Patents by Inventor JiaCai Nie

JiaCai Nie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240132378
    Abstract: The present invention discloses a method for recycling heavy oil produced water for use in a steam injection boiler without desilication, comprising: the heavy oil produced water sequentially undergoes pre-treatment, filtration treatment and divalent and trivalent scaling ion removal by using a macroporous weak acid resin and the like. The method may reduce the concentration of the divalent and trivalent scaling ions in the heavy oil produced water to below 50 ?g/L, and can recycle high-silicon-containing heavy oil produced water for use in the steam injection boiler without desilication. Further disclosed is a system for recycling heavy oil produced water for use in a steam injection boiler without desilication.
    Type: Application
    Filed: December 11, 2023
    Publication date: April 25, 2024
    Inventors: Jiacai XIE, Kun TONG, Zixian WANG, Zhiguo SHAO, Fan NIE
  • Publication number: 20240101449
    Abstract: A method for deep removal of divalent and trivalent scaling ions from heavy oil produced water is described. The method comprises performing divalent and trivalent scaling ion deep removal treatment on heavy oil produced water by using a macroporous weak acid resin, to reduce divalent and trivalent scaling ions in the heavy oil produced water to 50 ?g/L. The water quality of produced water treated using the method is superior to the boiler water standard, a silicon removal process in a conventional heavy oil produced water treatment process can be cancelled, and significant economic benefits are achieved.
    Type: Application
    Filed: December 8, 2023
    Publication date: March 28, 2024
    Inventors: Jiacai Xie, Kun Tong, Zhiguo Shao, Zixian Wang, Fan Nie
  • Patent number: 7335283
    Abstract: A method and an apparatus which permits making a composite oxide thin film excellent in crystallinity easily and at a low temperature, with the capability of controlling the basic unit cell structure as desired, and without the need for a post annealing, as well as a composite oxide thin film thereby, especially a Cu group high temperature superconducting thin film, are disclosed. A thin Cu group high temperature superconducting film, which is constituted of a charge supply block (1) and a superconducting block (2), is formed on a substrate by alternately sputtering from a sputtering target having a composition of the charge supply block (1) and a sputtering target having a composition of the superconducting block (2) and repeating such an alternate sputtering operation a number of times needed for the film to reach a desired thickness.
    Type: Grant
    Filed: August 24, 2001
    Date of Patent: February 26, 2008
    Assignees: Japan Science and Technology Corporation, National Institute of Advanced Industrial Science and Technology
    Inventors: Yoshiko Ihara, legal representative, Hideyo Ihara, legal representative, Hidetaka Ihara, legal representative, Gen-ei Ihara, legal representative, Chiaki Ihara, legal representative, Sundaresan Athinarayanan, JiaCai Nie, Hideo Ihara
  • Publication number: 20040127064
    Abstract: A method and an apparatus which permits making a composite oxide thin film excellent in crystallinity easily and at a low temperature, with the capability of controlling the basic unit cell structure as desired, and without the need for a post annealing., as well as a composite oxide thin film thereby, especially a Cu group high temperature superconducting thin film, are disclosed. A thin Cu group high temperature superconducting film, which is constituted of a charge supply block (1) and a superconducting block (2), is formed on a substrate by alternately sputtering from a sputtering target having a composition of the charge supply block (1) and a sputtering target having a composition of the superconducting block (2) and repeating such an alternate sputtering operation a number of times needed for the film to reach a desired thickness.
    Type: Application
    Filed: November 20, 2003
    Publication date: July 1, 2004
    Inventors: Hideo Ihara, Yoshiko Ihara, Hideyo Ihara, Hidetaka Ihara, Gen-ei Ihara, Chiaki Ihara, Sundaresan Athinarayanan, JiaCai Nie