Patents by Inventor Jiawen Wang

Jiawen Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250116752
    Abstract: A matching network of a radio frequency signal, a mixer, a phase shifter, a radar sensor and an electronic apparatus. The matching network of the radio frequency signal includes a first inductor (L1) having an I input terminal, a second inductor (L2) having a Q input terminal, and a third inductor (L3) inductively coupled to both the first inductor and the second inductor, the third inductor has an output terminal; wherein the I input terminal is configured to receive a radio frequency signal of an I channel, and the Q input terminal is configured to receive a radio frequency signal of a Q channel.
    Type: Application
    Filed: December 20, 2024
    Publication date: April 10, 2025
    Applicant: CALTERAH SEMICONDUCTOR TECHNOLOGY (SHANGHAI) CO., LTD
    Inventors: Jiawen WANG, Zhengdong LIU, Wenting ZHOU
  • Publication number: 20230005873
    Abstract: The present invention relates to a semiconductor structure and method of forming the same. The semiconductor structure includes a first substrate and a first bonding layer on a surface of the first substrate, and the material of first bonding layer includes dielectric materials of silicon, nitrogen and carbon, and an atomic concentration of carbon in the first bonding layer gradually increases along with an increase of thickness of the first bonding layer from the surface of first substrate and reaches a maximum atomic concentration of carbon at a surface of the first bonding layer.
    Type: Application
    Filed: September 15, 2022
    Publication date: January 5, 2023
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Jun CHEN, Ziqun HUA, Siping HU, Jiawen WANG, Tao WANG, Jifeng ZHU, Taotao DING, Xinsheng WANG, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Publication number: 20220216178
    Abstract: The present disclosure relates to a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes a first substrate, and a bonding layer located on a surface of the first substrate. The material of the first bonding layer is a dielectric material containing element carbon (C). C atomic concentration of a surface layer of the first bonding layer away from the first substrate is higher than or equal to 35%. The first bonding layer of the semiconductor structure may be used to enhance bonding strength during bonding.
    Type: Application
    Filed: March 24, 2022
    Publication date: July 7, 2022
    Inventors: Xinsheng WANG, Li ZHANG, Gaosheng ZHANG, Xianjin WAN, Ziqun HUA, Jiawen WANG, Taotao DING, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Publication number: 20220020725
    Abstract: The present invention relates to a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes a first substrate, and a bonding layer located on a surface of the first substrate. The material of the first bonding layer is a dielectric material containing element carbon (C). C atomic concentration of a surface layer of the first bonding layer away from the first substrate is higher than or equal to 35%. The first bonding layer of the semiconductor structure may be used to enhance bonding strength during bonding.
    Type: Application
    Filed: September 29, 2021
    Publication date: January 20, 2022
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Xinsheng WANG, Li ZHANG, Gaosheng ZHANG, Xianjin WAN, Ziqun HUA, Jiawen WANG, Taotao DING, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Publication number: 20210398932
    Abstract: A method of forming a semiconductor structure, including steps of providing a first substrate, and forming a first bonding layer on a surface of the first substrate, wherein a material of the first bonding layer includes dielectric material of silicon, nitrogen and carbon.
    Type: Application
    Filed: September 3, 2021
    Publication date: December 23, 2021
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Jun CHEN, Ziqun HUA, Siping HU, Jiawen WANG, Tao WANG, Jifeng ZHU, Taotao DING, Xinsheng WANG, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Publication number: 20210335745
    Abstract: The present invention relates to a semiconductor structure and method of forming the same. The semiconductor structure includes a first substrate, a first adhesive/bonding stack on the surface of first substrate, wherein the first adhesive/bonding stack includes at least one first adhesive layer and at least one first bonding layer. The material of first bonding layer includes dielectrics such as silicon, nitrogen and carbon, the material of first adhesive layer includes dielectrics such as silicon and nitrogen, and the first adhesive/bonding stack of semiconductor structure is provided with higher bonding force in bonding process.
    Type: Application
    Filed: July 5, 2021
    Publication date: October 28, 2021
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Jun CHEN, Ziqun HUA, Siping HU, Jiawen WANG, Tao WANG, Jifeng ZHU, Taotao DING, Xinsheng WANG, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Patent number: 10818631
    Abstract: A semiconductor structure and a method of forming the same are provided. The semiconductor structure includes a first substrate; a first adhesive layer disposed on the surface of the first substrate; a first buffer layer disposed on the surface of the first adhesive layer; and a first bonding layer disposed on the surface of the first buffer layer, wherein the densities of the first adhesive layer and the first buffer layer are greater than that of the first bonding layer. The first adhesive layer of the semiconductor structure has higher adhesion with the first substrate and the first buffer layer, and the first buffer layer and the first bonding layer exhibit higher adhesion, which are beneficial to improve the performance of the semiconductor structure.
    Type: Grant
    Filed: April 7, 2019
    Date of Patent: October 27, 2020
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Xinsheng Wang, Li Zhang, Gaosheng Zhang, Xianjin Wan, Ziqun Hua, Jiawen Wang, Taotao Ding, Hongbin Zhu, Weihua Cheng, Shining Yang
  • Patent number: 10811380
    Abstract: The present invention relates to a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes: a first substrate; a first adhesive layer disposed on a surface of the first substrate; and a first bonding layer disposed on a surface of the first adhesive layer. A density of the first adhesive layer is greater than a density of the first bonding layer. The first adhesive layer of the semiconductor structure has higher adhesion with the first substrate and first bonding layer, such that it is advantageous to improve a performance of the semiconductor structure.
    Type: Grant
    Filed: April 7, 2019
    Date of Patent: October 20, 2020
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Xinsheng Wang, Li Zhang, Gaosheng Zhang, Xianjin Wan, Ziqun Hua, Jiawen Wang, Taotao Ding, Hongbin Zhu, Weihua Cheng, Shining Yang
  • Publication number: 20200006285
    Abstract: The present invention relates to a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes a first substrate, and a bonding layer located on a surface of the first substrate. The material of the first bonding layer is a dielectric material containing element carbon (C). C atomic concentration of a surface layer of the first bonding layer away from the first substrate is higher than or equal to 35%. The first bonding layer of the semiconductor structure may be used to enhance bonding strength during bonding.
    Type: Application
    Filed: April 9, 2019
    Publication date: January 2, 2020
    Inventors: Xinsheng WANG, Li ZHANG, Gaosheng ZHANG, Xianjin WAN, Ziqun HUA, Jiawen WANG, Taotao DING, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Publication number: 20200006275
    Abstract: The present invention relates to a semiconductor structure and method of forming the same. The semiconductor structure includes a first substrate, a first bonding layer on the surface of first substrate, the material of first bonding layer includes dielectrics such as Si, N and C, and the first bonding layer of semiconductor structure is provided with higher bonding force in wafer bonding.
    Type: Application
    Filed: April 8, 2019
    Publication date: January 2, 2020
    Inventors: Jun CHEN, Ziqun HUA, Siping HU, Jiawen WANG, Tao WANG, Jifeng ZHU, Taotao DING, Xinsheng WANG, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Publication number: 20200006284
    Abstract: The present invention relates to a semiconductor structure and method of forming the same. The semiconductor structure includes a first substrate, a first adhesive/bonding stack on the surface of first substrate, wherein the first adhesive/bonding stack includes at least one first adhesive layer and at least one first bonding layer. The material of first bonding layer includes dielectrics such as silicon, nitrogen and carbon, the material of first adhesive layer includes dielectrics such as silicon and nitrogen, and the first adhesive/bonding stack of semiconductor structure is provided with higher bonding force in bonding process.
    Type: Application
    Filed: April 8, 2019
    Publication date: January 2, 2020
    Inventors: Jun CHEN, Ziqun HUA, Siping HU, Jiawen WANG, Tao WANG, Jifeng ZHU, Taotao DING, Xinsheng WANG, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Publication number: 20200006277
    Abstract: The present invention relates to a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes: a first substrate; a first adhesive layer disposed on a surface of the first substrate; and a first bonding layer disposed on a surface of the first adhesive layer. A density of the first adhesive layer is greater than a density of the first bonding layer. The first adhesive layer of the semiconductor structure has higher adhesion with the first substrate and first bonding layer, such that it is advantageous to improve a performance of the semiconductor structure.
    Type: Application
    Filed: April 7, 2019
    Publication date: January 2, 2020
    Inventors: Xinsheng WANG, Li ZHANG, Gaosheng ZHANG, Xianjin WAN, Ziqun HUA, Jiawen WANG, Taotao DING, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Publication number: 20200006278
    Abstract: A semiconductor structure and a method of forming the same are provided. The semiconductor structure includes a first substrate; a first adhesive layer disposed on the surface of the first substrate; a first buffer layer disposed on the surface of the first adhesive layer; and a first bonding layer disposed on the surface of the first buffer layer, wherein the densities of the first adhesive layer and the first buffer layer are greater than that of the first bonding layer. The first adhesive layer of the semiconductor structure has higher adhesion with the first substrate and the first buffer layer, and the first buffer layer and the first bonding layer exhibit higher adhesion, which are beneficial to improve the performance of the semiconductor structure.
    Type: Application
    Filed: April 7, 2019
    Publication date: January 2, 2020
    Inventors: Xinsheng WANG, Li ZHANG, Gaosheng ZHANG, Xianjin WAN, Ziqun HUA, Jiawen WANG, Taotao DING, Hongbin ZHU, Weihua CHENG, Shining YANG
  • Patent number: 10169831
    Abstract: This present disclosure discloses techniques for establishing social network service (SNS) relationship. According to the techniques, online payment information of the first user and/or the second user are obtained from the database of the online transaction platform. Using this online payment information, it is determined whether the first user and the second user know each other. If they do, a message to establish an SNS relationship establishment is sent to the first user. The message contains personal information of the second user and allows the first user to decide whether to establish the relationship. The techniques therefore improve security and success rates in establishing SNS relationships.
    Type: Grant
    Filed: August 19, 2016
    Date of Patent: January 1, 2019
    Assignee: Alibaba Group Holding Limited
    Inventor: Jiawen Wang
  • Publication number: 20160358270
    Abstract: This present disclosure discloses techniques for establishing social network service (SNS) relationship. According to the techniques, online payment information of the first user and/or the second user are obtained from the database of the online transaction platform. Using this online payment information, it is determined whether the first user and the second user know each other. If they do, a message to establish an SNS relationship establishment is sent to the first user. The message contains personal information of the second user and allows the first user to decide whether to establish the relationship. The techniques therefore improve security and success rates in establishing SNS relationships.
    Type: Application
    Filed: August 19, 2016
    Publication date: December 8, 2016
    Inventor: Jiawen Wang
  • Patent number: 9426235
    Abstract: This present disclosure discloses techniques for establishing social network service (SNS) relationship. According to the techniques, online payment information of the first user and/or the second user are obtained from the database of the online transaction platform. Using this online payment information, it is determined whether the first user and the second user know each other. If they do, a message to establish an SNS relationship establishment is sent to the first user. The message contains personal information of the second user and allows the first user to decide whether to establish the relationship. The techniques therefore improve security and success rates in establishing SNS relationships.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: August 23, 2016
    Assignee: Alibaba Group Holding Limited
    Inventor: Jiawen Wang
  • Publication number: 20130117363
    Abstract: This present disclosure discloses techniques for establishing social network service (SNS) relationship. According to the techniques, online payment information of the first user and/or the second user are obtained from the database of the online transaction platform. Using this online payment information, it is determined whether the first user and the second user know each other. If they do, a message to establish an SNS relationship establishment is sent to the first user. The message contains personal information of the second user and allows the first user to decide whether to establish the relationship. The techniques therefore improve security and success rates in establishing SNS relationships.
    Type: Application
    Filed: July 26, 2011
    Publication date: May 9, 2013
    Applicant: ALIBABA GROUP HOLDING LIMITED
    Inventor: Jiawen Wang