Patents by Inventor Jian-Ming Chiu

Jian-Ming Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240304943
    Abstract: A method for forming soluble polymer is provided. The method includes polymerizing a dianhydride monomer, a diamine monomer, and solvent to form soluble polymer. The dianhydride monomer includes 4,4?-4,4?-oxydiphthalic anhydrid, 3,3?,4,4?-biphenyltetracarboxylic dianhydride, and 4,4?-(Hexafluoroisopropylidene) diphthalic anhydride. The diamine monomer includes 3,4?-oxydianiline, 2,2?-Bis(trifluoromethyl)benzidine, and 3,3?-dimethylbenzidine.
    Type: Application
    Filed: March 9, 2022
    Publication date: September 12, 2024
    Inventors: JIAN-MING CHIU, CHI-YUNG TSENG, SHIU-HUI WANG
  • Publication number: 20230257627
    Abstract: A method for forming a retardation optical film is provided. The method includes: adding a diamine monomer (A) and a dianhydride monomer (A) in a solvent (A) to react to form a polyimide slurry; adding the polyimide slurry into a solvent (B) to precipitate out a plurality of polyimide fibers; washing the plurality of polyimide fibers with a solvent (C); mixing the plurality of polyimide fibers with a solvent (D) to obtain a soluble polyimide solution; reacting a diamine monomer (B) and a dianhydride monomer (B) to form a polyamic acid solution; coating a mixed solution including the soluble polyimide solution and the polyamic acid solution on a substrate; and heating to form a retardation optical film made of polyimide on the substrate.
    Type: Application
    Filed: May 18, 2022
    Publication date: August 17, 2023
    Inventors: CHI-YUNG TSENG, JIAN-MING CHIU, SHIU-HUI WANG
  • Patent number: 10003071
    Abstract: An electrode structure is provided. The electrode structure includes a substrate, a buffer layer, and a nano-material layer. The buffer layer is disposed on the substrate. The nano-material layer is disposed on the buffer layer, wherein the structure of the nano-material layer is nanowall.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: June 19, 2018
    Assignee: National Taiwan University of Science and Technology
    Inventors: Yian Tai, Bing-Joe Hwang, Kuei-Hsien Chen, Jian-Ming Chiu, Li-Chyong Chen
  • Publication number: 20170018766
    Abstract: An electrode structure is provided. The electrode structure includes a substrate, a buffer layer, and a nano-material layer. The buffer layer is disposed on the substrate. The nano-material layer is disposed on the buffer layer, wherein the structure of the nano-material layer is nanowall.
    Type: Application
    Filed: January 29, 2016
    Publication date: January 19, 2017
    Inventors: Yian Tai, Bing-Joe Hwang, Kuei-Hsien Chen, Jian-Ming Chiu, Li-Chyong Chen