Wu