Abstract: A method for making a desired pattern of a metallic nanostructure of a metal includes: (a) forming the desired pattern of a self-assembled monolayer matrix of a first organic compound on a substrate, the first organic compound having a tail group selected to be active toward deposition of the metal on the self-assembled monolayer matrix; (b) forming an inert layer of a second organic compound on the substrate by contacting an assembly of the substrate and the self-assembled monolayer matrix with a solution containing the second organic compound, the second organic compound having a tail group selected to be inactive toward the deposition of the metal on the inert layer; and (c) depositing the metal on the self-assembled monolayer matrix by contacting an assembly of the substrate, the self-assembled monolayer matrix and the inert layer with a solution containing metal ions, followed by reducing the metal ions.