Abstract: Calibration of models for manufacturing processes that are subject to circuit layout proximity effects is performed, including optical proximity correction (OPC) model calibration. A target structure is produced using a layout and a manufacturing process. The target structure is illuminated and an electromagnetic scattering property is detected. A manufacturing process model for simulation of the manufacturing process is produced, which comprises at least one manufacturing process parameter determining a model electromagnetic scattering property using the manufacturing process model and the layout. The model electromagnetic scattering property is compared to the detected electromagnetic scattering property and based on the result of the comparison, calibrated manufacturing process parameters are output for calibrating the manufacturing process model.

Abstract: A photo-electric device including a photoelectric conversion layer and a plurality of electrodes is provided. The photoelectric conversion layer includes a plurality of inversed pyramid shaped recesses and a plurality of a pyramids, wherein each of the inversed pyramid shaped recesses has at least three first reflection sidewalls, each of the pyramids is located in one of the inversed pyramid shaped recesses respectively, each of the pyramids has at least three second reflection sidewalls, and none of the first reflection sidewall and the second reflection sidewall is located in a same plane. The electrodes are electrically connected to the photoelectric conversion layer.

Abstract: A multilayer mirror structure for reflecting extreme ultraviolet (EUV) light is provided. The multilayer mirror structure includes a substrate and a plurality of first material layers and a plurality of second material layers alternately stacked on the substrate. Each of the first material layers has a plurality of low loss regions defined thereon. Each of the low loss regions has a low loss member for reducing the loss of the EUV light when the low loss regions are irradiated with the EUV light, thereby enhancing the reflectivity of the first material layers.

Abstract: A photo-electric device including a photoelectric conversion layer and a plurality of electrodes is provided. The photoelectric conversion layer includes a plurality of inversed pyramid shaped recesses and a plurality of a pyramids, wherein each of the inversed pyramid shaped recesses has at least three first reflection sidewalls, each of the pyramids is located in one of the inversed pyramid shaped recesses respectively, each of the pyramids has at least three second reflection sidewalls, and none of the first reflection sidewall and the second reflection sidewall is located in a same plane. The electrodes are electrically connected to the photoelectric conversion layer.

Abstract: A multi-reflection structure including a substrate and pyramid is provided. The substrate includes an inversed pyramid shaped recess having at least three first reflection sidewalls. The pyramid is disposed on the substrate and located in the inversed pyramid shaped recess. The pyramid has at least three second reflection sidewalls, wherein the normal of each of the second reflection sidewalls and the normal of each of the first reflection sidewalls are not located in the same plane. Furthermore, a photo-electric device is also provided in the present application.

Abstract: Calibration of models for manufacturing processes that are subject to circuit layout proximity effects is performed, including optical proximity correction (OPC) model calibration. A target structure is produced using a layout and a manufacturing process. The target structure is illuminated and an electromagnetic scattering property is detected. A manufacturing process model for simulation of the manufacturing process is produced, which comprises at least one manufacturing process parameter determining a model electromagnetic scattering property using the manufacturing process model and the layout. The model electromagnetic scattering property is compared to the detected electromagnetic scattering property and based on the result of the comparison, calibrated manufacturing process parameters are output for calibrating the manufacturing process model.

Abstract: A multi-reflection structure including a substrate and pyramid is provided. The substrate includes an inversed pyramid shaped recess having at least three first reflection sidewalls. The pyramid is disposed on the substrate and located in the inversed pyramid shaped recess. The pyramid has at least three second reflection sidewalls, wherein the normal of each of the second reflection sidewalls and the normal of each of the first reflection sidewalls are not located in the same plane. Furthermore, a photo-electric device is also provided in the present application.

Abstract: Music playback systems and methods. The system comprises a first storage device and a playback device. The first storage device comprises a plurality of first songs, and a first database storing song information of respective first songs. The playback device comprises a processing module. When the first storage device couples to the playback device, the processing module loads the first database to a temporary space, thus to be aware of the first songs in the first storage device, and provides the first songs on the playback device for selection and playback.

Abstract: A data clearing method. When a computer system boots, a dynamic random access memory (DRAM) therein is cleared by way of suspending refresh cycles thereof within a predetermined period of time.